Patents by Inventor Alphonsa JOSEPH

Alphonsa JOSEPH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma based system for generating antimicrobial coating on flexible polymeric substrates and process thereof
    Patent number: 12416073
    Abstract: A cylindrical magnetron sputtering assembly for coating on a flexible polymeric substrates with an antimicrobial material, said assembly comprising a sputtering setup and a cylindrical magnetron assembly; said cylindrical magnetron assembly being mounted in said sputtering setup: wherein said cylindrical magnetron assembly comprises: at least one cylindrical anode with slots mounted on a top base plate; at least one central target cylindrical cathode positioned at the center of said anode; a mechanical assembly for moving plurality of said flexible polymeric substrates; said mechanical assembly comprising at least one winder, at least one unwinder, plurality of pulleys and plurality of motors; said sputtering setup comprising plurality of magnetic field coils, vacuum chamber and plurality of power supply. Also provided is process for producing antimicrobial coating on flexible polymeric substrates by the cylindrical magnetron sputtering assembly.
    Type: Grant
    Filed: August 16, 2023
    Date of Patent: September 16, 2025
    Assignee: INSTITUTE FOR PLASMA RESEARCH
    Inventors: Ramkrishna Rane, Akshay Vaid, Alphonsa Joseph, N. I. Jamnapara
  • PLASMA BASED SYSTEM FOR GENERATING ANTIMICROBIAL COATING ON FLEXIBLE POLYMERIC SUBSTRATES AND PROCESS THEREOF
    Publication number: 20240247364
    Abstract: A cylindrical magnetron sputtering assembly for coating on a flexible polymeric substrates with an antimicrobial material, said assembly comprising a sputtering setup and a cylindrical magnetron assembly; said cylindrical magnetron assembly being mounted in said sputtering setup: wherein said cylindrical magnetron assembly comprises: at least one cylindrical anode with slots mounted on a top base plate; at least one central target cylindrical cathode positioned at the center of said anode; a mechanical assembly for moving plurality of said flexible polymeric substrates; said mechanical assembly comprising at least one winder, at least one unwinder, plurality of pulleys and plurality of motors; said sputtering setup comprising plurality of magnetic field coils, vacuum chamber and plurality of power supply. Also provided is process for producing antimicrobial coating on flexible polymeric substrates by the cylindrical magnetron sputtering assembly.
    Type: Application
    Filed: August 16, 2023
    Publication date: July 25, 2024
    Applicant: INSTITUTE FOR PLASMA RESEARCH
    Inventors: Ramkrishna RANE, Akshay VAID, Alphonsa JOSEPH, N. I. JAMNAPARA