Abstract: Chemical polishing of solar cell surfaces and the resulting structures are described herein. In an example, a method of fabricating a solar cell includes texturizing both first side and second side surfaces of a silicon substrate with a first hydroxide-based etch process. The method also includes reducing a surface roughness factor of the texturized second side surface of the silicon substrate with a second hydroxide-based etch process. The method also includes, subsequent to reducing the surface roughness factor of the texturized second side surface of the silicon substrate, forming emitter regions on the second side surface of the silicon substrate.