Patents by Inventor Allan Awtrey

Allan Awtrey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Developing photoresist with supercritical fluid and developer
    Publication number: 20050008980
    Abstract: A method of developing a polymeric film without the need for a water rinse step. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.
    Type: Application
    Filed: August 3, 2004
    Publication date: January 13, 2005
    Inventors: Chantal Arena-Foster, Allan Awtrey, Nicholas Ryza, Paul Schilling