Patents by Inventor Alfred Floyd Renaldo
Alfred Floyd Renaldo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 7555828Abstract: A read sensor for a magneto resistive head is formed through the use of a bilayer lift-off mask. According to one embodiment, a release layer is formed on top of a sensor layer. A silicon-containing resist layer is formed over the release layer. The resist layer is patterned according to the desired dimensions of the read sensor. Then, plasma etching, such as oxygen plasma etching, is used to remove the portion of the release layer that is exposed by removal of resist material. The release layer may be etched to undercut the patterned resist layer, or may entirely removed beneath the patterned resist layer to provide a bridge of the resist material. In either case, isotropic plasma etching, anisotropic plasma etching, or some combination thereof may be applied.Type: GrantFiled: December 2, 2002Date of Patent: July 7, 2009Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Gregory Breyta, Mark Whitney Hart, Bulent Nihat Kurdi, Dennis Richard McKean, Alfred Floyd Renaldo, Douglas Johnson Werner
-
Patent number: 6934121Abstract: A process for planarizing a patterned metal structure for a magnetic thin film head includes the steps of applying an encapsulation/planarizing material on a substrate, spinning the substrate in a photoresist spinner or similar machine, curing the encapsulation/planarizing layer by energetic particles such as an electron beam. The planarizing process further comprises the step of polishing the entire structure using a conventional chemical-mechanical polishing step. The curing step takes place at the substrate temperature less than 200° C., which prevents the damages of the thin film head structures such as MR and GMR sensors. This process is cheap, efficient and easy to apply.Type: GrantFiled: October 9, 2003Date of Patent: August 23, 2005Assignee: International Business Machines CorporationInventors: Robert Dennis Miller, Alfred Floyd Renaldo, Willi Volksen, Howard Gordon Zolla
-
Patent number: 6913870Abstract: A material is deposited on a substrate by depositing a liftoff layer overlying the substrate, thereafter depositing a hard-mask layer overlying the liftoff layer, thereafter depositing an image layer in registry with a retained portion of the hard-mask layer, leaving a nonretained portion of the hard-mask layer which is not in registry with the image layer. The method further includes removing the nonretained portion of the hard-mask layer, removing at least a part of the thickness of the image layer, and removing a nonretained portion of the liftoff layer, which may include an undercut under the hard-mask layer. The deposited material is deposited onto the substrate from a source, and the retained portion of the hard-mask layer and any part of the liftoff layer remaining between the hard-mask layer and the substrate is thereafter removed.Type: GrantFiled: May 10, 2002Date of Patent: July 5, 2005Assignee: International Business Machines CorporationInventors: Douglas Johnson Werner, Alfred Floyd Renaldo
-
Patent number: 6861177Abstract: A method of forming a read sensor that has a very narrow track width is disclosed. The method involves forming a thin lift-off mask over a central region of a sensor layer, which is subsequently ion-milled and deposited with hard bias and lead layers. The thin lift-off mask is made by forming a release layer over the sensor layer; forming a hardmask layer over the release layer; forming a photoresist layer over the hardmask layer; imaging and developing the photoresist layer such that end portions of the photoresist layer are removed and a central portion of the photoresist layer remains; reactive ion etching (RIE) the hardmask layer such that end portions of the hardmask layer are removed and a central portion of the hardmask layer remains; stripping the central portion of the photoresist layer; and etching the release layer such that end portions of the release layer are removed and a central portion of the release layer remains.Type: GrantFiled: February 21, 2002Date of Patent: March 1, 2005Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Mustafa Pinarbasi, Ian Robson McFadyen, Alfred Floyd Renaldo, Randall George Simmons, Douglas Johnson Werner
-
Publication number: 20040103524Abstract: A read sensor for a magneto resistive head is formed through the use of a bilayer lift-off mask. According to one embodiment, a release layer is formed on top of a sensor layer. A silicon-containing resist layer is formed over the release layer. The resist layer is patterned according to the desired dimensions of the read sensor. Then, plasma etching, such as oxygen plasma etching, is used to remove the portion of the release layer that is exposed by removal of resist material. The release layer may be etched to undercut the patterned resist layer, or may entirely removed beneath the patterned resist layer to provide a bridge of the resist material. In either case, isotropic plasma etching, anisotropic plasma etching, or some combination thereof may be applied.Type: ApplicationFiled: December 2, 2002Publication date: June 3, 2004Inventors: Gregory Breyta, Mark Whitney Hart, Bulent Nihat Kurdi, Dennis Richard McKean, Alfred Floyd Renaldo, Douglas Johnson Werner
-
Publication number: 20040070877Abstract: A process for planarizing a patterned metal structure for a magnetic thin film head includes the steps of applying an encapsulation/planarizing material on a substrate, spinning the substrate in a photoresist spinner or similar machine, curing the encapsulation/planarizing layer by energetic particles such as an electron beam. The planarizing process further comprises the step of polishing the entire structure using a conventional chemical-mechanical polishing step. The curing step takes place at the substrate temperature less than 200° C., which prevents the damages of the thin film head structures such as MR and GMR sensors. This process is cheap, efficient and easy to apply.Type: ApplicationFiled: October 9, 2003Publication date: April 15, 2004Applicant: International Business Machines CorporationInventors: Robert Dennis Miller, Alfred Floyd Renaldo, Willi Volksen, Howard Gordon Zolla
-
Patent number: 6667850Abstract: The magnetic tape recording head of the present invention is formed with magnetic poles that are comprised of a laminated NiFeN/FeN structure. The method for fabricating the magnetic poles utilizes an additive photolithographic technique including a bilayer liftoff resist. In this fabrication method magnetic pole trenches are formed in the bilayer liftoff resist such that an undercut exists in the liftoff layer. Thereafter, the laminated NiFeN/FeN structure is sputter deposited into the trench, followed by the wet chemical removal of the bilayer resist.Type: GrantFiled: October 5, 2002Date of Patent: December 23, 2003Assignee: International Business Machines CorporationInventors: Mahbub R. Khan, Jane Ellyn Nealis, Alfred Floyd Renaldo, John David Westwood
-
Patent number: 6660640Abstract: A process for planarizing a patterned metal structure for a magnetic thin film head includes the steps of applying an encapsulation/planarizing material on a substrate, spinning the substrate in a photoresist spinner or similar machine, curing the encapsulation/planarizing layer by energetic particles such as an electron beam. The planarizing process further comprises the step of polishing the entire structure using a conventional chemical-mechanical polishing step. The curing step takes place at the substrate temperature less than 200° C., which prevents the damages of the thin film head structures such as MR and GMR sensors. This process is cheap, efficient and easy to apply.Type: GrantFiled: July 11, 2000Date of Patent: December 9, 2003Assignee: International Business Machines CorporationInventors: Robert Dennis Miller, Alfred Floyd Renaldo, Willi Volksen, Howard Gordon Zolla
-
Publication number: 20030211424Abstract: A material is deposited on a substrate by depositing a liftoff layer overlying the substrate, thereafter depositing a hard-mask layer overlying the liftoff layer, thereafter depositing an image layer in registry with a retained portion of the hard-mask layer, leaving a nonretained portion of the hard-mask layer which is not in registry with the image layer. The method further includes removing the nonretained portion of the hard-mask layer, removing at least a part of the thickness of the image layer, and removing a nonretained portion of the liftoff layer, which may include an undercut under the hard-mask layer. The deposited material is deposited onto the substrate from a source, and the retained portion of the hard-mask layer and any part of the liftoff layer remaining between the hard-mask layer and the substrate is thereafter removed.Type: ApplicationFiled: May 10, 2002Publication date: November 13, 2003Inventors: Douglas Johnson Werner, Alfred Floyd Renaldo
-
Publication number: 20030157803Abstract: A method of forming a read sensor that has a very narrow track width is disclosed. The method involves forming a thin lift-off mask over a central region of a sensor layer, which is subsequently ion-milled and deposited with hard bias and lead layers. The thin lift-off mask is made by forming a release layer over the sensor layer; forming a hardmask layer over the release layer; forming a photoresist layer over the hardmask layer; imaging and developing the photoresist layer such that end portions of the photoresist layer are removed and a central portion of the photoresist layer remains; reactive ion etching (RIE) the hardmask layer such that end portions of the hardmask layer are removed and a central portion of the hardmask layer remains; stripping the central portion of the photoresist layer; and etching the release layer such that end portions of the release layer are removed and a central portion of the release layer remains.Type: ApplicationFiled: February 21, 2002Publication date: August 21, 2003Inventors: Mustafa Pinarbasi, Ian Robson McFadyen, Alfred Floyd Renaldo, Randall George Simmons, Douglas Johnson Werner
-
Publication number: 20030036021Abstract: The magnetic tape recording head of the present invention is formed with magnetic poles that are comprised of a laminated NiFeN/FeN structure. The method for fabricating the magnetic poles utilizes an additive photolithographic technique including a bilayer liftoff resist. In this fabrication method magnetic pole trenches are formed in the bilayer liftoff resist such that an undercut exists in the liftoff layer. Thereafter, the laminated NiFeN/FeN structure is sputter deposited into the trench, followed by the wet chemical removal of the bilayer resist.Type: ApplicationFiled: October 5, 2002Publication date: February 20, 2003Inventors: Mahbub R. Khan, Jane Ellyn Nealis, Alfred Floyd Renaldo, John David Westwood
-
Patent number: 6495311Abstract: The magnetic tape recording head of the present invention is formed with magnetic poles that are comprised of a laminated NiFeN/FeN structure. The method for fabricating the magnetic poles utilizes an additive photolithographic technique including a bilayer liftoff resist. In this fabrication method magnetic pole trenches are formed in the bilayer liftoff resist such that an undercut exists in the liftoff layer. Thereafter, the laminated NiFeN/FeN structure is sputter deposited into the trench, followed by the wet chemical removal of the bilayer resist.Type: GrantFiled: March 17, 2000Date of Patent: December 17, 2002Assignee: International Business Machines CorporationInventors: Mahbub R. Khan, Jane Ellyn Nealis, Alfred Floyd Renaldo, John David Westwood
-
Publication number: 20010005741Abstract: An adhesive composition includes a polyphenolic polymer which has a first repeating unit and a second repeating unit of the formula: 1Type: ApplicationFiled: December 23, 1998Publication date: June 28, 2001Inventors: GREGORY BREYTA, THOMAS CARL CLARKE, DANIEL JOSEPH DAWSON, RONALD P. ESCH, ALFRED FLOYD RENALDO
-
Patent number: 6251562Abstract: An antireflective composition includes a polyphenolic polymer which has a first repeating unit and a second repeating unit of the formula: wherein each of R1, R2, R3, R4, and R5 is individually a hydroxy group, hydrogen or an azo dye and only one of R1, R2, R3, R4, and R5 is a hydroxy group.Type: GrantFiled: December 23, 1998Date of Patent: June 26, 2001Assignee: International Business Machines CorporationInventors: Gregory Breyta, Thomas Carl Clarke, Daniel Joseph Dawson, Ronald P. Esch, Alfred Floyd Renaldo
-
Patent number: 6218056Abstract: A method makes a highly defined bilayer lift-off mask wherein lift-off mask material is subjected to an electron beam for decreasing the molecular weight of a bottom release layer and increasing the molecular weight of a top photoresist layer so that a weak developer can be employed for patterning the bottom release layer and ion milling, which is employed for removing layers not covered by the lift-off mask, does not alter a track width of the top photoresist layer.Type: GrantFiled: March 30, 1999Date of Patent: April 17, 2001Assignee: International Business Machines CorporationInventors: Mustafa Pinarbasi, Alfred Floyd Renaldo
-
Patent number: 5939134Abstract: An improved process for making thin film magnetic heads using an insulation comprising a polymer, a crosslinking agent, and 4-sulfonate diazonaphthoquinone.Type: GrantFiled: July 31, 1997Date of Patent: August 17, 1999Assignee: International Business Machines CorporationInventors: Dennis Richard McKean, Alfred Floyd Renaldo
-
Patent number: 5702756Abstract: An improved process for making thin film magnetic heads using an insulation comprising a polymer, a crosslinking agent, and 4-sulfonate diazonaphthoquinone.Type: GrantFiled: July 10, 1996Date of Patent: December 30, 1997Assignee: International Business Machines CorporationInventors: Dennis Richard McKean, Alfred Floyd Renaldo