Patents by Inventor Alfred R. Genis

Alfred R. Genis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8455278
    Abstract: N-V centers in diamond are created in a controlled manner. In one embodiment, a single crystal diamond is formed using a CVD process, and then annealed to remove N-V centers. A thin layer of single crystal diamond is then formed with a controlled number of N-V centers. The N-V centers form Qubits for use in electronic circuits. Masked and controlled ion implants, coupled with annealing are used in CVD formed diamond to create structures for both optical applications and nanoelectromechanical device formation. Waveguides may be formed optically coupled to the N-V centers and further coupled to sources and detectors of light to interact with the N-V centers.
    Type: Grant
    Filed: November 14, 2011
    Date of Patent: June 4, 2013
    Assignee: Apollo Diamond, Inc
    Inventors: Robert C. Linares, Patrick J. Doering, William W. Dromeshauser, Bryant Linares, Alfred R. Genis
  • Publication number: 20120058602
    Abstract: N-V centers in diamond are created in a controlled manner. In one embodiment, a single crystal diamond is formed using a CVD process, and then annealed to remove N-V centers. A thin layer of single crystal diamond is then formed with a controlled number of N-V centers. The N-V centers form Qubits for use in electronic circuits. Masked and controlled ion implants, coupled with annealing are used in CVD formed diamond to create structures for both optical applications and nanoelectromechanical device formation. Waveguides may be formed optically coupled to the N-V centers and further coupled to sources and detectors of light to interact with the N-V centers.
    Type: Application
    Filed: November 14, 2011
    Publication date: March 8, 2012
    Applicant: Apollo Diamond, Inc
    Inventors: Robert C. Linares, Patrick J. Doering, William W. Dromeshauser, Bryant Linares, Alfred R. Genis
  • Patent number: 8058085
    Abstract: N-V centers in diamond are created in a controlled manner. In one embodiment, a single crystal diamond is formed using a CVD process, and then annealed to remove N-V centers. A thin layer of single crystal diamond is then formed with a controlled number of N-V centers. The N-V centers form Qubits for use in electronic circuits. Masked and controlled ion implants, coupled with annealing are used in CVD formed diamond to create structures for both optical applications and nanoelectromechanical device formation. Waveguides may be formed optically coupled to the N-V centers and further coupled to sources and detectors of light to interact with the N-V centers.
    Type: Grant
    Filed: July 11, 2006
    Date of Patent: November 15, 2011
    Assignee: Apollo Diamond, Inc
    Inventors: Robert C. Linares, Patrick J. Doering, William W. Dromeshauser, Bryant Linares, Alfred R. Genis
  • Publication number: 20110054450
    Abstract: Masked and controlled ion implants, coupled with annealing or etching are used in CVD formed single crystal diamond to create structures for both optical applications, nanoelectromechanical device formation, and medical device formation. Ion implantation is employed to deliver one or more atomic species into and beneath the diamond growth surface in order to form an implanted layer with a peak concentration of atoms at a predetermined depth beneath the diamond growth surface. The composition is heated in a non-oxidizing environment under suitable conditions to cause separation of the diamond proximate the implanted layer. Further ion implants may be used in released structures to straighten or curve them as desired. Boron doping may also be utilized to create conductive diamond structures.
    Type: Application
    Filed: November 3, 2010
    Publication date: March 3, 2011
    Applicant: Apollo Diamond, Inc
    Inventors: Robert C. Linares, Patrick J. Doering, Bryant Linares, Alfred R. Genis, William W. Dromeshauser, Michael Murray, Alicia E. Novak, John M. Abrahams
  • Patent number: 7829377
    Abstract: Masked and controlled ion implants, coupled with annealing or etching are used in CVD formed single crystal diamond to create structures for both optical applications, nanoelectromechanical device formation, and medical device formation. Ion implantation is employed to deliver one or more atomic species into and beneath the diamond growth surface in order to form an implanted layer with a peak concentration of atoms at a predetermined depth beneath the diamond growth surface. The composition is heated in a non-oxidizing environment under suitable conditions to cause separation of the diamond proximate the implanted layer. Further ion implants may be used in released structures to straighten or curve them as desired. Boron doping may also be utilized to create conductive diamond structures.
    Type: Grant
    Filed: January 11, 2006
    Date of Patent: November 9, 2010
    Assignee: Apollo Diamond, Inc
    Inventors: Robert C. Linares, Patrick J. Doering, Bryant Linares, Alfred R. Genis, William W. Dromeshauser, Michael Murray, Alicia E. Novak, John M. Abrahams
  • Publication number: 20090214169
    Abstract: N-V centers in diamond are created in a controlled manner. In one embodiment, a single crystal diamond is formed using a CVD process, and then annealed to remove N-V centers. A thin layer of single crystal diamond is then formed with a controlled number of N-V centers. The N-V centers form Qubits for use in electronic circuits. Masked and controlled ion implants, coupled with annealing are used in CVD formed diamond to create structures for both optical applications and nanoelectromechanical device formation. Waveguides may be formed optically coupled to the N-V centers and further coupled to sources and detectors of light to interact with the N-V centers.
    Type: Application
    Filed: July 11, 2006
    Publication date: August 27, 2009
    Inventors: Robert C. Linares, Patrick J. Doering, William W. Dromeshauser, Bryant Linares, Alfred R. Genis
  • Publication number: 20080170981
    Abstract: A grown single crystal diamond is polished using a non contact polishing technique, which leaves a residue on the diamond surface. In one embodiment, a wet chemical etch is performed to remove the residue, leaving a highly polished single crystal diamond surface. In a further embodiment, a colloidal silica solution is used in combination with rotating polishing pads to remove the residue. Both residue removing techniques may be used in further embodiments.
    Type: Application
    Filed: January 17, 2007
    Publication date: July 17, 2008
    Inventors: Alfred R. Genis, William W. Dromeshauser, Robert C. Linares
  • Patent number: 7238088
    Abstract: A grown single crystal diamond is polished using a non contact polishing technique, which leaves a residue on the diamond surface. In one embodiment, a wet chemical etch is performed to remove the residue, leaving a highly polished single crystal diamond surface. In a further embodiment, a colloidal silica solution is used in combination with rotating polishing pads to remove the residue. Both residue removing techniques may be used in further embodiments.
    Type: Grant
    Filed: January 5, 2006
    Date of Patent: July 3, 2007
    Assignee: Apollo Diamond, Inc.
    Inventors: Alfred R. Genis, William W. Dromeshauser, Robert C. Linares