Abstract: Compositions are provided for removing nail polish that include a co-mixture of monoalcohol, glycerin, and solvent consisting of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The composition for includes a co-mixture of monoalcohol, glycerin, and solvent that consists of C2-C3 monoalcohol; glycerin; and less than 55% by weight of solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of greater than about 0.6. If the solvent includes C2-C4 alkyl acetate then the concentration of C2-C4 alkyl acetate is less than 30% by weight. The composition further includes polyacrylamide and water. The concentration by weight of water in the composition is less than the concentration by weight of glycerin. Methods are also provided.

Abstract: Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and acetone. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of less than about 0.6. The composition further includes a cellulose polymer soluble in said C2-C3 monoalcohol. The concentration by weight of water in the composition is less than the concentration by weight of glycerin.

Abstract: Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.

Abstract: Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.

Abstract: Compositions are provided for removing nail polish that include a co-mixture of monoalcohol, glycerin, and solvent consisting of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The composition for includes a co-mixture of monoalcohol, glycerin, and solvent that consists of C2-C3 monoalcohol; glycerin; and less than 55% by weight of solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of greater than about 0.6. If the solvent includes C2-C4 alkyl acetate then the concentration of C2-C4 alkyl acetate is less than 30% by weight. The composition further includes polyacrylamide and water. The concentration by weight of water in the composition is less than the concentration by weight of glycerin. Methods are also provided.

Abstract: The invention relates to water-in-oil (w/o) emulsion compositions for hair, eyelashes and/or eyebrows including at least one low HLB surfactant, at least one silicone gum, and at least one siloxysilicate resin, as well as to methods of making and using such emulsions. Preferably, the composition is a composition for eyelashes, for example a mascara composition further including at least one colorant.

Abstract: The invention relates to water-in-oil (w/o) emulsion compositions for hair, eyelashes and/or eyebrows including at least one latex containing polymer containing at least one styrene group and at least one siloxysilicate resin, as well as to methods of making and using such emulsions. Preferably, the composition is a composition for eyelashes, for example a mascara composition further including at least one colorant.

Abstract: Compositions are provided for removing nail polish that include a co-mixture of monoalcohol, glycerin, and solvent consisting of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The composition for includes a co-mixture of monoalcohol, glycerin, and solvent that consists of C2-C3 monoalcohol; glycerin; and less than 55% by weight of solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of greater than about 0.6. If the solvent includes C2-C4 alkyl acetate then the concentration of C2-C4 alkyl acetate is less than 30% by weight. The composition further includes polyacrylamide and water. The concentration by weight of water in the composition is less than the concentration by weight of glycerin. Methods are also provided.

Abstract: Disclosed are mono-dose products and systems for caring for, cleansing, and/or conditioning keratinous substrates, comprising an internal core formulation comprising at least one component chosen from surfactants and conditioning agents, a protective shell coating comprising at least one structuring agent, and optionally a water-resistant coating comprising at least one wax. Also disclosed are methods of caring for, cleansing, and/or conditioning the skin, hair, and/or scalp with the mono-dose products and systems.

Abstract: Compositions are provided for removing nail polish that include a co-mixture of monoalcohol, glycerin, and solvent consisting of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The composition for includes a co-mixture of monoalcohol, glycerin, and solvent that consists of C2-C3 monoalcohol; glycerin; and less than 55% by weight of solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of greater than about 0.6. If the solvent includes C2-C4 alkyl acetate then the concentration of C2-C4 alkyl acetate is less than 30% by weight. The composition further includes polyacrylamide and water. The concentration by weight of water in the composition is less than the concentration by weight of glycerin. Methods are also provided.

Abstract: Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.

Abstract: Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and acetone. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of less than about 0.6. The composition further includes a cellulose polymer soluble in said C2-C3 monoalcohol. The concentration by weight of water in the composition is less than the concentration by weight of glycerin.

Abstract: A dye-free nail varnish that is used alone or with a stamp to generate a colored coating under incident white light is presented. The nail varnish includes photonic particles and/or block copolymers that can self-assemble to provide a structurally colored coating. The stamp presents a pattern of repeating nanostructures that can be transferred by imprinting the stamp on a coating of a dye-free nail varnish, thereby providing a structurally colored nail varnish coating. Thus, the nail varnish and stamp, independently or together, provide structurally colored coatings without the use of dyes or pigments.

Abstract: A dye-free nail varnish that is used alone or with a stamp to generate a colored coating under incident white light is presented. The nail varnish includes photonic particles and/or block copolymers that can self-assemble to provide a structurally colored coating. The stamp presents a pattern of repeating nanostructures that can be transferred by imprinting the stamp on a coating of a dye-free nail varnish, thereby providing a structurally colored nail varnish coating. Thus, the nail varnish and stamp, independently or together, provide structurally colored coatings without the use of dyes or pigments.