Patents by Inventor Allan Glenson

Allan Glenson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing pad for in-situ endpoint detection
    Publication number: 20040106357
    Abstract: An apparatus and method of chemical mechanical polishing (CMP) of a wafer employing a device for determining, in-situ, during the CMP process, an endpoint where the process is to be terminated. This device includes a laser interferometer capable of generating a laser beam directed towards the wafer and detecting light reflected from the wafer, and a window disposed adjacent to a hole formed through a platen. The window provides a pathway for the laser beam during at least part of the time the wafer overlies the window.
    Type: Application
    Filed: November 25, 2003
    Publication date: June 3, 2004
    Applicant: Applied Materials, Inc., a Delaware corporation
    Inventors: Manoocher Birang, Allan Glenson