Abstract: A system for measuring rolling resistance of a substrate may include a transparent support member including a contact surface, a rolling member including a cylindrical convex surface with the substrate attached on the cylindrical convex surface, the cylindrical convex surface placed on the contact surface, an oscillation mechanism coupled with the rolling member configured to drive an oscillatory rotational movement of the rolling member about a longitudinal axis of the rolling member. The oscillation mechanism may include two parallel arms attached at their respective midpoints to either base ends of the rolling member on a pivot axis overlapping the longitudinal axis of the rolling member, the two parallel arms attached to one another at respective ends of the two parallel arms by two links, and two adjustable weights, each of the two adjustable weights mounted on a respective link of the two links.

Abstract: A system for measuring rolling resistance of a substrate may include a transparent support member including a contact surface, a rolling member including a cylindrical convex surface with the substrate attached on the cylindrical convex surface, the cylindrical convex surface placed on the contact surface, an oscillation mechanism coupled with the rolling member configured to drive an oscillatory rotational movement of the rolling member about a longitudinal axis of the rolling member. The oscillation mechanism may include two parallel arms attached at their respective midpoints to either base ends of the rolling member on a pivot axis overlapping the longitudinal axis of the rolling member, the two parallel arms attached to one another at respective ends of the two parallel arms by two links, and two adjustable weights, each of the two adjustable weights mounted on a respective link of the two links.