Abstract: An orthopaedic driver handle including a drivetrain having a driving end and a driven end opposite the driving end and defining a longitudinal axis, and a separable housing covering at least a portion of the drivetrain. The separable housing includes a first portion and a second portion separably connected to the first portion such that sliding the first portion relative to the second portion in a direction of the longitudinal axis unlocks the first portion from the second portion.

Abstract: An orthopedic driver includes a drivetrain having a driven end and a second end opposite the driven end, the drivetrain defining a first axis; an instrument connector rotatably coupled to the second end of the drivetrain and defining a second axis angled relative to the first axis; an angling bushing associated with the instrument connector; and a housing having a straight portion covering at least a portion of the drivetrain and an angled portion connected to the straight portion, the angled portion interacting with the angling bushing to hold the instrument connector angled relative to the drivetrain.

Abstract: A scanning lithography tool that includes a reticle stage for clamping and imparting a bending moment onto a reticle by applying a force along a plane surface of the reticle to bend the reticle in a deterministic manner.

Abstract: An orthopaedic driver handle including a drivetrain having a driving end and a driven end opposite the driving end and defining a longitudinal axis, and a separable housing covering at least a portion of the drivetrain. The separable housing includes a first portion and a second portion separably connected to the first portion such that sliding the first portion relative to the second portion in a direction of the longitudinal axis unlocks the first portion from the second portion.

Abstract: An orthopaedic driver includes a drivetrain having a driven end and a second end opposite the driven end, the drivetrain defining a first axis; an instrument connector rotatably coupled to the second end of the drivetrain and defining a second axis angled relative to the first axis; an angling bushing associated with the instrument connector; and a housing having a straight portion covering at least a portion of the drivetrain and an angled portion connected to the straight portion, the angled portion interacting with the angling bushing to hold the instrument connector angled relative to the drivetrain.

Abstract: A scanning lithography tool that includes a reticle stage for clamping and imparting a bending moment onto a reticle by applying a force along a plane surface of the reticle to bend the reticle in a deterministic manner.

Abstract: According to one aspect of the present invention, an apparatus includes a surface and a first array. The surface emits radiation, and the first array is arranged over the surface and arranged to provide cooling to the surface, the first array including a plurality of TECs. At least a first sensing arrangement is substantially integrated with the first array, wherein the first sensing arrangement is arranged to make a non-contact measurement associated with the surface. The apparatus also includes a controller arranged to obtain the non-contact measurement and to use the non-contact measurement to control the cooling provided by the first array.

Abstract: A reticle or wafer stage mover with six degrees of freedom, a low mass coarse stage, and the ability to move an object in a scanning direction in a lithography tool. The mover includes a coarse stage and a fine stage configured to support the object and supported by the coarse stage. A set of actuators is provided to move the fine stage in six degrees of freedom. All of the actuators contribute to accelerating the object and the fine stage in the scanning direction. With all the actuators generating the necessary force to move the fine stage, a single large actuator to push the fine stage in the scanning direction is eliminated. The size or mass of the coarse stage is therefore reduced. All of the actuators are also capable of generating a second force in either the X or Z directions. The actuators therefore also enable the fine stage and the object it supports to be positioned in six degrees of freedom, as well as moved in the scanning direction.

Abstract: Stage devices are disclosed for various uses including use as a reticle stage or substrate stage in a microlithography system. An exemplary device includes a carrier and multiple linear EM actuators that couple the carrier monolithically to a base. The linear EM actuators collectively provide controlled movability of the carrier relative to the base in all six DOFs (X, Y, Z, ?X, ?Y, ?Z). The multiple linear EM actuators comprise at least one multiple-DOF linear actuator but fewer than six linear EM actuators. For example, the stage device can have two two-DOF linear actuators providing respective motions of the carrier in the X, Y and Y, Z DOFs (and collectively in all six DOFs) or can have two two-DOF linear actuators providing motions of the carrier in the Y, Z, ?X, ?Y, and ?Z DOFs and a one-DOF linear actuator providing motions in the X DOF.

Abstract: A stage assembly (18) that moves a work piece (200) includes a stage base (36), a stage (238), and a stage mover assembly (40) that moves the stage (238) relative to the stage base (36). The stage (238) includes a stage housing (244) and a device holder (242). The stage housing (244) is rigid. The device holder (242) selectively secures the work piece (200) to the stage housing (244). The device holder (242) can included one or more support pairs (250) that clamp the work piece (200) there between to couple the work piece (200) to the stage housing (244). The stage (238) can include one or more resilient supports (258) that support the work piece (200). Further, the support pairs (250) can retain the work piece (200) so that a small fluid gap exists between the work piece (200) and the stage (238) so that the work piece (200) experiences squeeze film damping.

Abstract: Devices are disclosed for holding and moving a planar body such as a reticle as used, for example, in microlithography. An exemplary device includes a stage and a body chuck. The stage has a movable support surface. A proximal region of a first membrane is mounted to the support surface. A distal region of the first membrane extends from the support surface and is coupled to the chuck such that the first membrane at least partially supports the chuck. The chuck includes a surface from which multiple pins extend. The surface is situated at the distal region. The pins are arrayed to contact and support a respective region of the body. The pin arrangement is configured such that, during movements of the chuck imparted by the support surface, body slippage relative to the pins due to forces caused by the movement is substantially uniform at each pin.

Abstract: An apparatus for rotating apertures from a storage position not in a desired plane to a “in use” position in a desired plane. The stored position of the apertures does not interfere with a radiation beam path of an optical system. The apparatus may compactly store multiple apertures and may position a smaller aperture in a desired plane without removing a larger aperture from the desired plane.

Abstract: Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a higher temperature than its surrounding environment. Thermophoretic protection can be maintained throughout a reticle's use in a lithography system. For example, a reticle can be thermophoretically protected while in storage, through various stages of transportation via a reticle handler (also referred to as an end-effector), to its period of use while attached to a reticle chuck.

Abstract: An exemplary apparatus for filtering electromagnetic radiation includes a filter element, an actuator, and a filter-cooler. The filter element has multiple selectable regions situated so that electromagnetic radiation impinges on a selected filter region to transmit therethrough a first wavelength while limiting transmission of a second wavelength. Absorption of impinging radiation heats the filter element, but the actuator moves the filter element to select a particular filter region for impingement by the radiation while moving another region away from impingement by the radiation. The filter-cooler directs a heat-conduction medium (e.g., a gas) at, and thus cools, the moved-away region. By such ongoing refreshment of portions of the filter element being irradiated and portions being cooled, the filter element can be irradiated for extended periods without thermal damage. An important use is in optical systems for EUV lithography.

Abstract: Stage devices are disclosed for holding an object such as a reticle for use in microlithography. An exemplary stage device includes a movable object-holder that holds the object. At least one actuator moves the object-holder. A position-detector determines a position of the object-holder, wherein the position-detector produces a first position signal whenever the object-holder is not holding the object and produces a second position signal whenever the object-holder is holding the object. A controller, connected to the position-detector and to the at least one actuator, produces a first control signal upon receiving the first position signal and a second control signal upon receiving the second position signal. These control signals cause the at least one actuator to place or hold the object-holder at a pre-determined position whether the object-holder is not holding or is holding the object.

Abstract: Methods and apparatus for internally or directly cooling a mirror using a fluid with laminar flow properties are disclosed. According to one aspect of the present invention, an internally cooled mirror includes an optical surface that absorbs light, and at least one microchannel formed beneath the optical surface. The mirror also includes a port that supplied a fluid to the microchannel. The fluid is subjected to a laminar flow and absorbs heat associated with the absorbed light.

Abstract: Embodiments of the present invention are directed to an apparatus for providing a low spring constant, pneumatic suspension using vacuum for the lens in a projection system. In one embodiment, a pneumatic suspension system for a load comprises a frame; and a body movably disposed in the frame and spaced from a side wall of the frame by a gap to define a chamber in the frame above the body, the body being configured to be connected to the load. The frame includes an outlet to draw a gas from the chamber to lower the pressure in the chamber with respect to an ambient pressure outside the frame. An air bearing is formed in the gap between the body and the side wall of the frame to provide non-contact between the body and the frame. The pressure in the chamber is sufficiently lower than the ambient pressure to produce a lift force to lift the body and the load connected thereto with respect to the frame.

Abstract: Techniques for transferring utilities to and from a reticle or wafer stage in a lithography system while minimizing physical disturbances that affect the stage are described. These techniques involve transferring utilities to and from the stage without making physical contact with the stage. Alternatively, utilities are transferred by making physical contact with the stage while the stage is in a stationary position. In addition to transferring utilities to and from the stage, devices such as processing devices, buffers (storage mediums), electrical components, and mechanical components can be placed within the stage to use and/or control the transferred utilities.

Abstract: Techniques for transferring utilities to and from a reticle or wafer stage in a lithography system while minimizing physical disturbances that affect the stage are described. These techniques involve transferring utilities to and from the stage without making physical contact with the stage. Alternatively, utilities are transferred by making physical contact with the stage while the stage is in a stationary position. In addition to transferring utilities to and from the stage, devices such as processing devices, buffers (storage mediums), electrical components, and mechanical components can be placed within the stage to use and/or control the transferred utilities.

Abstract: An exemplary optical system includes a first vacuum chamber and a second vacuum chamber having first and second portions. The first vacuum chamber contains an energy-beam source. The first vacuum-chamber portion contains a first optical-system portion that receives the beam from the source, and the second vacuum-chamber portion contains a second optical-system portion that receives the beam from the first optical-system portion. A first gate valve separates the first vacuum chamber and the first vacuum-chamber portion and provides, when open, communication between the first vacuum chamber and the first vacuum-chamber portion and a propagation pathway for the beam from the energy-beam source to the first optical-system portion.