Patents by Inventor Amanda HOSKINS

Amanda HOSKINS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240043996
    Abstract: The present invention relates, in part, to a discovery of a method for using atomic layer deposition (ALD) to improve the stability of refractory materials in high temperature steam, and compositions produced by the method.
    Type: Application
    Filed: September 12, 2023
    Publication date: February 8, 2024
    Inventors: Alan W. Weimer, Amanda Hoskins, Charles Musgrave
  • Patent number: 11753717
    Abstract: The present invention relates, in part, to a discovery of a method for using atomic layer deposition (ALD) to improve the stability of refractory materials in high temperature steam, and compositions produced by the method.
    Type: Grant
    Filed: November 10, 2017
    Date of Patent: September 12, 2023
    Assignee: The Regents of the University of Colorado
    Inventors: Alan W. Weimer, Amanda Hoskins, Charles Musgrove
  • Publication number: 20200274138
    Abstract: The invention relates to lithiated mixed metal compositions having ultrathin film coatings of varying thicknesses on lithium ion sites and on metal oxide sites, wherein the thickness of the ultrathin film at least partially covering the metal oxide sites is greater than the thickness of the ultrathin film at least partially covering the lithium ion sites. Also disclosed is a method for forming the compositions, comprising selectively coating one area of a multi-component substrate. Materials such as mixed metal oxides, for use in lithium battery electrodes, may be improved by a coating which preferentially deposits onto one or more elements in the mixed material but not another.
    Type: Application
    Filed: May 12, 2020
    Publication date: August 27, 2020
    Inventors: Alan W. WEIMER, Amanda HOSKINS
  • Publication number: 20190301015
    Abstract: The present invention relates, in part, to a discovery of a method for using atomic layer deposition (ALD) to improve the stability of refractory materials in high temperature steam, and compositions produced by the method.
    Type: Application
    Filed: November 10, 2017
    Publication date: October 3, 2019
    Inventors: Alan W. WEIMER, Amanda HOSKINS, Charles MUSGROVE