Patents by Inventor Ali ALSAQQA

Ali ALSAQQA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12591132
    Abstract: An optical filter apparatus including an optical divergence device, operable to receive optical pulses and spatially distribute the optical pulses over an optical plane in dependence with a pulse energy of each of the optical pulses; and a spatial filter, located at the optical plane, operable to apply spatial filtering to the optical pulses based on a location of each of the optical pulses at the optical plane resulting from the spatial distributing.
    Type: Grant
    Filed: January 12, 2022
    Date of Patent: March 31, 2026
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Ali Alsaqqa, Patrick Sebastian Uebel, Paulus Antonius Andreas Teunissen
  • Patent number: 12535743
    Abstract: A radiation source arrangement including: a radiation source operable to generate source radiation including source energy pulses; and at least one non-linear energy-filter operable to filter the source radiation to obtain filtered radiation including filtered energy pulses. The at least one non-linear energy-filter is operable to mitigate variation in energy in the filtered radiation by reducing the energy level of the source energy pulses which have an energy level corresponding to one of both extremities of an energy distribution of the source energy pulses by a greater amount than the source energy pulses which have an energy level corresponding to a peak of the energy distribution.
    Type: Grant
    Filed: August 3, 2021
    Date of Patent: January 27, 2026
    Inventors: Ali Alsaqqa, Aabid Patel, Patrick Sebastian Uebel, Amir Abdolvand, Paulus Antonius Andreas Teunissen, Wisham F Kadhim
  • Publication number: 20240134182
    Abstract: An optical filter apparatus including an optical divergence device, operable to receive optical pulses and spatially distribute the optical pulses over an optical plane in dependence with a pulse energy of each of the optical pulses; and a spatial filter, located at the optical plane, operable to apply spatial filtering to the optical pulses based on a location of each of the optical pulses at the optical plane resulting from the spatial distributing.
    Type: Application
    Filed: January 12, 2022
    Publication date: April 25, 2024
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Ali ALSAQQA, Patrick Sebastian UEBEL, Paulus Antonius Andreas TEUNISSEN
  • Publication number: 20240004308
    Abstract: A radiation source arrangement including: a radiation source operable to generate source radiation including source energy pulses; and at least one non-linear energy-filter operable to filter the source radiation to obtain filtered radiation including filtered energy pulses. The at least one non-linear energy-filter is operable to mitigate variation in energy in the filtered radiation by reducing the energy level of the source energy pulses which have an energy level corresponding to one of both extremities of an energy distribution of the source energy pulses by a greater amount than the source energy pulses which have an energy level corresponding to a peak of the energy distribution.
    Type: Application
    Filed: August 3, 2021
    Publication date: January 4, 2024
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Ali ALSAQQA, Aabid PATEL, Patrick Sebastian UEBEL, Amir ABDOLVAND, Paulus Antonius Andreas TEUNISSEN, Wisham F. KADHIM
  • Patent number: 11703771
    Abstract: A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.
    Type: Grant
    Filed: October 12, 2020
    Date of Patent: July 18, 2023
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Ali Alsaqqa, Fadi El-Ghussein, Lambertus Gerardus Maria Kessels, Roxana Rezvani Naraghi, Krishanu Shome, Timothy Allan Brunner, Sergei Sokolov
  • Publication number: 20220390861
    Abstract: A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.
    Type: Application
    Filed: October 12, 2020
    Publication date: December 8, 2022
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Ali ALSAQQA, Fadi EL-GHUSSEIN, Lambertus Gerardus Maria KESSELS, Roxana REZVANI NARAGHI, Krishanu SHOME, Timothy Allan BRUNNER, Sergei SOKOLOV