Patents by Inventor Alfred U. Mac Rae

Alfred U. Mac Rae has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Defining a low-density pattern in a photoresist with an electron beam exposure system
    Patent number: 4163155
    Abstract: By modifying the raster scanning mode of operation of an electron beam exposure system, it is practicable to directly define low-density features (100-102) in a relatively insensitive positive photoresist (10) that exhibits high resolution and good processing characteristics. As a result, it is feasible to utilize such a system as an adjunct in what is otherwise a photolithographic fabrication process to define certain critical features of a microminiature device.
    Type: Grant
    Filed: April 7, 1978
    Date of Patent: July 31, 1979
    Assignee: Bell Telephone Laboratories, Incorporated
    Inventors: David S. Alles, Alfred U. Mac Rae, Roger F. W. Pease