Patents by Inventor Alexis Drouin

Alexis Drouin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240072753
    Abstract: A method for preparing a monodomain thin layer of ferroelectric material comprises: implanting light species in a ferroelectric donor substrate in order to form an embrittlement plane and to define a first layer therein; assembling the donor substrate with a support substrate by means of a dielectric assembly layer; and fracturing the donor substrate at the embrittlement plane. The dielectric assembly layer comprises an oxide having a hydrogen concentration lower than that of the first layer or preventing the diffusion of hydrogen to the first layer, or the dielectric assembly layer comprises a barrier preventing the diffusion of hydrogen to the first layer. A heat treatment of a free face of the first layer is used to diffuse the hydrogen contained therein and cause the multidomain transformation of a surface portion of this first layer, followed by a thinning of the first layer in order to remove the surface portion.
    Type: Application
    Filed: March 26, 2020
    Publication date: February 29, 2024
    Inventors: Alexis Drouin, Isabelle Huyet, Morgane Logiou
  • Publication number: 20230353115
    Abstract: A process for transferring a thin layer consisting of a first material to a support substrate consisting of a second material having a different thermal expansion coefficient, comprises providing a donor substrate composed of an assembly of a thick layer formed of the first material and of a handle substrate having a thermal expansion coefficient similar to that of the support substrate, and the donor substrate having a main face on the side of the thick laver; introducing light species into the thick layer to generate a plane of weakness therein and to define the thin layer between the plane of weakness and the main face of the donor substrate; assembling the main face of the donor substrate with a face of the support substrate; and detachment of the thin layer at the plane of weakness, the detachment comprising application of a heat treatment.
    Type: Application
    Filed: July 7, 2023
    Publication date: November 2, 2023
    Inventors: Isabelle Huyet, Cèdric Charles-Alfred, Didier Landru, Alexis Drouin
  • Patent number: 11742817
    Abstract: A process for transferring a thin layer consisting of a first material to a support substrate consisting of a second material having a different thermal expansion coefficient, comprises providing a donor substrate composed of an assembly of a thick layer formed of the first material and of a handle substrate having a thermal expansion coefficient similar to that of the support substrate, and the donor substrate having a main face on the side of the thick layer introducing light species into the thick layer to generate a plane of weakness therein and to define the thin layer between the plane of weakness and the main face of the donor substrate; assembling the main face of the donor substrate with a face of the support substrate; and detachment of the thin layer at the plane of weakness, the detachment comprising application of a heat treatment.
    Type: Grant
    Filed: June 21, 2018
    Date of Patent: August 29, 2023
    Assignee: Soitec
    Inventors: Isabelle Huyet, Cedric Charles-Alfred, Didier Landru, Alexis Drouin
  • Patent number: 11595021
    Abstract: The invention relates to a SAW resonator (100) comprising at least: a substrate (102); a layer (108) of piezoelectric material arranged on the substrate; a first attenuation layer (112) arranged between the substrate and the layer of piezoelectric material, and/or, when the substrate comprises at least two different layers (104, 106), a second attenuation layer (114) arranged between the two layers of the substrate; and in which the at least one attenuation layer is/are heterogeneous.
    Type: Grant
    Filed: March 9, 2018
    Date of Patent: February 28, 2023
    Assignees: COMMISSARIAT A L'ENERGIE AT TOMIQUE ET AUX ENERGIES ALTERNATIVES, SOITEC
    Inventors: Thu Trang Vo, Jean-Sebastien Moulet, Alexandre Reinhardt, Isabelle Huyet, Alexis Drouin, Yann Sinquin
  • Publication number: 20220285520
    Abstract: A process for preparing a thin layer made of ferroelectric material based on alkali metal, exhibiting a determined Curie temperature, transferred from a donor substrate to a carrier substrate by using a transfer technique including implanting light species into the donor substrate in order to produce an embrittlement plane, the thin layer having a first, free face and a second face that is arranged on the carrier substrate. The process comprises a first heat treatment of the transferred thin layer at a temperature higher than the Curie temperature, the thin layer exhibiting a multi-domain character upon completion of the first heat treatment, and introducing, after the first heat treatment, protons into the thin layer, followed by applying a second heat treatment of the thin layer at a temperature lower than the Curie temperature to generate an internal electric field that results in the thin layer being made single domain.
    Type: Application
    Filed: April 13, 2022
    Publication date: September 8, 2022
    Inventor: Alexis Drouin
  • Publication number: 20220247374
    Abstract: A method for manufacturing a structure comprising a thin layer transferred onto a support provided with a charge trapping layer, the method comprising the following steps: —preparing the support comprising forming the trapping layer on a base substrate, the trapping layer having a hydrogen concentration of less than 10{circumflex over (?)}18 at/cm{circumflex over (?)}; —joining the support to a donor substrate by way of a dielectric layer having a hydrogen concentration of less than 10{circumflex over (?)}20 at/cm{circumflex over (?)}3 or comprising a barrier preventing the diffusion of hydrogen toward the trapping layer or having low hydrogen diffusivity; —removing part of the donor substrate to form the thin layer; the manufacturing method exposing the structure to a temperature below a maximum temperature of 1000° C. The present disclosure also relates to a structure obtained at the end of this method.
    Type: Application
    Filed: March 26, 2020
    Publication date: August 4, 2022
    Inventors: Isabelle Bertrand, Alexis Drouin, Isabelle Huyet, Eric Butaud, Morgane Logiou
  • Patent number: 11309399
    Abstract: A process for preparing a thin layer made of ferroelectric material based on alkali metal, exhibiting a determined Curie temperature, transferred from a donor substrate to a carrier substrate by using a transfer technique including implanting light species into the donor substrate in order to produce an embrittlement plane, the thin layer having a first, free face and a second face that is arranged on the carrier substrate. The process comprises a first heat treatment of the transferred thin layer at a temperature higher than the Curie temperature, the thin layer exhibiting a multi-domain character upon completion of the first heat treatment, and introducing, after the first heat treatment, protons into the thin layer, followed by applying a second heat treatment of the thin layer at a temperature lower than the Curie temperature to generate an internal electric field that results in the thin layer being made single domain.
    Type: Grant
    Filed: February 18, 2019
    Date of Patent: April 19, 2022
    Assignee: Soitec
    Inventor: Alexis Drouin
  • Publication number: 20210036124
    Abstract: A process for preparing a thin layer made of ferroelectric material based on alkali metal, exhibiting a determined Curie temperature, transferred from a donor substrate to a carrier substrate by using a transfer technique including implanting light species into the donor substrate in order to produce an embrittlement plane, the thin layer having a first, free face and a second face that is arranged on the carrier substrate. The process comprises a first heat treatment of the transferred thin layer at a temperature higher than the Curie temperature, the thin layer exhibiting a multi-domain character upon completion of the first heat treatment, and introducing, after the first heat treatment, protons into the thin layer, followed by applying a second heat treatment of the thin layer at a temperature lower than the Curie temperature to generate an internal electric field that results in the thin layer being made single domain.
    Type: Application
    Filed: February 18, 2019
    Publication date: February 4, 2021
    Inventor: Alexis Drouin
  • Publication number: 20200389148
    Abstract: The invention relates to a SAW resonator (100) comprising at least: a substrate (102); a layer (108) of piezoelectric material arranged on the substrate; a first attenuation layer (112) arranged between the substrate and the layer of piezoelectric material, and/or, when the substrate comprises at least two different layers (104, 106), a second attenuation layer (114) arranged between the two layers of the substrate; and in which the at least one attenuation layer is/are heterogeneous.
    Type: Application
    Filed: March 9, 2018
    Publication date: December 10, 2020
    Applicants: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES, SOITEC
    Inventors: Thu Trang VO, Jean-Sebastien MOULET, Alexandre REINHARDT, Isabelle HUYET, Alexis DROUIN, Yann SINQUIN
  • Publication number: 20200186117
    Abstract: A process for transferring a thin layer consisting of a first material to a support substrate consisting of a second material having a different thermal expansion coefficient, comprises providing a donor substrate composed of an assembly of a thick layer formed of the first material and of a handle substrate having a thermal expansion coefficient similar to that of the support substrate, and the donor substrate having a main face on the side of the thick layer introducing light species into the thick layer to generate a plane of weakness therein and to define the thin layer between the plane of weakness and the main face of the donor substrate; assembling the main face of the donor substrate with a face of the support substrate; and detachment of the thin layer at the plane of weakness, the detachment comprising application of a heat treatment.
    Type: Application
    Filed: June 21, 2018
    Publication date: June 11, 2020
    Inventors: Isabelle Huyet, Cedric Charles-Alfred, Didier Landru, Alexis Drouin
  • Patent number: 10066777
    Abstract: The invention relates to an assembly comprising: an oil extraction pipe (4) having a thread; and a protector (1) for the thread of the extraction pipe (4), said protector (1) including a body and a thread complementary to that of the extraction pipe (4). The assembly is characterised in that it also comprises an elastomer film (60) affixed to the protector and designed to form a sealed connection between the extraction pipe (4) and the protector (1) when the protector (1) is positioned on the extraction pipe (4).
    Type: Grant
    Filed: September 1, 2011
    Date of Patent: September 4, 2018
    Assignee: PREMIUM PROTECTOR
    Inventors: Alexis Drouin, Thomas Charrue, Philippe Choffart
  • Patent number: 9151433
    Abstract: The invention relates to a protector (1, 7) for an oil extraction pipe. The invention comprises: a hollow, substantially frustoconical connecting segment (2) having a proximal end (21), a distal end (22) and a thread (42) complementary to that of the pipe; and a bumper segment (3) having a connecting end (31) in the extension of the connecting segment (2) and a free end (32), said bumper segment including an internal ring (33) extending in the extension of the connecting segment (2) and an external ring (34) extending coaxially from the connecting segment, defining an internal space between the internal (33) and external (34) rings and increasing the outer diameter of the protector (1, 7). The protector (1, 7) is characterized in that all of the walls thereof having a substantially equal thickness, such that the shape is suitable for production by means of injection, and in that it is produced by means of injection.
    Type: Grant
    Filed: July 8, 2011
    Date of Patent: October 6, 2015
    Assignee: PREMIUM PROTECTOR
    Inventors: Alexis Drouin, Thomas Charrue, Philippe Choffart
  • Patent number: 8985156
    Abstract: The invention relates to an assembly including: an petroleum extraction pipe (2) having a thread at the ends thereof, and two protectors (1) for the thread of said extraction pipe (2), each of the protectors including a tubular body and a thread that is complementary to said thread of the extraction pipe, wherein said assembly is characterized in that it includes at least one module (3) for containing information relating to at least one property of an extraction pipe (2), said module being removably connected to said extraction pipe (2).
    Type: Grant
    Filed: April 3, 2012
    Date of Patent: March 24, 2015
    Assignee: Premium Protector
    Inventors: Alexis Drouin, Thomas Charrue
  • Publication number: 20140130928
    Abstract: The invention relates to an assembly including: an petroleum extraction pipe (2) having a thread at the ends thereof, and two protectors (1) for the thread of said extraction pipe (2), each of the protectors including a tubular body and a thread that is complementary to said thread of the extraction pipe, wherein said assembly is characterized in that it includes at least one module (3) for containing information relating to at least one property of an extraction pipe (2), said module being removably connected to said extraction pipe (2).
    Type: Application
    Filed: April 3, 2012
    Publication date: May 15, 2014
    Inventors: Alexis Drouin, Thomas Charrue
  • Publication number: 20130299037
    Abstract: The invention relates to a protector (1, 7) for an oil extraction pipe. The invention comprises: a hollow, substantially frustoconical connecting segment (2) having a proximal end (21), a distal end (22) and a thread (42) complementary to that of the pipe; and a bumper segment (3) having a connecting end (31) in the extension of the connecting segment (2) and a free end (32), said bumper segment including an internal ring (33) extending in the extension of the connecting segment (2) and an external ring (34) extending coaxially from the connecting segment, defining an internal space between the internal (33) and external (34) rings and increasing the outer diameter of the protector (1, 7). The protector (1, 7) is characterised in that all of the walls thereof having a substantially equal thickness, such that the shape is suitable for production by means of injection, and in that it is produced by means of injection.
    Type: Application
    Filed: July 8, 2011
    Publication date: November 14, 2013
    Inventors: Alexis Drouin, Thomas Charrue, Philippe Choffart
  • Patent number: 8575010
    Abstract: The invention relates to a method for fabricating a semiconductor substrate by providing a silicon on insulator type substrate that includes a base, an insulating layer and a first semiconductor layer, doping the first semiconductor layer to thereby obtain a modified first semiconductor layer, and providing a second semiconductor layer with a different dopant concentration than the modified first semiconductor layer over or on the modified first semiconductor layer. With this method, an improved dopant concentration profile can be achieved through the various layers which makes the substrates in particular more suitable for various optoelectronic applications.
    Type: Grant
    Filed: February 26, 2009
    Date of Patent: November 5, 2013
    Assignee: Soitec
    Inventors: Alexis Drouin, Bernard Aspar, Christophe Desrumaux, Olivier Ledoux, Christophe Figuet
  • Publication number: 20130213517
    Abstract: The invention relates to an assembly comprising: an oil extraction pipe (4) having a thread; and a protector (1) for the thread of the extraction pipe (4), said protector (1) including a body and a thread complementary to that of the extraction pipe (4). The assembly is characterised in that it also comprises an elastomer film (60) affixed to the protector and designed to form a sealed connection between the extraction pipe (4) and the protector (1) when the protector (1) is positioned on the extraction pipe (4).
    Type: Application
    Filed: September 1, 2011
    Publication date: August 22, 2013
    Inventors: Alexis Drouin, Thomas Charrue, Philippe Choffart
  • Publication number: 20110024868
    Abstract: The invention relates to a method for fabricating a semiconductor substrate by providing a silicon on insulator type substrate that includes a base, an insulating layer and a first semiconductor layer, doping the first semiconductor layer to thereby obtain a modified first semiconductor layer, and providing a second semiconductor layer with a different dopant concentration than the modified first semiconductor layer over or on the modified first semiconductor layer. With this method, an improved dopant concentration profile can be achieved through the various layers which makes the substrates in particular more suitable for various optoelectronic applications.
    Type: Application
    Filed: February 26, 2009
    Publication date: February 3, 2011
    Inventors: Alexis Drouin, Bernard Aspar, Christophe Desrumaux, Oliver Ledoux, Christophe Figuet
  • Publication number: 20100164048
    Abstract: The disclosure provides a method for fabricating a semiconductor substrate comprising the steps of: providing a semiconductor on insulator type substrate, providing a diffusion barrier layer and providing a second semiconductor layer. By providing the diffusion barrier layer, it becomes possible to suppress diffusion from the highly doped first semiconductor layer into the second semiconductor layer. The invention also relates to a corresponding semiconductor substrate and opto-electronic devices comprising such a substrate.
    Type: Application
    Filed: December 22, 2009
    Publication date: July 1, 2010
    Applicant: S.O.I.TEC Silicon on Insulator Technologies
    Inventors: Christophe Figuet, Christophe Bouvier, Céline Cailler, Alexis Drouin, Thibaut Maurice