Patents by Inventor Alvaro Moscoso-Martir

Alvaro Moscoso-Martir has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Self-alignment for apparatus comprising photonic device
    Patent number: 10168497
    Abstract: An apparatus may include a photonic device with at least a first waveguide having a light-conducting core bounded by at least one cladding layer, at least a second waveguide having a light-conducting core bounded by at least one cladding layer, wherein the first waveguide is aligned to couple with the second waveguide, wherein alignment of the first waveguide with the second waveguide with respect to at least one axis C coincides with at least one stop area of the photonic device resting on a stop surface of a corresponding support structure on a substrate, wherein the stop area is a stop in a recess from a surface of the photonic device. A method to fabricate the apparatus may include the recess is formed by etching of the photonic device, and/or the support structure is formed by etching of the substrate.
    Type: Grant
    Filed: June 15, 2015
    Date of Patent: January 1, 2019
    Assignee: RWTH Aachen
    Inventors: Florian Merget, Jeremy Witzens, Alvaro Moscoso-Martir
  • SELF-ALIGNMENT FOR APPARATUS COMPRISING PHOTONIC DEVICE
    Publication number: 20180180826
    Abstract: An apparatus may include a photonic device with at least a first waveguide having a light-conducting core bounded by at least one cladding layer, at least a second waveguide having a light-conducting core bounded by at least one cladding layer, wherein the first waveguide is aligned to couple with the second waveguide, wherein alignment of the first waveguide with the second waveguide with respect to at least one axis C coincides with at least one stop area of the photonic device resting on a stop surface of a corresponding support structure on a substrate, wherein the stop area is a stop in a recess from a surface of the photonic device. A method to fabricate the apparatus may include the recess is formed by etching of the photonic device, and/or the support structure is formed by etching of the substrate.
    Type: Application
    Filed: June 15, 2015
    Publication date: June 28, 2018
    Applicant: RWTH Aachen
    Inventors: Florian Merget, Jeremy Witzens, Alvaro Moscoso-Martir