Patents by Inventor Allen Bourez

Allen Bourez has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dual position DC magnetron assembly
    Patent number: 8658003
    Abstract: A sputtering system includes a first sputtering assembly configured to sputter material onto a first disk and a second sputtering assembly configured to sputter material onto a second disk, the second sputtering assembly positioned proximate the first sputtering assembly. The first sputtering assembly includes a first magnetic ring, and the second sputtering assembly includes a second magnetic ring. The first magnetic ring includes a first region of lower relative magnetic strength positioned near the second magnetic ring, and the second magnetic ring includes a second region of lower relative magnetic strength positioned near the first magnetic ring.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: February 25, 2014
    Assignee: WD Media, LLC
    Inventor: Allen Bourez
  • Dual position DC magnetron assembly
    Patent number: 8137517
    Abstract: A sputtering system includes a first sputtering assembly configured to sputter material onto a first disk and a second sputtering assembly configured to sputter material onto a second disk, the second sputtering assembly positioned proximate the first sputtering assembly. The first sputtering assembly includes a first magnetic ring, and the second sputtering assembly includes a second magnetic ring. The first magnetic ring includes a first region of lower relative magnetic strength positioned near the second magnetic ring, and the second magnetic ring includes a second region of lower relative magnetic strength positioned near the first magnetic ring.
    Type: Grant
    Filed: February 10, 2009
    Date of Patent: March 20, 2012
    Assignee: WD Media, Inc.
    Inventor: Allen Bourez
  • Process chamber isolation system in a deposition apparatus
    Patent number: 6063248
    Abstract: An improvement in an apparatus having an external casing defining a processing chamber for deposition of a film on a substrate and an opening in the processing chamber through which a substrate is introduced for deposition is described. The improvement comprises an internal casing member moveably mounted within the processing chamber for movement between a first position which allows deposition onto the substrate to occur and a second position at which the casing is in sealing engagement with the opening to form an isolation chamber within the processing chamber and effective to isolate the substrate from processing chamber. The invention also includes a method for reducing cross-contamination between processing chambers in such an apparatus and a method for reducing particulate contamination to media prepared in such a deposition apparatus.
    Type: Grant
    Filed: November 12, 1998
    Date of Patent: May 16, 2000
    Assignee: HMT Technology Corporation
    Inventors: Allen Bourez, Eugene V. Anoikin