Patents by Inventor Amada Wilkison

Amada Wilkison has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Analytical model for predicting the operating process window for lithographic patterning techniques based on photoresist trim technology
    Patent number: 6606738
    Abstract: In the present method of trimming photoresist to form a mask for a layer of a semiconductor device, which layer may include polysilicon and/or nitride, the method is practiced substantially in accordance with: wmin=(h0−Rvtmax)/ARmax where w1=minimum width of trimmed photoresist; h0=height of photoresist prior to trim; Rv=resist vertical etch rate; tmax=maximum etch time to reach resist vertical etch limit; ARmax=maximum allowable aspect ratio of trimmed photoresist.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: August 12, 2003
    Assignee: Advanced Micro Device, Inc.
    Inventors: Scott Bell, Marina Plat, Amada Wilkison, Chih-Yuh Yang