Patents by Inventor Amir Sagiv

Amir Sagiv has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • TIME-DOMAIN OPTICAL METROLOGY AND INSPECTION OF SEMICONDUCTOR DEVICES
    Publication number: 20240085805
    Abstract: A semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting a relevant and irrelevant portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the relevant portion of the time-domain representation.
    Type: Application
    Filed: January 28, 2022
    Publication date: March 14, 2024
    Applicant: NOVA LTD.
    Inventors: Gilad BARAK, Amir Sagiv, Yishai Schreiber, Jacob Ofek, Zvi Gorohovsky, Daphna Peimer
  • Method and system for use of binary spatial filters
    Patent number: 9470637
    Abstract: Methods and systems for designing a binary spatial filter based on data indicative of a desired exposure condition to be emulated by an inspection system, and for implementing the binary spatial filter in an optical path of the inspection system, thereby enabling emulation of the desired exposure condition by interacting a light beam of the inspection system with the binary spatial filter. The present method and systems enable on-the-fly and on-demand design and implementation/generation of spatial filters for use in inspection systems.
    Type: Grant
    Filed: February 24, 2015
    Date of Patent: October 18, 2016
    Assignee: APPLIED MATERIALS ISRAEL, LTD.
    Inventors: Shmuel Mangan, Amir Sagiv, Mariano Abramson
  • METHOD AND SYSTEM FOR USE OF BINARY SPATIAL FILTERS
    Publication number: 20150233842
    Abstract: Methods and systems for designing a binary spatial filter based on data indicative of a desired exposure condition to be emulated by an inspection system, and for implementing the binary spatial filter in an optical path of the inspection system, thereby enabling emulation of the desired exposure condition by interacting a light beam of the inspection system with the binary spatial filter. The present method and systems enable on-the-fly and on-demand design and implementation/generation of spatial filters for use in inspection systems.
    Type: Application
    Filed: February 24, 2015
    Publication date: August 20, 2015
    Inventors: Shmuel Mangan, Amir Sagiv, Mariano Abramson
  • Method and system for creation of binary spatial filters
    Patent number: 8984453
    Abstract: Methods and systems for designing a binary spatial filter based on data indicative of a desired exposure condition to be emulated by an inspection system, and for implementing the binary spatial filter in an optical path of the inspection system, thereby enabling emulation of the desired exposure condition by interacting a light beam of the inspection system with the binary spatial filter. The present method and systems enable on-the-fly and on-demand design and implementation/generation of spatial filters for use in inspection systems.
    Type: Grant
    Filed: June 28, 2012
    Date of Patent: March 17, 2015
    Assignee: Applied Materials Israel, Ltd.
    Inventors: Shmuel Mangan, Amir Sagiv, Mariano Abramson
  • METHOD AND SYSTEM FOR CREATION OF BINARY SPATIAL FILTERS
    Publication number: 20140007025
    Abstract: Methods and systems for designing a binary spatial filter based on data indicative of a desired exposure condition to be emulated by an inspection system, and for implementing the binary spatial filter in an optical path of the inspection system, thereby enabling emulation of the desired exposure condition by interacting a light beam of the inspection system with the binary spatial filter. The present method and systems enable on-the-fly and on-demand design and implementation/generation of spatial filters for use in inspection systems.
    Type: Application
    Filed: June 28, 2012
    Publication date: January 2, 2014
    Inventors: Shmuel Mangan, Amir Sagiv, Mariano Abramson
  • Method and system for aerial imaging of a reticle
    Patent number: 8213024
    Abstract: A system, method and computer readable medium for reticle evaluation, the method includes: (i) obtaining, during an imaging process, multiple images of the reticle under different polarization and optionally interferometric conditions; and (ii) generating an output aerial image in response to (i) the multiple images and (ii) differences between the imaging process and an exposure process; wherein during the exposure process an image of the reticle is projected onto a wafer.
    Type: Grant
    Filed: July 31, 2007
    Date of Patent: July 3, 2012
    Assignee: Applied Materials Israel, Ltd.
    Inventors: Shmuel Mangan, Boris Goldberg, Ishai Schwarzband, On Haran, Michael Ben-Yishay, Amir Sagiv, Chaim Braude
  • METHOD AND SYSTEM FOR DEFECT DETECTION
    Publication number: 20080074659
    Abstract: A system, method and computer readable medium for reticle evaluation, the method includes: (i) obtaining, during an imaging process, multiple images of the reticle under different polarization and optionally interferometric conditions; and (ii) generating an output aerial image in response to (i) the multiple images and (ii) differences between the imaging process and an exposure process; wherein during the exposure process an image of the reticle is projected onto a wafer.
    Type: Application
    Filed: July 31, 2007
    Publication date: March 27, 2008
    Inventors: Shmuel Mangan, Boris Goldberg, Ishai Schwarzband, On Haran, Michael Ben-Yishay, Amir Sagiv
  • Methods and apparatus for improving impedance tolerance of on-die termination elements
    Patent number: 7061266
    Abstract: An impedance calibration circuit in an integrated circuit includes a master current source to force a master current to flow through a first load that is external to the integrated circuit. The master current source includes a stabilized current source to provide a first part of the master current and a first supplementary current source to provide a supplementary part of the master current.
    Type: Grant
    Filed: July 6, 2004
    Date of Patent: June 13, 2006
    Assignee: Intel Corporation
    Inventor: Amir Sagiv
  • Methods and apparatus for improving impedance tolerance of on-die termination elements
    Publication number: 20060006902
    Abstract: An impedance calibration circuit in an integrated circuit includes a master current source to force a master current to flow through a first load that is external to the integrated circuit. The master current source includes a stabilized current source to provide a first part of the master current and a first supplementary current source to provide a supplementary part of the master current.
    Type: Application
    Filed: July 6, 2004
    Publication date: January 12, 2006
    Inventor: Amir Sagiv
  • System and method for noise approximation
    Publication number: 20030164784
    Abstract: A method and system for using a firmware solution to compensate for a hardware problem of a noise level with a high standard deviation.
    Type: Application
    Filed: March 4, 2002
    Publication date: September 4, 2003
    Inventors: Amir Sagiv, Avni Noam, Simcha Pearl, Hagit Frankel