Patents by Inventor Allison C. Tonk

Allison C. Tonk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and compositions for doping silicon substrates with molecular monolayers
    Patent number: 8835290
    Abstract: Compositions and methods for doping silicon substrates by treating the substrate with a diluted dopant solution comprising tetraethylene glycol dimethyl ether (tetraglyme) and a dopant-containing material and subsequently diffusing the dopant into the surface by rapid thermal annealing. Diethyl-1-propylphosphonate and allylboronic acid pinacol ester are preferred dopant-containing materials, and are preferably included in the diluted dopant solution in an amount ranging from about 1% to about 20%, with a dopant amount of 4% or less being more preferred.
    Type: Grant
    Filed: May 2, 2013
    Date of Patent: September 16, 2014
    Assignee: Dynaloy, LLC
    Inventors: Kimberly Dona Pollard, Allison C. Tonk
  • METHODS AND COMPOSITIONS FOR DOPING SILICON SUBSTRATES WITH MOLECULAR MONOLAYERS
    Publication number: 20130260545
    Abstract: Compositions and methods for doping silicon substrates by treating the substrate with a diluted dopant solution comprising tetraethylene glycol dimethyl ether (tetraglyme) and a dopant-containing material and subsequently diffusing the dopant into the surface by rapid thermal annealing. Diethyl-1-propylphosphonate and allylboronic acid pinacol ester are preferred dopant-containing materials, and are preferably included in the diluted dopant solution in an amount ranging from about 1% to about 20%, with a dopant amount of 4% or less being more preferred.
    Type: Application
    Filed: May 2, 2013
    Publication date: October 3, 2013
    Applicant: Dynaloy, LLC
    Inventors: Kimberly Dona Pollard, Allison C. Tonk
  • Methods and compositions for doping silicon substrates with molecular monolayers
    Patent number: 8466035
    Abstract: Compositions and methods for doping silicon substrates by treating the substrate with a diluted dopant solution comprising tetraethylene glycol dimethyl ether (tetraglyme) and a dopant-containing material and subsequently diffusing the dopant into the surface by rapid thermal annealing. Diethyl-1-propylphosphonate and allylboronic acid pinacol ester are preferred dopant-containing materials, and are preferably included in the diluted dopant solution in an amount ranging from about 1% to about 20%, with a dopant amount of 4% or less being more preferred.
    Type: Grant
    Filed: October 5, 2012
    Date of Patent: June 18, 2013
    Assignee: Dynaloy, LLC
    Inventors: Kimberly Dona Pollard, Allison C. Tonk