Patents by Inventor Amandev SINGH
Amandev SINGH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11300889Abstract: Methods and apparatuses for determining in-plane distortion (IPD) across a substrate having a plurality of patterned regions. A method includes obtaining intra-region data indicative of a local stress distribution across one of the plurality of patterned regions; determining, based on the intra-region data, inter-region data indicative of a global stress distribution across the substrate; and determining, based on the inter-region data, the IPD across the substrate.Type: GrantFiled: July 3, 2019Date of Patent: April 12, 2022Assignee: ASML Netherlands B.V.Inventors: Leon Paul Van Dijk, Richard Johannes Franciscus Van Haren, Subodh Singh, Ilya Malakhovsky, Ronald Henricus Johannes Otten, Amandev Singh
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Publication number: 20210165335Abstract: Methods and apparatuses for determining in-plane distortion (IPD) across a substrate having a plurality of patterned regions. A method includes obtaining intra-region data indicative of a local stress distribution across one of the plurality of patterned regions; determining, based on the intra-region data, inter-region data indicative of a global stress distribution across the substrate; and determining, based on the inter-region data, the IPD across the substrate.Type: ApplicationFiled: July 3, 2019Publication date: June 3, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Leon Paul VAN DIJK, Richard Johannes Franciscus VAN HAREN, Subodh SINGH, IIya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Amandev SINGH
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Patent number: 10534274Abstract: Metrology apparatus and methods for inspecting a substrate are disclosed. A source beam of radiation emitted by a radiation source is split into a measurement beam and a reference beam. A first target on the substrate is illuminated with the measurement beam. A second target separated from the substrate is illuminated with the reference beam. First scattered radiation collected from the first target and second scattered radiation collected from the second target are delivered to the detector. The first scattered radiation interferes with the second scattered radiation at the detector. The first target comprises a first pattern. The second target comprises a second pattern, or a pupil plane image of the second pattern. The first pattern is geometrically identical to the second pattern, the first pattern and the second pattern are periodic and a pitch of the first pattern is identical to a pitch of the second pattern, or both.Type: GrantFiled: October 3, 2017Date of Patent: January 14, 2020Assignee: ASML Netherlands B.V.Inventors: Teunis Willem Tukker, Amandev Singh, Gerbrand Van Der Zouw
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Patent number: 10437159Abstract: A measurement system is disclosed in which a first optical system splits an input radiation beam into a plurality of components. A modulator receives the plurality of components and applies a modulation to at least one of the components independently of at least one other of the components. A second optical system illuminates a target with the plurality of components and directs radiation scattered by the target to a detection system. The detection system distinguishes between each of one or more components, or between each of one or more groups of components, of the radiation directed to the detection system based on the modulation applied to each component or each group of components by the modulator.Type: GrantFiled: November 3, 2017Date of Patent: October 8, 2019Assignee: ASML Netherlands B.V.Inventors: Teunis Willem Tukker, Gerbrand Van Der Zouw, Amandev Singh
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Publication number: 20180164699Abstract: A measurement system is disclosed in which a first optical system splits an input radiation beam into a plurality of components. A modulator receives the plurality of components and applies a modulation to at least one of the components independently of at least one other of the components. A second optical system illuminates a target with the plurality of components and directs radiation scattered by the target to a detection system. The detection system distinguishes between each of one or more components, or between each of one or more groups of components, of the radiation directed to the detection system based on the modulation applied to each component or each group of components by the modulator.Type: ApplicationFiled: November 3, 2017Publication date: June 14, 2018Applicant: ASML Netherlands B.V.Inventors: Teunis Willem TUKKER, Gerbrand Van Der Zouw, Amandev Singh
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Publication number: 20180107124Abstract: Metrology apparatus and methods are disclosed. In one arrangement, a substrate is inspected. A source beam of radiation emitted by a radiation source is split into a measurement beam and a reference beam. A first target is illuminated with the measurement beam, the first target being on the substrate. A second target is illuminated with the reference beam, the second target being separated from the substrate. First scattered radiation is collected from the first target and delivered to a detector. Second scattered radiation is collected from the second target and delivered to the detector. The first scattered radiation interferes with the second scattered radiation at the detector. The first target comprises a first pattern. The second target comprises a second pattern, or a pupil plane image of the second pattern.Type: ApplicationFiled: October 3, 2017Publication date: April 19, 2018Applicant: ASML Netherlands B.V.Inventors: Teunis Willem TUKKER, Amandev Singh, Gerbrand Van Der Zouw
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Patent number: 9921489Abstract: An inspection apparatus (300) includes a focus monitoring arrangement (500, 500?). Focusing radiation (505) comprises radiation having a first wavelength and radiation having a second wavelength. Reference radiation and focusing radiation at each wavelength are provided with at least one relative frequency shift so that the interfering radiation detected in the detection system includes a time-varying component having a characteristic frequency. A focus detection system (520) comprises one or more lock-in detectors (520b, 520c, 900). Operating the lock-in detectors with reference to both the first and second characteristic frequencies allows the arrangement to select which of the first and second focusing radiation is used to determine whether the optical system is in focus. Good quality signals can be obtained from targets of different structure.Type: GrantFiled: September 28, 2015Date of Patent: March 20, 2018Assignee: ASML Netherlands B.V.Inventors: Amandev Singh, Henricus Petrus Maria Pellemans
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Patent number: 9786044Abstract: A scatterometer is used in a dark-field imaging mode to measure asymmetry-related parameters such as overlay. Measurements of small grating targets are made using identical optical paths, with the target in two orientations to obtain separate measurements of +1 and ?1 diffraction orders. In this way, intensity scaling differences (tool asymmetry) are avoided. However, additive intensity defects due to stray radiation (ghosts) in the optical system cannot be avoided. Additive intensity issues strongly depend on the ratio between 0th and 1st order diffraction and are therefore strongly substrate (process) dependent. Calibration measurements are made on a few representative target gratings having biases. The calibration measurements are made, using not only different substrate rotations but also complementary apertures. Corrections are calculated and applied to correct asymmetry, to reduce error caused by stray radiation.Type: GrantFiled: December 16, 2015Date of Patent: October 10, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Andreas Fuchs, Peter Hanzen Wardenier, Amandev Singh, Maxime D'Alfonso, Hilko Dirk Bos
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Patent number: 9753379Abstract: Inspection apparatus (100) is used for measuring parameters of targets on a substrate. Coherent radiation follows an illumination path (solid rays) for illuminating target (T). A collection path (dashed rays) collects diffracted radiation from the target and delivers it to a lock-in image detector (112). A reference beam following a reference path (dotted rays). An acousto-optical modulator (108) shifts the optical frequency of the reference beam so that the intensity of radiation at the lock-in detector includes a time-varying component having a characteristic frequency corresponding to a difference between the frequencies of the diffracted radiation and the reference radiation. The lock-in image detector records two-dimensional image information representing both amplitude and phase of the time-varying component. A second reference beam with a different shift (110) follows a second reference path (dot-dash rays). Interference between the two reference beams can be used for intensity normalization.Type: GrantFiled: July 8, 2015Date of Patent: September 5, 2017Assignee: ASML Netherlands B.V.Inventors: Amandev Singh, Henricus Petrus Maria Pellemans, Patrick Warnaar
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Publication number: 20160180517Abstract: A scatterometer is used in a dark-field imaging mode to measure asymmetry-related parameters such as overlay. Measurements of small grating targets are made using identical optical paths, with the target in two orientations to obtain separate measurements of +1 and ?1 diffraction orders. In this way, intensity scaling differences (tool asymmetry) are avoided. However, additive intensity defects due to stray radiation (ghosts) in the optical system cannot be avoided. Additive intensity issues strongly depend on the ratio between 0th and 1st order diffraction and are therefore strongly substrate (process) dependent. Calibration measurements are made on a few representative target gratings having biases. The calibration measurements are made, using not only different substrate rotations but also complementary apertures. Corrections are calculated and applied to correct asymmetry, to reduce error caused by stray radiation.Type: ApplicationFiled: December 16, 2015Publication date: June 23, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Andreas FUCHS, Peter Hanzen WARDENIER, Amandev SINGH, Maxime D' ALFONSO, Hilko Dirk BOS
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Publication number: 20160097984Abstract: An inspection apparatus (300) includes a focus monitoring arrangement (500, 500?). Focusing radiation (505) comprises radiation having a first wavelength and radiation having a second wavelength. Reference radiation and focusing radiation at each wavelength are provided with at least one relative frequency shift so that the interfering radiation detected in the detection system includes a time-varying component having a characteristic frequency. A focus detection system (520) comprises one or more lock-in detectors (520b, 520c, 900). Operating the lock-in detectors with reference to both the first and second characteristic frequencies allows the arrangement to select which of the first and second focusing radiation is used to determine whether the optical system is in focus. Good quality signals can be obtained from targets of different structure.Type: ApplicationFiled: September 28, 2015Publication date: April 7, 2016Applicant: ASML Netherlands B.V.Inventors: Amandev SINGH, Henricus Petrus Maria PELLEMANS
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Publication number: 20160011523Abstract: Inspection apparatus (100) is used for measuring parameters of targets on a substrate. Coherent radiation follows an illumination path (solid rays) for illuminating target (T). A collection path (dashed rays) collects diffracted radiation from the target and delivers it to a lock-in image detector (112). A reference beam following a reference path (dotted rays). An acousto-optical modulator (108) shifts the optical frequency of the reference beam so that the intensity of radiation at the lock-in detector includes a time-varying component having a characteristic frequency corresponding to a difference between the frequencies of the diffracted radiation and the reference radiation. The lock-in image detector records two-dimensional image information representing both amplitude and phase of the time-varying component. A second reference beam with a different shift (110) follows a second reference path (dot-dash rays). Interference between the two reference beams can be used for intensity normalization.Type: ApplicationFiled: July 8, 2015Publication date: January 14, 2016Applicant: ASML Netherlands B.V.Inventors: Amandev SINGH, Henricus Petrus Maria Pellemans, Patrick Warnaar