Patents by Inventor Alexey SHCHEKIN

Alexey SHCHEKIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical measurement system and method for measuring critical dimension of nanostructure
    Patent number: 9995648
    Abstract: Provided is an optical measurement system. The optical measurement system includes: an optical module which includes an optical system and which is configured to illuminate a sample and register a defocused image of a nanostructured surface of the sample, an optical system parameter control module configured to set optical parameters of the optical system, an optical transfer function (OTF) measurement module configured to measure an OTF, a defocused image calculation module configured to calculate the defocused image based on the measured OTF and the optical parameters, and a critical dimension (CD) evaluation module configured to compare the registered defocused image with the calculated defocused image of the nanostructured surface of the sample and to output a CD value of the nanostructured surface.
    Type: Grant
    Filed: September 10, 2015
    Date of Patent: June 12, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Alexey Shchekin, Maksim Riabko, Sergey Koptyaev, Anton Medvedev
  • OPTICAL MEASUREMENT SYSTEM AND METHOD FOR MEASURING CRITICAL DIMENSION OF NANOSTRUCTURE
    Publication number: 20160131472
    Abstract: Provided is an optical measurement system. The optical measurement system includes: an optical module which includes an optical system and which is configured to illuminate a sample and register a defocused image of a nanostructured surface of the sample, an optical system parameter control module configured to set optical parameters of the optical system, an optical transfer function (OTF) measurement module configured to measure an OTF, a defocused image calculation module configured to calculate the defocused image based on the measured OTF and the optical parameters, and a critical dimension (CD) evaluation module configured to compare the registered defocused image with the calculated defocused image of the nanostructured surface of the sample and to output a CD value of the nanostructured surface.
    Type: Application
    Filed: September 10, 2015
    Publication date: May 12, 2016
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Alexey SHCHEKIN, Maksim RIABKO, Sergey KOPTYAEV, Anton MEDVEDEV