Patents by Inventor Alexei Shatalov

Alexei Shatalov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10284277
    Abstract: A communication system includes a first radio module and a second radio module. The first radio module includes a tuner communicatively coupled to a reference signal generator that is configured to generate a first reference signal for the tuner. The first radio module further includes a serializer configured to serialize a signal output by the tuner. The second radio module includes a deserializer configured to receive a serialized version of the signal from the serializer of the first radio module and deserialize the serialized version of the signal. The second radio module further includes a second tuner that is communicatively coupled to a clock recovery circuit. The clock recovery circuit is configured to generate a second reference signal for the second tuner based on a deserialized version of the first signal, where the second reference signal is frequency and phase locked to the first reference signal.
    Type: Grant
    Filed: August 23, 2017
    Date of Patent: May 7, 2019
    Assignee: MAXIM INTEGRATED PRODUCTS, INC.
    Inventors: Matthew Waight, Alexei Shatalov, Adam Heiberg
  • Publication number: 20180062726
    Abstract: A communication system includes a first radio module and a second radio module. The first radio module includes a tuner communicatively coupled to a reference signal generator that is configured to generate a first reference signal for the tuner. The first radio module further includes a serializer configured to serialize a signal output by the tuner. The second radio module includes a deserializer configured to receive a serialized version of the signal from the serializer of the first radio module and deserialize the serialized version of the signal. The second radio module further includes a second tuner that is communicatively coupled to a clock recovery circuit. The clock recovery circuit is configured to generate a second reference signal for the second tuner based on a deserialized version of the first signal, where the second reference signal is frequency and phase locked to the first reference signal.
    Type: Application
    Filed: August 23, 2017
    Publication date: March 1, 2018
    Inventors: Matthew Waight, Alexei Shatalov, Adam Heiberg
  • Patent number: 6767798
    Abstract: A self-aligned bipolar transistor and a method of formation thereof are provided. The bipolar transistor has a raised extrinsic base such that the link base resistance is reduced by providing an extrinsic base which is thicker than the intrinsic base. The increase in thickness of the extrinsic base provides a less resistive layer of the heavily doped base region. The method of forming the bipolar transistor includes depositing a first epitaxial layer on a substrate to form a base region having an intrinsic base region and an extrinsic base region. The extrinsic base region is raised by depositing a second epitaxial layer over a portion of the first epitaxial layer such that the thickness of the extrinsic base layer is x and the thickness of the intrinsic layer is y, wherein x>y. The second epitaxial layer is deposited using a chemical vapor epitaxial device where the concentration of Ge to Si is gradually reduced from above 5% to close to 0% during the epitaxy process.
    Type: Grant
    Filed: April 9, 2002
    Date of Patent: July 27, 2004
    Assignee: Maxim Integrated Products, Inc.
    Inventors: Alexander Kalnitsky, Alexei Shatalov, Michael Rowlandson, Sang H. Park, Robert F. Scheer, Fanling H. Yang
  • Publication number: 20030189239
    Abstract: A self-aligned bipolar transistor and a method of formation thereof are provided. The bipolar transistor has a raised extrinsic base such that the link base resistance is reduced by providing an extrinsic base which is thicker than the intrinsic base. The increase in thickness of the extrinsic base provides a less resistive layer of the heavily doped base region. The method of forming the bipolar transistor includes depositing a first epitaxial layer on a substrate to form a base region having an intrinsic base region and an extrinsic base region. The extrinsic base region is raised by depositing a second epitaxial layer over a portion of the first epitaxial layer such that the thickness of the extrinsic base layer is x and the thickness of the intrinsic layer is y, wherein x>y. The second epitaxial layer is deposited using a chemical vapor epitaxial device where the concentration of Ge to Si is gradually reduced from above 5% to close to 0% during the epitaxy process.
    Type: Application
    Filed: April 9, 2002
    Publication date: October 9, 2003
    Inventors: Alexander Kalnitsky, Alexei Shatalov, Michael Rowlandson, Sang H. Park, Robert F. Scheer, Fanling H. Yang