Patents by Inventor Alexandros Papavasiliou

Alexandros Papavasiliou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10699954
    Abstract: A method of forming void-free, high aspect ratio through-substrate vias by “bottom-up” electroplating. In one embodiment, the method requires providing a substrate, forming a dielectric layer on the substrate's bottom side, providing at least one perforation through the dielectric layer, forming a via hole through the substrate from its top side to the dielectric layer and over the perforations, forming an isolation layer on the sidewalls of the via hole, forming a metal seed layer on the bottom side of the dielectric layer, electroplating the seed layer such that all of the perforations are plugged, and electroplating up the via hole from the plugs to fill the via hole.
    Type: Grant
    Filed: April 19, 2018
    Date of Patent: June 30, 2020
    Assignee: Teledyne Scientific & Imaging, LLC
    Inventors: Alexandros Papavasiliou, Adam Young, Robert Mihailovich, Jeff DeNatale
  • Publication number: 20190326171
    Abstract: A method of forming void-free, high aspect ratio through-substrate vias by “bottom-up” electroplating. In one embodiment, the method requires providing a substrate, forming a dielectric layer on the substrate's bottom side, providing at least one perforation through the dielectric layer, forming a via hole through the substrate from its top side to the dielectric layer and over the perforations, forming an isolation layer on the sidewalls of the via hole, forming a metal seed layer on the bottom side of the dielectric layer, electroplating the seed layer such that all of the perforations are plugged, and electroplating up the via hole from the plugs to fill the via hole.
    Type: Application
    Filed: April 19, 2018
    Publication date: October 24, 2019
    Inventors: Alexandros Papavasiliou, Adam Young, Robert Mihailovich, Jeff DeNatale
  • Patent number: 8826514
    Abstract: Microfabricated inductors with through-wafer vias and including a first wafer and a second wafer, each wafer having a plurality of metal fillings therein, and a plurality of metal conductors connecting the plurality of metal fillings together to form a spiral. A method for producing an inductor including steps of forming a first plurality of vias in a first substrate, filling the first plurality of vias in the first substrate with a first plurality of metal fillings, forming a first plurality of metal conductors, connecting pairs of the first plurality of metal fillings together using the first plurality of metal conductors to form a spiral, performing the foregoing steps similarly on a second substrate formed with a second plurality of vias filled with a second plurality of metal fillings, and bonding the first substrate with the second substrate.
    Type: Grant
    Filed: February 14, 2011
    Date of Patent: September 9, 2014
    Assignee: Teledyne Scientific & Imaging, LLC
    Inventors: Alexandros Papavasiliou, Jeffrey F. DeNatale, Philip A. Stupar, Robert L. Borwick, III
  • Publication number: 20110131798
    Abstract: The present invention relates to microfabricated inductors with through-wafer vias. In one embodiment, the present invention is an inductor including a first wafer, a first plurality of metal fillings located within the first wafer, and a first plurality of metal conductors connecting the first plurality of metal fillings together to form a first spiral with a first plurality of windings. In another embodiment, the present invention is a method for producing an inductor including the steps of forming a first plurality of vias in a first substrate, filling the first plurality of vias in the first substrate with a first plurality of metal fillings, forming a first plurality of metal conductors, and connecting pairs of the first plurality of metal fillings together using the first plurality of metal conductors to form a spiral.
    Type: Application
    Filed: February 14, 2011
    Publication date: June 9, 2011
    Applicant: TELEDYNE SCIENTIFIC & IMAGING, LLC
    Inventors: Alexandros Papavasiliou, Jeffrey F. DeNatale, Philip A. Stupar, Robert L. Borwick, III
  • Publication number: 20100225436
    Abstract: The present invention relates to microfabricated inductors with through-wafer vias. In one embodiment, the present invention is an inductor including a first wafer, a first plurality of metal fillings located within the first wafer, and a first plurality of metal conductors connecting the first plurality of metal fillings together to form a first spiral with a first plurality of windings. In another embodiment, the present invention is a method for producing an inductor including the steps of forming a first plurality of vias in a first substrate, filling the first plurality of vias in the first substrate with a first plurality of metal fillings, forming a first plurality of metal conductors, and connecting pairs of the first plurality of metal fillings together using the first plurality of metal conductors to form a spiral.
    Type: Application
    Filed: March 5, 2009
    Publication date: September 9, 2010
    Applicant: TELEDYNE SCIENTIFIC & IMAGING, LLC
    Inventors: Alexandros Papavasiliou, Jeffrey F. DeNatale, Philip A. Stupar, Robert L. Borwick, III
  • Publication number: 20050059029
    Abstract: A method of making very long, double-stranded synthetic poly-nucleotides. A multiplicity of short oligonucleotides is provided. The short oligonucleotides are sequentially hybridized to each other. Enzymatic ligation of the oligonucleotides provides a contiguous piece of PCR-ready DNA of predetermined sequence.
    Type: Application
    Filed: November 21, 2003
    Publication date: March 17, 2005
    Inventors: Raymond Mariella, Allen Christian, James Tucker, John Dzenitis, Alexandros Papavasiliou