Patents by Inventor Ami Kestenbaum

Ami Kestenbaum has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5559626
    Abstract: A resource-sharing system enables multiple work areas to share an energy resource on a real-time, asynchronous basis in order to perform manufacturing processes. A specific embodiment involves a communication and control structure for a distributed laser processing system wherein the work areas, in communication with a cell controller via a cell-level LAN, share high-power lasers through beam multiplexers and optical fibers. The cell controller, typically in communication with a factory information system computer over a factory-level network, receives information relating to processes to be performed in the workareas, and makes this information available to the workareas as a node in the cell-level LAN. With such an arrangement, tools requiring the laser energy within the work areas may be controlled in real time by their associated station controllers, as cell controller need only be responsible for coordinating more global activities.
    Type: Grant
    Filed: February 24, 1995
    Date of Patent: September 24, 1996
    Assignee: National Center for Manufacturing Sciences
    Inventors: Ami Kestenbaum, Richard S. Armington
  • Patent number: 5422493
    Abstract: A node switch useful for resource sharing within a network environment incorporating computer control uses opto-electronic isolators and switching devices to route bidirectional communications between a common port and at least two I/O ports on an asynchronous basis. Separate power supplies are used for the ports and the internal circuitry, thus providing signal matching between disparate pieces of equipment. Multiple node switches may be cascaded or "daisy-chained" to provide for flexible switching, depending upon the application.
    Type: Grant
    Filed: August 9, 1993
    Date of Patent: June 6, 1995
    Assignee: National Center for Manufacturing Sciences, Inc.
    Inventors: Ami Kestenbaum, Richard S. Armington
  • Patent number: 5064685
    Abstract: A conductive interconnection (27) on a substrate (11) is made by applying a metal-organic compound (25) to the substrate, exposing the metal-organic compound to laser beam radiation (14) in which the power level has been ramped to some specific level and, thereafter, moving the substrate with respect to the laser beam. The movement of the substrate is at an applied rate of speed such that the temperature within the metal-organic compound impinged by the laser beam is properly ramped with respect to time. This leaves a dependable metal deposition (27) which may be monitored through a viewing system (21).
    Type: Grant
    Filed: August 23, 1989
    Date of Patent: November 12, 1991
    Assignee: AT&T Laboratories
    Inventors: Ami Kestenbaum, Anthony J. Serafino
  • Patent number: 4284659
    Abstract: This disclosure is directed to a method of forming an interlevel dielectric glass layer (16) on a semiconductor device, the layer having a plurality of feed-through apertures (17--17) therein. A CW laser beam (29) is continuously raster scanned over the surface of the glass layer (16) to reflow the layer to densify the material and form a smooth surface topography about the apertures (17--17).
    Type: Grant
    Filed: May 12, 1980
    Date of Patent: August 18, 1981
    Assignees: Bell Telephone Laboratories, Western Electric Co., Inc.
    Inventors: Ralph J. Jaccodine, Ami Kestenbaum
  • Patent number: 4044222
    Abstract: An energy beam, such as the coherent output of a laser, is applied to a thin film in a controlled manner, preferably as a pluse. The length of the pulse is regulated to form a tapered aperture in the film. The duration, energy and wavelength of the beam pulse with respect to the thickness, thermal properties and optical properties of the film are such that impingement of the beam pulse on a first surface of the film results in controlled removal of a small amount of the film. The pulse is terminated before the temperature gradient between the first film surface and a second film surface (the film's thickness being bounded by the surfaces) is zero. Plural pulses may be serially applied to form the tapered aperture to a desired depth.Typically, the thin films range in thickness from several hundred angstroms (.about.400A.) to about 10,000A. and may be dielectrics (SiO.sub.2, Si.sub.3 N.sub.4, Ta.sub.2 O.sub.5), metals (Au, Al, Ta, etc.) and silicon.
    Type: Grant
    Filed: January 16, 1976
    Date of Patent: August 23, 1977
    Assignee: Western Electric Company, Inc.
    Inventor: Ami Kestenbaum