Patents by Inventor Alok Rudra

Alok Rudra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6890778
    Abstract: An electrically pumped VCSEL and a method of its fabrication are presented. The VCSEL comprises an active cavity material sandwiched between top and bottom DBR stacks, the top DBR having at least one n-semiconductor layer. The device defines an aperture region between the structured surface of the active cavity material and the n-semiconductor layer of the top DBR stack. The structured surface is formed by a top surface of a mesa that includes at least the upper n++ layer of a p++/n++ tunnel junction and the surface of a p-type layer outside the mesa. The structured surface is fused to the surface of the n-semiconductor layer of the DBR stack due to the deformation of these surfaces, thereby creating an air gap in the vicinity of the mesa between the fused surfaces.
    Type: Grant
    Filed: March 6, 2003
    Date of Patent: May 10, 2005
    Assignee: EPFL
    Inventors: Elyahou Kapon, Vladimir Iakovlev, Alexei Sirbu, Alok Rudra
  • Patent number: 6828168
    Abstract: A tunable Fabry-Perot vertical cavity photonic device and a method of its fabrication are presented. The device comprises top and bottom semiconductor DBR stacks and a tunable air-gap cavity therebetween. The air-gap cavity is formed within a recess in a spacer above the bottom DBR stack. The top DBR stack is carried by a supporting structure in a region thereof located above a central region of the recess, while a region of the supporting structure above the recess and outside the DBR stack presents a membrane deflectable by the application of a tuning voltage to the device contacts.
    Type: Grant
    Filed: March 6, 2003
    Date of Patent: December 7, 2004
    Assignee: Ecole Polytechnique Federale de Lausanne
    Inventors: Elyahou Kapon, Vladimir Iakovlev, Alexei Sirbu, Alok Rudra, Grigore Suruceanu
  • Publication number: 20030169786
    Abstract: A tunable Fabry-Perot vertical cavity photonic device and a method of its fabrication are presented. The device comprises top and bottom semiconductor DBR stacks anid a tunable air-gap cavity therebetween. The air-gap cavity is formed within a recess in a spacer above the bottom DBR stack. The top DBR stack is carried by a supporting structure in a region thereof located above a central region of the recess, while a region of the supporting structure above the recess and outside the DBR stack presents a membrane deflectable by the application of a tuning voltage to the device contacts.
    Type: Application
    Filed: March 6, 2003
    Publication date: September 11, 2003
    Inventors: Elyahou Kapon, Vladimir Iakovlev, Alexei Sirbu, Alok Rudra, Grigore Suruceanu
  • Publication number: 20030162315
    Abstract: An electrically pumped VCSEL and a method of its fabrication are presented. The VCSEL comprises an active cavity material sandwiched between top and bottom DBR stacks, the top DBR having at least one n-semiconductor layer. The device defines an aperture region between the structured surface of the active cavity material and the n-semiconductor layer of the top DBR stack. The structured surface is formed by a top surface of a mesa that includes at least the upper n++layer of a p++/n++tunnel junction and the surface of a p-type layer outside the mesa. The structured surface is fused to the surface of the n-semiconductor layer of the DBR stack due to the deformation of these surfaces, thereby creating an air gap in the vicinity of the mesa between the fused surfaces.
    Type: Application
    Filed: March 6, 2003
    Publication date: August 28, 2003
    Inventors: Elyahou Kapon, Vladimir Iakovlev, Alexei Sirbu, Alok Rudra
  • Patent number: 6546029
    Abstract: A tunable Fabry-Perot vertical cavity photonic device and a method of its fabrication are presented. The device comprises top and bottom semiconductor DBR stacks and a tunable air-gap cavity therebetween. The air-gap cavity is formed within a recess in a spacer above the bottom DBR stack. The top DBR stack is carried by a supporting structure in a region thereof located above a central region of the recess, while a region of the supporting structure above the recess and outside the DBR stack presents a membrane deflectable by the application of a tuning voltage to the device contacts.
    Type: Grant
    Filed: March 15, 2001
    Date of Patent: April 8, 2003
    Assignee: Ecole Polytechnique Federale de Lausanne
    Inventors: Alexei Sirbu, Vladimir Iakovlev, Grigore Suruceanu, Alok Rudra, Elyahou Kapon
  • Patent number: 6542531
    Abstract: An electrically pumped VCSEL and a method of its fabrication are presented. The VCSEL comprises an active cavity material sandwiched between top and bottom DBR stacks, the top DBR having at least one n-semiconductor layer. The device defines an aperture region between the structured surface of the active cavity material and the n-semiconductor layer of the top DBR stack. The structured surface is formed by a top surface of a mesa that includes at least the upper n++ layer of a p++/n++ tunnel junction and the surface of a p-type layer outside the mesa. The structured surface is fused to the surface of the n-semiconductor layer of the DBR stack due to the deformation of these surfaces, thereby creating an air gap in the vicinity of the mesa between the fused surfaces.
    Type: Grant
    Filed: March 15, 2001
    Date of Patent: April 1, 2003
    Assignee: Ecole Polytechnique Federale de Lausanne
    Inventors: Alexei Sirbu, Vladimir Iakovlev, Alok Rudra, Elyahou Kapon
  • Publication number: 20020131464
    Abstract: An electrically pumped VCSEL and a method of its fabrication are presented. The VCSEL comprises an active cavity material sandwiched between top and bottom DBR stacks, the top DBR having at least one n-semiconductor layer. The device defines an aperture region between the structured surface of the active cavity material and the n-semiconductor layer of the top DBR stack. The structured surface is formed by a top surface of a mesa that includes at least the upper n++ layer of a p++/n++ tunnel junction and the surface of a p-type layer outside the mesa. The structured surface is fused to the surface of the n-semiconductor layer of the DBR stack due to the deformation of these surfaces, thereby creating an air gap in the vicinity of the mesa between the fused surfaces.
    Type: Application
    Filed: March 15, 2001
    Publication date: September 19, 2002
    Applicant: Ecole Polytechnique Federale De Lausanne
    Inventors: Alexei Sirbu, Vladimir Iakovlev, Alok Rudra, Elyahou Kapon
  • Publication number: 20020131458
    Abstract: A tunable Fabry-Perot vertical cavity photonic device and a method of its fabrication are presented. The device comprises top and bottom semiconductor DBR stacks and a tunable air-gap cavity therebetween. The air-gap cavity is formed within a recess in a spacer above the bottom DBR stack. The top DBR stack is carried by a supporting structure in a region thereof located above a central region of the recess, while a region of the supporting structure above the recess and outside the DBR stack presents a membrane deflectable by the application of a tuning voltage to the device contacts.
    Type: Application
    Filed: March 15, 2001
    Publication date: September 19, 2002
    Applicant: Ecole Polytechnique Federale De Lausanne
    Inventors: Alexei Sirbu, Vladimir Iakovlev, Grigore Suruceanu, Alok Rudra, Elyahou Kapon