Abstract: A method of preparing particles comprises forming by optical lithography a topographic template layer disposed on a surface of a substrate, which is suitable for spin casting. The template layer comprises a non-crosslinked template polymer having a pattern of independent wells therein for molding independent particles. Spin casting a particle-forming composition onto the template layer forms a composite layer comprising the template polymer and the particles disposed in the wells. The composite layer is removed from the substrate using a stripping agent that dissolves the template polymer without dissolving the particles. The particles are then isolated.

Abstract: A method comprises disposing, on a porous support membrane, an aqueous mixture comprising a crosslinkable polymer comprising a poly(meth)acrylate and/or poly(meth)acrylamide backbone, thereby forming an initial film layer, wherein the crosslinkable polymer comprises a side chain nucleophilic amine group capable of interfacially reacting with a multi-functional acid halide crosslinking agent to form a crosslinked polymer; contacting the initial film layer with a mixture comprising i) the multi-functional acid halide crosslinking agent, ii) an optional accelerator, and iii) an organic solvent, the organic solvent being a non-solvent for the crosslinkable polymer; and allowing the crosslinkable polymer to interfacially react with the crosslinking agent, thereby forming a composite filtration membrane comprising an anti-fouling selective layer comprising the crosslinked polymer.

Abstract: A composition comprises a surface modified nanoparticle comprising a core comprising a material selected from the group consisting of organic materials, organometallic materials, inorganic materials, metals, metal oxides, and combinations thereof; and a surface branch covalently linked to the core having the general formula (3):

Abstract: Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.

Abstract: The present invention relates to a water-soluble polymer complex that includes a water-soluble block copolymer and a magnetic nanoparticle, wherein the water-soluble polymer complex has a nonzero net magnetic moment in the absence of an applied magnetic field at ambient temperatures. The water-soluble block copolymer is preferably a diblock or triblock copolymer and the magnetic nanoparticle is preferably a ferrimagnetic or ferromagnetic nanoparticle. The water-soluble complexes may be derivatized with reactive groups and conjugated to biomolecules. Exemplary water-soluble polymer complexes covered under the scope of the invention include PEG112-b-PAA40 modified CoFe2O4; NH2-PEG112-b-PAA40 modified CoFe2O4; PNIPAM68-b-PAA28 modified CoFe2O4; and mPEG-b-PCL-b-PAA modified CoFe2O4.

Abstract: A cationic bis-urea compound is disclosed of formula (1): wherein: each m is independently an integer of 0 to 4, each k is independently 0 or 1, each Z? is a monovalent radical independently selected from the group consisting of hydroxyl (*—OH), carboxyl (*—COOH), cyano (*—CN), nitro (*—NO2), sulfonate (*—SO3?), trifluoromethyl (*—CF3), halides, amine groups, ketone groups, alkyl groups comprising 1 to 6 carbons, alkoxy groups comprising 1 to 6 carbons, thioether groups comprising 1 to 6 carbons, and combinations thereof, each L? is independently a divalent alkylene group comprising 1 to 6 carbons, wherein a *-[-L?-]k- is a single bond when k is 0, each Y? is independently a monovalent non-polymeric radical comprising a positive charged amine, and each X? is independently a negative charged counterion.

Abstract: Provided is a method of inhibiting magnetically induced aggregation of ferrimagnetic and/or ferromagnetic nanoparticles by encapsulating the nanoparticles in a silica shell. The method entails coating magnetic nanoparticle surfaces with a polyacid polymer to form polymer-coated magnetic nanoparticles and treating the polymer-coated magnetic nanoparticles with a silica precursor to form uniform silica-coated magnetic nanoparticles. By controlling the thickness of the silica encapsulating the nanoparticles, the inherent magnetically induced aggregation of the nanoparticles can be completely inhibited.

Abstract: Provided are inorganic-organic block copolymers that self assemble without the addition of a precursor. The inorganic block of the polymers includes silicon and the organic block may be any organic polymer. The inorganic-organic block copolymers self assemble to form a material in which the inorganic polymer block may be crosslinked to produce an organosilicate and/or silica matrix, and further thermal curing of the matrix results in the formation of a porous nanostructured film.

Abstract: A method of preparing a cyclic monomer, comprising: forming a first mixture comprising a precursor compound, bis(pentafluorophenyl)carbonate, and a catalyst; wherein the precursor compound has a structure comprising a) two or more carbons, and b) two functional groups selected from the group consisting of primary amine, secondary amine, thiol group, hydroxyl group, and combinations thereof; and agitating the first mixture at a temperature effective to form a second mixture comprising the cyclic monomer, the cyclic monomer selected from the group consisting of a cyclic carbonate, a cyclic carbamate, a cyclic urea, a cyclic thiocarbonate, a cyclic thiocarbamate, and a cyclic dithiocarbonate.

Abstract: A biodegradable block copolymer is disclosed, comprising a hydrophilic block derived from a polyether alcohol; and a hydrophobic block comprising a first repeat unit derived by ring opening polymerization of a first cyclic carbonyl monomer initiated by the polyether alcohol, the first repeat unit comprising a side chain moiety comprising a functional group selected from the group consisting of i) urea groups and ii) mixtures of urea groups and carboxylic acid groups. No side chain of the hydrophobic block comprises a covalently bound biologically active material. The block copolymer self-assembles in water forming micelles suitable for sequestering a biologically active material by a non-covalent interaction, and the block copolymer is 60% biodegraded within 180 days in accordance with ASTM D6400.

Abstract: A method of generating a relief pattern comprises disposing a resist composition on a substrate to form a film, the resist composition comprising a first silsesquioxane polymer of the formula (1): a second silsesquioxane polymer of the formula (2): and a photosensitive acid generator; patternwise exposing the film by e-beam lithography; heating the exposed film to effect crosslinking of the first polymer and second polymer in the exposed area; and developing the exposed film to form a negative relief pattern.

Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl ester group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl ester group. Using a suitable nucleophile, the pendant pentafluorophenyl ester group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.

Abstract: Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.

Abstract: The present invention provides chemically amplified silsesquioxane polymers for preparing masks using e-beam lithography. The silsesquioxane polymers have reactive sidechains that in the presence of an acid undergo acid catalyzed rearrangement to generate reactive functionalities that crosslink to form Si—O—Si bonds. The reactive side-chains comprise ?- and ?-substituted alkyl groups bound to the silicon of the silsesquioxane polymer. The substituent of the ?- and ?-substituted alkyl group is an electron withdrawing group. Resists generated with the chemically amplified silsesquioxane polymers of the present invention and imaged with e-beams have resolution of ?60 nm line/space.

Abstract: Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.

Abstract: Provided are inorganic-organic block copolymers that self assemble without the addition of a precursor. The inorganic block of the polymers includes silicon and the organic block may be any organic polymer. The inorganic-organic block copolymers self assemble to form a material in which the inorganic polymer block may be crosslinked to produce an organosilicate and/or silica matrix, and further thermal curing of the matrix results in the formation of a porous nanostructured film.

Abstract: An interconnect structure includes a patterned and cured dielectric layer located directly on a surface of a patterned permanent antireflective coating. The patterned and cured dielectric layer and the permanent antireflective coating form shaped openings. The shaped openings include an inverse profile which narrows towards a top of the shaped openings. A conductive structure fills the shaped openings wherein the patterned and cured dielectric layer and the permanent antireflective coating each have a conductively filled region.

Abstract: A composition comprises a surface modified nanoparticle comprising a core comprising a material selected from the group consisting of organic materials, organometallic materials, inorganic materials, metals, metal oxides, and combinations thereof; and a surface branch covalently linked to the core having the general formula (3):

Abstract: A method of preparing a cyclic monomer, comprising: forming a first mixture comprising a precursor compound, bis(pentafluorophenyl)carbonate, and a catalyst; wherein the precursor compound has a structure comprising a) two or more carbons, and b) two functional groups selected from the group consisting of primary amine, secondary amine, thiol group, hydroxyl group, and combinations thereof; and agitating the first mixture at a temperature effective to form a second mixture comprising the cyclic monomer, the cyclic monomer selected from the group consisting of a cyclic carbonate, a cyclic carbamate, a cyclic urea, a cyclic thiocarbonate, a cyclic thiocarbamate, and a cyclic dithiocarbonate.

Abstract: A composition comprises a surface modified nanoparticle comprising a core comprising a material selected from the group consisting of organic materials, organometallic materials, inorganic materials, metals, metal oxides, and combinations thereof; and a surface branch covalently linked to the core having the general formula (3):