Abstract: A device for aligning a first surface of a first substrate with a second surface of a second substrate as the first and the second surfaces move toward each other across a gap. The device is comprised of: a first retaining system for retaining the first substrate on a first retaining surface; a second retaining system for retaining the second substrate on a second retaining surface; approach means for causing the first surface to approach the second surface in one direction of translation (T) toward an end position; and means for reducing a wedge error between the first and second surfaces during the approach of the first surface to the second surface including an in situ measurement during the approach of the substrates.

Abstract: A device for aligning a first surface of a first substrate with a second surface of a second substrate as the first and the second surfaces move toward each other across a gap. The device is comprised of: a first retaining system for retaining the first substrate on a first retaining surface; a second retaining system for retaining the second substrate on a second retaining surface; approach means for causing the first surface to approach the second surface in one direction of translation (T) toward an end position; and means for reducing a wedge error between the first and second surfaces during the approach of the first surface to the second surface including an in situ measurement during the approach of the substrates.