Patents by Inventor Alfred T. Jeffries, III

Alfred T. Jeffries, III has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures
    Patent number: 4992596
    Abstract: A trinuclear novolak oligomer of the formula (I): ##STR1## wherein each X is selected from the group consisting of hydroxyl group and halide group and Y is selected from the group consisting of a lower alkyl group having 1-4 carbon atoms and halogen atom.
    Type: Grant
    Filed: June 8, 1990
    Date of Patent: February 12, 1991
    Assignee: Olin Hunt Specialty Products Inc.
    Inventors: Alfred T. Jeffries, III, Andrew J. Blakeney, Medhat A. Toukhy
  • Thermally stable phenolic resin compositions with ortho, ortho methylene linkage
    Patent number: 4970287
    Abstract: A phenolic resin composition comprising units of formula (I): ##STR1## wherein R.sub.1 is a halogen and R.sub.2 is a lower alkyl group having 1 to 4 carbon atoms, and said units of formula (I) are made by condensing the corresponding halogen-substituted resorcinol of formula (A): ##STR2## wherein R.sub.1 is defined above, with the corresponding para-lower alkyl-substituted 2,6-bis(hydroxymethyl)-phenol of formula (B): ##STR3## wherein R.sub.2 is defined above, and wherein the mole ratio of A:B is from about 0.5:1 to 1.7:1. This phenolic resin may be mixed with photoactive compounds (e.g. 1,2-naphthoquinone diazide sensitizers) to prepare a light-sensitive composition useful as a positive-working photoresist.
    Type: Grant
    Filed: March 20, 1989
    Date of Patent: November 13, 1990
    Assignee: Olin Hunt Specialty Products Inc.
    Inventors: Andrew J. Blakeney, Alfred T. Jeffries, III, Thomas R. Sarubbi
  • Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group
    Patent number: 4957846
    Abstract: A trinuclear novolak oligomer of the formula (I): ##STR1## wherein each X is selected from the group consisting of hydroxyl group and halide group and Y is selected from the group consisting of a lower alkyl group having 1-4 carbon atoms and halogen atom.
    Type: Grant
    Filed: December 27, 1988
    Date of Patent: September 18, 1990
    Assignee: Olin Hunt Specialty Products Inc.
    Inventors: Alfred T. Jeffries, III, Andrew J. Blakeney, Medhat A. Toukhy
  • Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin
    Patent number: 4837121
    Abstract: A phenolic resin composition comprising units of formula (I): ##STR1## wherein R.sub.1 is a halogen and R.sub.2 is a lower alkyl group having 1 to 4 carbon atoms and said units of formula (I) are made by condensing the corresponding halogen-substituted resorcinol of formula (A): ##STR2## wherein R.sub.1 is defined above, with the corresponding para-lower alkyl-substituted 2,6-bis(hydroxymethyl)-phenol of formula (B): ##STR3## wherein R.sub.2 is defined above, and wherein the mole ratio of A:B is from about 0.5:1 to 1.7:1. This phenolic resin may be mixed with photoactive compounds (e.g. 1,2-naphthoquinone diazide sensitizers ) to prepare a light-sensitive composition useful as a positive-working photoresist.
    Type: Grant
    Filed: November 23, 1987
    Date of Patent: June 6, 1989
    Assignee: Olin Hunt Specialty Products Inc.
    Inventors: Andrew J. Blakeney, Alfred T. Jeffries, III, Thomas R. Sarubbi
  • Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures
    Patent number: 4797345
    Abstract: Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoester of a cycloalkyl-substituted phenol corresponding to the formula: ##STR1## wherein n is from about 2 to about 10 and their use in light-sensitive mixtures (e.g. positive-working photoresist compositions) also containing alkali-soluble resins such as phenol-formaldehyde novolaks and cresol-formaldehyde novolaks as well as substrates coated therewith.
    Type: Grant
    Filed: July 1, 1987
    Date of Patent: January 10, 1989
    Assignee: Olin Hunt Specialty Products, Inc.
    Inventor: Alfred T. Jeffries, III
  • Antireflective coatings for use in the manufacture of semi-conductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processes
    Patent number: 4617252
    Abstract: Disclosed are antireflective layers for use in the manufacture of semi-conductor devices, methods and solutions for making such antireflective layers, and the use of such antireflective layers to absorb light in ultraviolet photolithography. The antireflective layers that are utilized comprise a polyphenylquinoxaline.
    Type: Grant
    Filed: June 12, 1984
    Date of Patent: October 14, 1986
    Assignee: Philip A. Hunt Chemical Corporation
    Inventors: William F. Cordes, III, Alfred T. Jeffries, III