Patents by Inventor Alston CHANG

Alston CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND SYSTEM FOR MANUFACTURING A SEMICONDUCTOR DEVICE
    Publication number: 20230062148
    Abstract: A method for manufacturing a semiconductor device includes forming a photoresist layer comprising a photoresist composition over a substrate to form a photoresist-coated substrate. The photoresist layer is selectively exposed to actinic radiation to form a latent pattern in the photoresist layer. The latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a patterned photoresist layer exposing a portion of the substrate, and a purge gas is applied to the patterned photoresist layer.
    Type: Application
    Filed: August 31, 2021
    Publication date: March 2, 2023
    Inventors: Wei-Han HUANG, Alston CHANG, Yao-Hwan KAO