Patents by Inventor Alfred John Reich

Alfred John Reich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic proximity correction through subset feature modification
    Patent number: 5958635
    Abstract: Lithographic Proximity Correction (LPC) shapes are added (503) to a layer of a layout database file (501). Geometric criteria such as feature width are then used to filter the added LPC shapes (502). The LPC shapes are then modified (505) by determining which LPC shapes are within a predetermined distance from a shape in a layer of the second data base (504). The database file, including the modified LPC shapes, is then used to manufacture a set of lithographic masks (506). The lithographic masks are then used to pattern a set of wafers in the manufacture of integrated circuits (507).
    Type: Grant
    Filed: October 20, 1997
    Date of Patent: September 28, 1999
    Assignee: Motorola, Inc.
    Inventors: Alfred John Reich, Hak-Lay Chuang, Michael E. Kling, Paul G. Y. Tsui, Kevin Lucas, James N. Conner