Abstract: A system and method of generating a drop pattern. The method may include receiving an initial drop pattern. The method may include receiving a target drop pattern exclusion edge for each of a plurality of locations. The method may include receiving one or more constraints of a dispensing system. The method may include generating a base drop pattern exclusion edge line based on the target drop pattern exclusion edge. The method may include generating a new drop pattern wherein drops deposited at an edge of the new drop pattern are positioned on integer multiples of the pitch constraint from the optimum base drop pattern exclusion edge line.

Abstract: A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate, during a first pass, dispensing the formable material along a stitch line to form a first part of the fluid droplet pattern for an imprint field, where the stitch line runs from a first corner to a second corner of the imprint field. The method can also include offsetting the substrate and the fluid dispense ports relative to each other after dispensing the formable material during the first pass, and during a second pass, dispensing the formable material along the stitch line onto the substrate to form a second part of the fluid droplet pattern for the imprint field. An apparatus can be configured to carry out the method.

Abstract: A method of forming an imprint template. A hard mask layer is formed at a first side first side of a template plate. An imprint lithography is performed to form a patterned hard mask covering the first region, the patterned hard mask having a pattern portion and an edge portion defined in the same imprint lithography. The template plate is dry etched with the first region of the template plate covered with the patterned hard mask. An additional mask layer is formed on the patterned hard mask. A wet etch process is performed with both the patterned hard mask and the additional mask layer formed on the template plate to form a mesa under the pattern portion with the edge portion of the hard mask overhanging on the second region of the template plate.

Abstract: An apparatus for imprint lithography can include a logic element configured to generate a fluid droplet pattern of fluid droplets of a formable material to be dispensed onto a substrate. The fluid droplet pattern includes an imprint field, wherein the imprint field has an edge and a drop edge exclusion along the edge. In another aspect, a method can be carried out using the apparatus. The apparatus and method can be useful in filling an imprint field with a formable material relatively quickly without extrusion defects or other complications. The method can include determining a fluid droplet pattern with a first row along the edge of the imprint field having a first linear density and a second row having a second linear density, where the first linear density, the amount of droplets in the first row, is different than a second linear density, amount of droplets within the second row.

Abstract: A method of manufacturing a template including a mesa on a second side is disclosed. The method can include depositing a first coating on the second side, depositing a photocurable material over a top of the mesa, contacting the photocurable material with a second surface to cause the photocurable material to cover the top surface of the mesa and at least a portion of a side of the mesa, curing the photocurable material to form a cured film on the top surface and to form a cured extrusion on at least a portion of the side surface, the cured extrusion is thicker than the cured film, etching the top surface of the mesa to remove the first coating and the cured film from the top surface, and removing the cured extrusion to form the template with the first coating on the side surface.

Abstract: A template and method of using the template is disclosed. The template can include a body with a first side and a second side, and an extension. The extension can include a first surface adjacent the body, a second surface, and a third surface between the first surface and the second surface, where the first surface includes a curvature and where a portion of the curvature of the first surface is interior to the third surface. The method can include dispensing a formable material over a substrate, where the substrate includes a non-uniform surface topography. The method can also include curing the formable material contacting the second surface of the extension to form a layer over the substrate while the formable material contacting the third surface of the extension remains in a liquid state, wherein curing is performed while the template is contacting the formable material.

Abstract: Systems and methods for shaping a film. Formable material in an imprint field on the substrate may be contacted with a shaping surface of a template. Outer boundaries of the imprint field correspond to outer boundaries of the shaping surface. Shaping the film includes forming a cured layer within the imprint field while the shaping surface is in contact with the formable material. Shaping the film may include separating the shaping surface from the cured layer. Shaping the film may include moving the template away from the imprint field to a first offset location wherein the outer boundaries of the shaping surface are offset relative to the outer boundaries of the imprint field. Shaping the film may include curing a second portion of the formable material while the template is at the first offset location so as to form the shaped film.

Abstract: A system and method for cleaning mesa sidewalls of a template. Curable material may be deposited in a cleaning drop pattern onto a non-yielding imprint field of one of: a device yielding substrate; and a non-yielding substrate. The template may be brought into contact with the curable material. The template has: a recessed surface; a mesa extending from the recessed surface; and wherein the mesa sidewalls connect the recessed surface to the mesa. A relative position of the template to the cleaning drop pattern may be such that the curable material spreads up the mesa sidewalls and does not contact the recessed surface. Cured material may be formed by exposing the curable material to actinic radiation after the curable material has spread up the mesa sidewalls, and before the curable material contacts the recessed surface. The template may be separated from the cured material.

Abstract: A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate, during a first pass, dispensing the formable material along a stitch line to form a first part of the fluid droplet pattern for an imprint field, where the stitch line runs from a first corner to a second corner of the imprint field. The method can also include offsetting the substrate and the fluid dispense ports relative to each other after dispensing the formable material during the first pass, and during a second pass, dispensing the formable material along the stitch line onto the substrate to form a second part of the fluid droplet pattern for the imprint field. An apparatus can be configured to carry out the method.

Abstract: A system and method of generating a drop pattern. The method may include receiving an initial drop pattern. The method may include receiving a target drop pattern exclusion edge for each of a plurality of locations. The method may include receiving one or more constraints of a dispensing system. The method may include generating a base drop pattern exclusion edge line based on the target drop pattern exclusion edge. The method may include generating a new drop pattern wherein drops deposited at an edge of the new drop pattern are positioned on integer multiples of the pitch constraint from the optimum base drop pattern exclusion edge line.

Abstract: A frame curing template for imprinting formable material on a substrate and a system and a method of using the frame curing template. The template may comprise: a patterning surface on a mesa on a front side of the template; a recessed surface surrounding the mesa on the front side of the template; a recessed surface coating on the recessed surface. A first transmittance from a back side of the template through the recessed surface coating to actinic radiation may be below a first threshold transmittance. A first frame window may be inset within the recessed surface coating and surrounds the mesa. A second transmittance of the template from the back side of the template through the first frame window to the actinic radiation may be above the first threshold transmittance.

Abstract: An apparatus for imprint lithography can include a logic element configured to generate a fluid droplet pattern of fluid droplets of a formable material to be dispensed onto a substrate. The fluid droplet pattern includes an imprint field, wherein the imprint field has a side and a drop exclusion zone along the side, and the drop exclusion zone is narrower at a first point farther from the center of a side and wider at a second point closer to the center of the side. In another aspect, a method can be carried out using the apparatus. The apparatus and method can be useful in filling an imprint field with a formable material relatively quickly without extrusion defects or other complications.

Abstract: Systems for shaping a film by: depositing a formable material on a field of a substrate; and positioning a template relative to the field. The template has a mesa with a shaping surface and mesa sidewalls surround the shaping surface. The shaping may further comprise contacting the formable material with the shaping surface. The formable material may spread when the shaping surface is in contact with the formable material. The shaping may comprise exposing the formable material to a curing dose of actinic radiation after the formable material has spread to the edge of the field. A spatial distribution of the curing dose may be such that an interior dose applied at an interior of the field may be greater than a sidewall dose that is incident on the mesa sidewalls.

Abstract: An imprinting apparatus, a method of manufacturing an article, with a template having at least one mass velocity variation feature in a region that alters the filling rate of formable material in the second region surrounding a pattern region. The altered filling rate varies from a first filling rate, at a center of an outer edge of the region to a second filling rate, at corners of the outer edge of the region. The second filling rate is greater than the first filling rate.

Abstract: An imprinting template, an imprinting system, and an imprinting method for imprinting a pattern in a formable material on a substrate. The template includes an edge region that surrounds a pattern region. A full height represents an absolute value of a distance between top surface and bottom surface of the pattern region. The edge region extends to an edge of a mesa of the template. A portion of the edge region may be at least a full height below the top surface of the pattern region. An area of the portion of the edge region may be at least large enough to prevent formable material that is between the template and the substrate from extruding out beyond the edge of the mesa.

Abstract: Systems and methods for shaping a film by: depositing a formable material on a field of a substrate; and positioning a template relative to the field. The template has a mesa with a shaping surface and mesa sidewalls surround the shaping surface. The shaping may further comprise contacting the formable material with the shaping surface. The formable material may spread when the shaping surface is in contact with the formable material. The shaping may comprise exposing the formable material to a curing dose of actinic radiation after the formable material has spread to the edge of the field. A spatial distribution of the curing dose may be such that an interior dose applied at an interior of the field may be greater than a sidewall dose that is incident on the mesa sidewalls.

Abstract: A template and method of using the template is disclosed. The template can include a body with a first side and a second side, and an extension. The extension can include a first surface adjacent the body, a second surface, and a third surface between the first surface and the second surface, where the first surface includes a curvature and where a portion of the curvature of the first surface is interior to the third surface. The method can include dispensing a formable material over a substrate, where the substrate includes a non-uniform surface topography. The method can also include curing the formable material contacting the second surface of the extension to form a layer over the substrate while the formable material contacting the third surface of the extension remains in a liquid state, wherein curing is performed while the template is contacting the formable material.

Abstract: Systems and methods for shaping a film. Formable material in an imprint field on the substrate may be contacted with a shaping surface of a template. Outer boundaries of the imprint field correspond to outer boundaries of the shaping surface. Shaping the film includes forming a cured layer within the imprint field while the shaping surface is in contact with the formable material. Shaping the film may include separating the shaping surface from the cured layer. Shaping the film may include moving the template away from the imprint field to a first offset location wherein the outer boundaries of the shaping surface are offset relative to the outer boundaries of the imprint field. Shaping the film may include curing a second portion of the formable material while the template is at the first offset location so as to form the shaped film.

Abstract: Systems and methods for imprinting formable material on a substrate with a template. Illuminate the formable material with a gelling radiation distribution pattern. The gelling radiation distribution pattern has a gelling dosage that that varies from a minimum gelling dosage at each of a plurality of corners of a boundary edge to a peak gelling dosage at a center of each of the boundary edges.

Abstract: A nanoimprint lithography template, method of fabrication, and method of manufacturing an article using the same. The template includes a body having first and second opposed sides, the second side having a mesa extending therefrom, with the mesa having sidewalls and a surface. A recessed shelf extends around a perimeter of the mesa surface, with a light-blocking material positioned on at least the recessed shelf and at a thickness such that the light-blocking material does not extend beyond a plane defined by the mesa surface.