Abstract: Methods are provided for making a treatment composition by loading active components into a high pressure vessel and pressurizing the high pressure vessel with carbon dioxide to reach a pressure within the high pressure vessel of about 400 pounds per square inch to about 1,070 pounds per square inch. The active components can include a protein denaturant and a surfactant, and optionally an acaricide. In one particular embodiment, this method can be used to clean a substrate, by loading the substrate into the high pressure vessel prior to pressurizing with carbon dioxide. Methods are also provided for treating a substrate to clean it from dust mites by delivering dry ice particles to the substrate, and vacuuming the substrate. Treatment compositions are also generally provided.

Abstract: Methods are provided for making a treatment composition by loading active components into a high pressure vessel and pressurizing the high pressure vessel with carbon dioxide to reach a pressure within the high pressure vessel of about 400 pounds per square inch to about 1,070 pounds per square inch. The active components can include a protein denaturant and a surfactant, and optionally an acaricide. In one particular embodiment, this method can be used to clean a substrate, by loading the substrate into the high pressure vessel prior to pressurizing with carbon dioxide. Methods are also provided for treating a substrate to clean it from dust mites by delivering dry ice particles to the substrate, and vacuuming the substrate. Treatment compositions are also generally provided.

Abstract: Methods are provided for making a treatment composition by loading active components into a high pressure vessel and pressurizing the high pressure vessel with carbon dioxide to reach a pressure within the high pressure vessel of about 400 pounds per square inch to about 1,070 pounds per square inch. The active components can include a protein denaturant and a surfactant, and optionally an acaricide. In one particular embodiment, this method can be used to clean a substrate, by loading the substrate into the high pressure vessel prior to pressurizing with carbon dioxide. Methods are also provided for treating a substrate to clean it from dust mites by delivering dry ice particles to the substrate, and vacuuming the substrate. Treatment compositions are also generally provided.

Abstract: Methods are provided for making a treatment composition by loading active components into a high pressure vessel and pressurizing the high pressure vessel with carbon dioxide to reach a pressure within the high pressure vessel of about 400 pounds per square inch to about 1,070 pounds per square inch. The active components can include a protein denaturant and a surfactant, and optionally an acaricide. In one particular embodiment, this method can be used to clean a substrate, by loading the substrate into the high pressure vessel prior to pressurizing with carbon dioxide. Methods are also provided for treating a substrate to clean it from dust mites by delivering dry ice particles to the substrate, and vacuuming the substrate. Treatment compositions are also generally provided.