Abstract: A plasma process machine includes at least two electrodes disposed in a processing chamber and in contact with targets, an alternating current source connected to supply power to the electrodes, and a power delivery controller adapted to control power delivered by the alternating current source to the electrodes. The power delivery controller is configured to determine a control value from a comparison between actual power delivery as detected by a detector and a desired power delivery, and to adjust power delivery based on the control value.

Abstract: A plasma process machine includes at least two electrodes disposed in a processing chamber and in contact with targets, an alternating current source connected to supply power to the electrodes, and a power delivery controller adapted to control power delivered by the alternating current source to the electrodes. The power delivery controller is configured to determine a control value from a comparison between actual power delivery as detected by a detector and a desired power delivery, and to adjust power delivery based on the control.

Abstract: New methods are used for detecting arcs in a plasma process that is fed by, for example, a freely oscillating AC generator with an output signal of the AC generator for supplying power. The method includes measuring or determining a reference value that is based on a time response of the output signal or of an internal signal of the AC generator relating to the output signal. The methods also include comparing the reference value with a threshold value and detecting an arc when a predetermined result of the comparison is obtained.

Abstract: A plasma excitation system includes at least one DC current supply connected to a mains supply, at least one medium frequency (MF) unit connected to the at least one DC current supply for generating an AC voltage at its output, and a controller. The output of the MF unit is connected to electrodes of a coating chamber. The controller is connected to the at least one DC current supply for regulating and/or controlling an output value of the DC current supply, and is also connected to the at least one MF unit for regulating and/or controlling an output value of the MF unit. The controller includes at least one input interface for supplying a value describing an output value of the at least one MF unit, and at least one control output interface for connecting a control input of the at least one MF unit.

Abstract: New methods are used for detecting arcs in a plasma process that is fed by, for example, a freely oscillating AC generator with an output signal of the AC generator for supplying power. The method includes measuring or determining a reference value that is based on a time response of the output signal or of an internal signal of the AC generator relating to the output signal. The methods also include comparing the reference value with a threshold value and detecting an arc when a predetermined result of the comparison is obtained.

Abstract: A plasma process machine includes at least two electrodes disposed in a processing chamber and in contact with targets, an alternating current source connected to supply power to the electrodes, and a power delivery controller adapted to control power delivered by the alternating current source to the electrodes. The power delivery controller is configured to determine a control value from a comparison between actual power delivery as detected by a detector and a desired power delivery, and to adjust power delivery based on the control value.