Patents by Inventor Amanda Baer

Amanda Baer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10943611
    Abstract: In one embodiment, a write head includes a spin polarization layer (SPL) over a seed layer. A spacer layer is over the SPL. A trailing shield is over the spacer layer. The spacer layer forms a first interface between the spacer layer and the trailing shield and forms a second interface between the spacer layer and the SPL. The first interface has an area larger than an area of the second interface. In another embodiment, a write head includes a SPL over a spacer layer. A capping layer is over the SPL. A trailing shield is over the capping layer. The spacer layer forms a first interface between the spacer layer and the main pole and forms a second interface between the spacer layer and the SPL. The first interface has an area larger than an area of the second interface.
    Type: Grant
    Filed: March 31, 2020
    Date of Patent: March 9, 2021
    Assignee: WESTERN DIGITAL TECHNOLOGIES, INC.
    Inventors: James Mac Freitag, Zheng Gao, Susumu Okamura, Yongchul Ahn, Aron Pentek, Amanda Baer
  • Patent number: 8551347
    Abstract: A method in one embodiment includes forming a layer of a nonmagnetic material above an upper surface of a substrate; forming a resist structure above the layer of nonmagnetic material, wherein the resist structure has an undercut; removing a portion of the layer of nonmagnetic material not covered by the resist structure; depositing a layer of magnetic material above the substrate adjacent a remaining portion of the layer of nonmagnetic material such that at least portions of the layer of magnetic material and the remaining portion of the layer of nonmagnetic material lie in a common plane; removing the resist structure; and forming a write pole above the layer of magnetic material and the remaining portion of the layer of nonmagnetic material. Additional methods are also presented.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: October 8, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Amanda Baer, Wen-Chien David Hsiao, John I. Kim, Vladimir Nikitin, Trevor W. Olson, John Bruce Piggott, Jr., Yuan Yao
  • Patent number: 8547660
    Abstract: A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.
    Type: Grant
    Filed: December 17, 2009
    Date of Patent: October 1, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Donald G. Allen, Amanda Baer, Yingjian Chen, Andrew Chiu, Liubo Hong, Wen-Chien D. Hsiao, Edward H. P. Lee, Fenglin Liu, Aron Pentek, Katalin Pentek, Kyusik Shin, Yi Zheng, Qiping Zhong, Honglin Zhu
  • Patent number: 8186040
    Abstract: A method in one embodiment includes forming a resist structure above an upper surface of a substrate, wherein a portion of the upper surface of the substrate is a shaping layer, wherein the resist structure has an undercut; depositing a layer of magnetic material above exposed regions of the substrate, wherein a portion of the layer of magnetic material tapers towards the substrate as it approaches the undercut; removing the resist structure; and forming a write pole above the layer of magnetic material. Additional methods are disclosed.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: May 29, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Wen-Chien David Hsiao, Vladimir Nikitin, Trevor W. Olson, Yuan Yao
  • Patent number: 8066893
    Abstract: A method for manufacturing a magnetic write head having a stepped, recessed, high magnetic moment pole connected with a write pole. The stepped pole structure helps to channel magnetic flux to the write pole without leaking write field to the magnetic medium. This allows the write head to maintain a high write field strength at very small bit sizes. The method includes depositing a dielectric layer and a first CMP layer over substrate that can include a magnetic shaping layer. A mask is formed over the dielectric layer, the mask having an opening to define the stepped pole structure. The image of the mask is transferred into the dielectric layer. A high magnetic moment material is deposited and a chemical mechanical polishing is performed to planarize the magnetic material and dielectric layer.
    Type: Grant
    Filed: December 23, 2008
    Date of Patent: November 29, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Wen-Chien David Hsiao, John I. Kim, Yinshi Liu, Vladimir Nikitin, Trevor W. Olson, Hicham Moulay Sougrati, Yuan Yao
  • Patent number: 8028399
    Abstract: Write elements and methods of fabricating magnetic write poles are described. For one method, a vertical mask structure is formed on a magnetic layer in locations of a pole tip and a yoke of a write pole. The vertical mask structure may be formed by coating vertical surfaces of resists with an atomic layer deposition (ALD) process or a similar process. A removal process is then performed around the vertical mask structure to define the pole tip and part of the yoke of the write pole, and the vertical mask structure is removed. A lower portion of the pole tip is them masked while the upper portion of the pole tip and the part of the yoke is exposed. The upper portion of the pole tip and the part of the yoke are then expanded with magnetic material, such as with a plating process.
    Type: Grant
    Filed: December 16, 2007
    Date of Patent: October 4, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
    Inventors: Amanda Baer, Jeffrey S. Lille, Aron Pentek
  • Publication number: 20110151279
    Abstract: A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.
    Type: Application
    Filed: December 17, 2009
    Publication date: June 23, 2011
    Inventors: Donald G. Allen, Amanda Baer, Yingjian Chen, Andrew Chiu, Liubo Hong, Wen-Chien D. Hsiao, Edward H.P. Lee, Fenglin Liu, Aron Pentek, Katalin Pentek, Kyusik Shin, Yi Zheng, Qiping Zhong, Honglin Zhu
  • Patent number: 7813080
    Abstract: Systems and methods for enhanced planarization liftoff structures. In accordance with a first method embodiment, a method for manufacturing a pole tip for magnetic recording comprises accessing a wafer comprising a plurality of pole tips and a plurality of pole tip masks corresponding to the plurality of pole tips. Non magnetic material is filled adjacent to the plurality of pole tips. Material adjacent to the plurality of pole tips is etched. Subsequent to the etching, the wafer is planarized to a level equal to or higher than a level of the trailing edges of the plurality of pole tips. The enhanced liftoff structure enables decreased planarization processing, resulting in a decreased process window. As a beneficial result, manufacturing throughput and quality are improved.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: October 12, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Jeffrey S. Lille, Amanda Baer, John Jaekoyun Yang
  • Patent number: 7757380
    Abstract: Methods for improving within wafer and wafer to wafer yields during fabrication of notched trailing shield structures are disclosed. Ta/Rh CMP stop layers are deposited prior to planarization and notch formation to ensure a planar surface for trailing shield structures. These stop layers may be blanket deposited or patterned prior to CMP. Patterned stop layers produce the highest yields.
    Type: Grant
    Filed: November 10, 2006
    Date of Patent: July 20, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Hung-chin Guthrie, Yimin Hsu, Ming Jiang, Aron Pentek
  • Patent number: 7748103
    Abstract: A perpendicular magnetic recording write head has a write pole, a trapezoidal-shaped trailing shield notch, and a metal gap layer between the write pole and notch. The write pole has a trailing edge that has a width substantially defining the track width and that faces the front edge of the notch but is spaced from it by the gap layer. The write head is fabricated by reactive ion beam etching of a thin mask film above the write pole to remove the mask film and widen the opening at the edges of the write pole. The gap layer and notch are deposited into the widened opening above the write pole. The write pole has nonmagnetic filler material, such as alumina, surrounding it except at its trailing edge, where it is in contact with the gap layer, which is formed of a different material than the surrounding filler material.
    Type: Grant
    Filed: April 24, 2006
    Date of Patent: July 6, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Donald G. Allen, Amanda Baer, Michael Feldbaum, Wen-Chien David Hsiao, Vladimir Nikitin, Aron Pentek, Katalin Pentek
  • Patent number: 7743487
    Abstract: A perpendicular write head includes a beveled main pole having corners defining a track width and having a planarized surface and encapsulated on either side thereof and below by an alumina layer, the alumina layer having a polished surface and extending above the main pole on either side thereof as steps.
    Type: Grant
    Filed: June 14, 2006
    Date of Patent: June 29, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Hamid Balamane, Michael Feldbaum, Ming Jiang, Aron Pentek, Neil Leslie Robertson, Sue Siyang Zhang
  • Publication number: 20100157470
    Abstract: A method in one embodiment includes forming a resist structure above an upper surface of a substrate, wherein a portion of the upper surface of the substrate is a shaping layer, wherein the resist structure has an undercut; depositing a layer of magnetic material above exposed regions of the substrate, wherein a portion of the layer of magnetic material tapers towards the substrate as it approaches the undercut; removing the resist structure; and forming a write pole above the layer of magnetic material. Additional methods are disclosed.
    Type: Application
    Filed: December 22, 2008
    Publication date: June 24, 2010
    Inventors: Amanda Baer, Wen-Chien David Hsiao, Vladimir Nikitin, Trevor W. Olson, Yuan Yao
  • Publication number: 20100159154
    Abstract: A method in one embodiment includes forming a layer of a nonmagnetic material above an upper surface of a substrate; forming a resist structure above the layer of nonmagnetic material, wherein the resist structure has an undercut; removing a portion of the layer of nonmagnetic material not covered by the resist structure; depositing a layer of magnetic material above the substrate adjacent a remaining portion of the layer of nonmagnetic material such that at least portions of the layer of magnetic material and the remaining portion of the layer of nonmagnetic material lie in a common plane; removing the resist structure; and forming a write pole above the layer of magnetic material and the remaining portion of the layer of nonmagnetic material. Additional methods are also presented.
    Type: Application
    Filed: December 22, 2008
    Publication date: June 24, 2010
    Inventors: Amanda Baer, Wen-Chien David Hsiao, John I. Kim, Vladimir Nikitin, Trevor W. Olson, John Bruce Piggott, JR., Yuan Yao
  • Publication number: 20100155366
    Abstract: A method for manufacturing a magnetic write head having a stepped, recessed, high magnetic moment pole connected with a write pole. The stepped pole structure helps to channel magnetic flux to the write pole without leaking write field to the magnetic medium. This allows the write head to maintain a high write field strength at very small bit sizes. The method includes depositing a dielectric layer and a first CMP layer over substrate that can include a magnetic shaping layer. A mask is formed over the dielectric layer, the mask having an opening to define the stepped pole structure. The image of the mask is transferred into the dielectric layer. A high magnetic moment material is deposited and a chemical mechanical polishing is performed to planarize the magnetic material and dielectric layer.
    Type: Application
    Filed: December 23, 2008
    Publication date: June 24, 2010
    Inventors: Amanda Baer, Wen-Chien David Hsiao, John I. Kim, Yinshi Liu, Vladimir Nikitin, Trevor W. Olson, Hicham Moulay Sougrati, Yuan Yao
  • Patent number: 7603762
    Abstract: An optical lapping guide for determining an amount of lapping performed on a row of sliders in a process for manufacturing sliders for magnetic data recording. The optical lapping guide is constructed with a front edge that is at an angle with respect to an air bearing surface plane ABS plane, such that a portion of the lapping guides is in front of the ABS and portion of the lapping guide is behind the ABS. As lapping progresses, an increasing amount of the lapping guide will be exposed at the ABS and visible for inspection. Therefore, after a lapping process has been performed, the optical lapping guide can be inspected to determine the amount of material removed by lapping. The greater the amount of the lapping guide that is exposed and visible, the greater the amount of material removed by lapping.
    Type: Grant
    Filed: December 15, 2006
    Date of Patent: October 20, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Vladimir Nikitin, Aron Pentek, Neil Leslie Robertson
  • Patent number: 7588884
    Abstract: A method of enhancing alignment marks defined in a relatively thin layer on a wafer by etching the alignment marks into an underlying alignment mark transfer layer is described. The target area for the alignment marks is prepared by depositing material for the transfer layer. In alternative embodiments an oversized trench is formed in the target area prior to the deposition of the transfer layer. The alignment marks can fabricated in the layer(s) deposited by the existing process or alternatively, the original layers can be removed and replaced with a layer of material selected to have comparable etching properties (definition layer).
    Type: Grant
    Filed: May 28, 2004
    Date of Patent: September 15, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Nian-Xiang Sun, Sue Siyang Zhang, Yi Zheng
  • Patent number: 7576951
    Abstract: A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: August 18, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Donald G. Allen, Amanda Baer, Michael Feldbaum, Hung-Chin Guthrie, Wen-Chien David Hsiao, Yimin Hsu, Ming Jiang, Yinshi Liu, Aaron Neuhaus, Vladimir Nikitin, Aron Pentek, Katalin Pentek, Yi Zheng
  • Patent number: 7563381
    Abstract: A method for constructing a tapered write pole, the method including the use of a bilayer hard mask.
    Type: Grant
    Filed: April 30, 2004
    Date of Patent: July 21, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Quang Le, Kim Lee, Aron Pentek, Douglas J. Werner, Sue S. Zhang
  • Publication number: 20090154015
    Abstract: Write elements and methods of fabricating magnetic write poles are described. For one method, a vertical mask structure is formed on a magnetic layer in locations of a pole tip and a yoke of a write pole. The vertical mask structure may be formed by coating vertical surfaces of resists with an atomic layer deposition (ALD) process or a similar process. A removal process is then performed around the vertical mask structure to define the pole tip and part of the yoke of the write pole, and the vertical mask structure is removed. A lower portion of the pole tip is them masked while the upper portion of the pole tip and the part of the yoke is exposed. The upper portion of the pole tip and the part of the yoke are then expanded with magnetic material, such as with a plating process.
    Type: Application
    Filed: December 16, 2007
    Publication date: June 18, 2009
    Inventors: Amanda Baer, Jeffrey S. Lille, Aron Pentek
  • Patent number: 7536778
    Abstract: A method of fabrication is disclosed for a slider having sites for fabrication of a continuous coil having a set of front coils and a set of back coils and a center tab, where the slider includes underpass leads.
    Type: Grant
    Filed: September 5, 2007
    Date of Patent: May 26, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Tsung Yuan Chen, David Patrick Druist, Edward Hin Pong Lee