Patents by Inventor Alice Gheen

Alice Gheen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6816513
    Abstract: In the present invention, methods and apparatus for making efficient cladding pumping fiber lasers is disclosed. In particular, new fiber cladding geometry and method of construct fiber lasers and amplifiers using the laser fibers of the current invention are disclosed. The aspects of the present invention will facilitate the realization of high-efficiency and high-power fiber lasers and amplifiers. In the present invention, cladding boundary geometry structures that can prevent the formation of local modes are disclosed. Thus the pumping laser coupling method can be used for the construction of high-efficiency fiber lasers.
    Type: Grant
    Filed: April 2, 2001
    Date of Patent: November 9, 2004
    Assignee: Apollo Instruments, Inc.
    Inventors: Zhijiang Wang, Ying Wang, Alice Gheen
  • Publication number: 20020141718
    Abstract: In the present invention, methods and apparatus for making efficient cladding pumping fiber lasers is disclosed. In particular, new fiber cladding geometry and method of construct fiber lasers and amplifiers using the laser fibers of the current invention are disclosed. The aspects of the present invention will facilitate the realization of high-efficiency and high-power fiber lasers and amplifiers. In the present invention, cladding boundary geometry structures that can prevent the formation of local modes are disclosed. Thus the pumping laser coupling method can be used for the construction of high-efficiency fiber lasers.
    Type: Application
    Filed: April 2, 2001
    Publication date: October 3, 2002
    Inventors: Zhijiang Wang, Ying Wang, Alice Gheen
  • Patent number: 5610754
    Abstract: A photolithography method copies a pattern plane onto a working plane by a rotating imaging system. The pattern plane is parallel to the working plane. At a given instance, the imaging system images a small region of the pattern plane to the working plane. The imaging system rotates around a fixed axis perpendicular to the pattern plane and on each pass copies a circular arc shaped region from the pattern plane to the working plane. Synchronized translation of the pattern plane and working plane in conjunction with rotation of the imaging system allows the entire pattern plane to be copied to the working plane. The photolithography method can achieve high resolution over a large field-of-view with high write speed and can include an autofocus system to account for variation in the flatness of the working plane. This photolithography method can be used in the visible, UV, IR or x-ray wavebands.
    Type: Grant
    Filed: August 9, 1994
    Date of Patent: March 11, 1997
    Inventors: Gregory Gheen, Alice Gheen, Zhijiang Wang