Patents by Inventor Allan Xiao Yu Gu

Allan Xiao Yu Gu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Masks for double patterning photolithography
    Patent number: 8839160
    Abstract: Improved masks for double patterning lithography are described. In one example, conflict spaces between features of a target design are identified. The conflict spaces are represented as nodes of a graph. Connections are inserted between nodes based on a local search. The connections are cut to determine double patterning mask assignment. The connections are extended to form a checkerboard that is then overlayed on the target mask design to split the features of the target mask design for double patterning.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: September 16, 2014
    Assignee: Intel Corporation
    Inventors: Carlos R. Castro-Pareja, Allan Xiao Yu Gu
  • MASKS FOR DOUBLE PATTERNING PHOTOLITHOGRAPHY
    Publication number: 20140047398
    Abstract: Improved masks for double patterning lithography are described. In one example, conflict spaces between features of a target design are identified. The conflict spaces are represented as nodes of a graph. Connections are inserted between nodes based on a local search. The connections are cut to determine double patterning mask assignment. The connections are extended to form a checkerboard that is then overlayed on the target mask design to split the features of the target mask design for double patterning.
    Type: Application
    Filed: December 29, 2011
    Publication date: February 13, 2014
    Inventors: Carlos R. Castro-Pareja, Allan Xiao Yu Gu