Patents by Inventor Amir Torkaman
Amir Torkaman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11978620Abstract: A plasma lamp for use in a laser-sustained plasma (LSP) light source is disclosed. The plasma lamp includes a gas containment structure for containing a gas, a gas seal positioned at a base of the gas containment structure, a gas inlet, and a gas outlet. The plasma lamp includes a gas swirler including a set of nozzles configured to generate a vortex gas flow and a swirler shaft including an inlet channel for delivering the gas from the gas inlet to the nozzles and an outlet channel for delivering the gas from the gas containment structure to the gas outlet. The plasma lamp includes a distributor including one or more plenums to distribute the gas from the gas inlet into the swirler. The plasma lamp may also include a deflector fluidically coupled to the swirler shaft and extending above the set of nozzles and configured to direct gas flow around the swirler.Type: GrantFiled: August 3, 2022Date of Patent: May 7, 2024Assignee: KLA CorporationInventors: Ilya Bezel, Leonid Borisovich Zvedenuk, Andrey Evgenievich Stepanov, Amir Torkaman
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Publication number: 20230053035Abstract: A plasma lamp for use in a laser-sustained plasma (LSP) light source is disclosed. The plasma lamp includes a gas containment structure for containing a gas, a gas seal positioned at a base of the gas containment structure, a gas inlet, and a gas outlet. The plasma lamp includes a gas swirler including a set of nozzles configured to generate a vortex gas flow and a swirler shaft including an inlet channel for delivering the gas from the gas inlet to the nozzles and an outlet channel for delivering the gas from the gas containment structure to the gas outlet. The plasma lamp includes a distributor including one or more plenums to distribute the gas from the gas inlet into the swirler. The plasma lamp may also include a deflector fluidically coupled to the swirler shaft and extending above the set of nozzles and configured to direct gas flow around the swirler.Type: ApplicationFiled: August 3, 2022Publication date: February 16, 2023Inventors: Ilya Bezel, Leonid Borisovich Zvedenuk, Andrey Evgenievich Stepanov, Amir Torkaman
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Patent number: 10948653Abstract: A novel apparatus for bonding of two polished substrates includes a plasma source in a ultra-high vacuum (UHV) chamber and a wafer-guiding element to control and guide wafers in the UHV chamber, where after a plasma activation process the wafers are guided and pressed against each other to form a covalent bond between wafer surfaces. The plasma activation process involves deposition of mono-layer or sub-monolayer metallic atom on the surface of substrates. After deposition of metallic layers, a high-force actuation presses the wafers and forms a covalent bond between the wafers. Then, the bonded wafer pair is ion-sliced or thinned to form single crystalline optical thin film. An annealing process oxidizes the deposited metallic layers and produces optically-transparent single crystalline thin film. An optical waveguide may be fabricated by this thin film while utilizing an electro-optic effect to produce optical modulators and other photonic devices.Type: GrantFiled: April 19, 2020Date of Patent: March 16, 2021Assignee: Partow Technologies, LLC.Inventors: Payam Rabiei, Jamie Nam, Amir Torkaman, Seyfollah Toroghi
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Publication number: 20200249394Abstract: A novel apparatus for bonding of two polished substrates includes a plasma source in a ultra-high vacuum (UHV) chamber and a wafer-guiding element to control and guide wafers in the UHV chamber, where after a plasma activation process the wafers are guided and pressed against each other to form a covalent bond between wafer surfaces. The plasma activation process involves deposition of mono-layer or sub-monolayer metallic atom on the surface of substrates. After deposition of metallic layers, a high-force actuation presses the wafers and forms a covalent bond between the wafers. Then, the bonded wafer pair is ion-sliced or thinned to form single crystalline optical thin film. An annealing process oxidizes the deposited metallic layers and produces optically-transparent single crystalline thin film. An optical waveguide may be fabricated by this thin film while utilizing an electro-optic effect to produce optical modulators and other photonic devices.Type: ApplicationFiled: April 19, 2020Publication date: August 6, 2020Inventors: Payam Rabiei, Jamie Nam, Amir Torkaman, Seyfollah Toroghi
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Patent number: 10663661Abstract: A novel apparatus for bonding of two polished substrates includes a plasma source in a ultra-high vacuum (UHV) chamber and a wafer-guiding element to control and guide wafers in the UHV chamber, where after a plasma activation process the wafers are guided and pressed against each other to form a covalent bond between wafer surfaces. The plasma activation process involves deposition of mono-layer or sub-monolayer metallic atom on the surface of substrates. After deposition of metallic layers, a high-force actuation presses the wafers and forms a covalent bond between the wafers. Then, the bonded wafer pair is ion-sliced or thinned to form single crystalline optical thin film. An annealing process oxidizes the deposited metallic layers and produces optically-transparent single crystalline thin film. An optical waveguide may be fabricated by this thin film while utilizing an electro-optic effect to produce optical modulators and other photonic devices.Type: GrantFiled: January 26, 2019Date of Patent: May 26, 2020Assignee: Partow Technologies, LLC.Inventors: Payam Rabiei, Jamie Nam, Amir Torkaman, Seyfollah Toroghi
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Patent number: 9433070Abstract: A plasma cell for forming light-sustained plasma includes a transmission element configured to contain a volume of gas, a first terminal flange disposed at or near an opening of the transmission element, a second terminal flange disposed at or near another opening of the transmission element, a floating flange disposed between the first or second terminal flange and the transmission element. The floating flange is movable to compensate for thermal expansion of the transmission element. Further, the floating flange is configured to enclose the internal volume of the transmission element to contain a volume of gas within the transmission element. The transmission element is configured to receive illumination from an illumination source in order to generate plasma within the volume of gas. The transmission element is transparent to a portion of the illumination from the illumination source and a portion of broadband radiation emitted by the plasma.Type: GrantFiled: December 11, 2014Date of Patent: August 30, 2016Assignee: KLA-Tencor CorporationInventors: Ilya Bezel, Anatoly Shchemelinin, Amir Torkaman
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Patent number: 9399596Abstract: The present disclosure provides methods and systems for bonding multiple wafers. An example system may include a sealable chamber with a first and second substantially vertical post positioned inside of the sealable chamber. The system may also include a first latch connected to the first post via a first pin, wherein the first pin allows the first latch to rotate about the first pin. The system may also include a second latch similarly configured to the first latch. The system may also include a base plate positioned between the first and second posts. The base plate is arranged such that when a first wafer rests on the base plate and a second wafer rests on the first and second latches, moving the base plate from a first position to a second position causes a top surface of the first wafer to contact a bottom surface of the second wafer.Type: GrantFiled: December 13, 2013Date of Patent: July 26, 2016Assignee: Google Inc.Inventors: Hongqin Shi, Sandeep Giri, Amir Torkaman, Jamie Nam
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Publication number: 20150201483Abstract: A plasma cell for forming light-sustained plasma includes a transmission element configured to contain a volume of gas, a first terminal flange disposed at or near an opening of the transmission element, a second terminal flange disposed at or near another opening of the transmission element, a floating flange disposed between the first or second terminal flange and the transmission element. The floating flange is movable to compensate for thermal expansion of the transmission element. Further, the floating flange is configured to enclose the internal volume of the transmission element to contain a volume of gas within the transmission element. The transmission element is configured to receive illumination from an illumination source in order to generate plasma within the volume of gas. The transmission element is transparent to a portion of the illumination from the illumination source and a portion of broadband radiation emitted by the plasma.Type: ApplicationFiled: December 11, 2014Publication date: July 16, 2015Inventors: Ilya Bezel, Anatoly Shchemelinin, Amir Torkaman
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Patent number: 8305105Abstract: A testing apparatus or test jig is configured to accept a electrical device for testing prior to final assembly. In one example, a pair of conductive conveying belts compliantly engage a partially assembled photovoltaic (PV) module by its sides, and electrodes engage orthogonal sides of the module. The test apparatus or jig can be use for a variety of electrical tests, and may, for example be connected to a high potential (HiPot) tester.Type: GrantFiled: November 12, 2008Date of Patent: November 6, 2012Assignee: NovaSolar Holdings LimitedInventors: Erik Vaaler, Amir Torkaman, George Panotopoulos
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Publication number: 20100117671Abstract: A testing apparatus or test jig is configured to accept a electrical device for testing prior to final assembly. In one example, a pair of conductive conveying belts compliantly engage a partially assembled photovoltaic (PV) module by its sides, and electrodes engage orthogonal sides of the module. The test apparatus or jig can be use for a variety of electrical tests, and may, for example be connected to a high potential (HiPot) tester.Type: ApplicationFiled: November 12, 2008Publication date: May 13, 2010Applicant: OptiSolar, Inc.Inventors: Erik Vaaler, Amir Torkaman, George Panotopoulos
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Patent number: 6874770Abstract: A high flow rate bubbler system and method are provided for producing a stable, easily controllable source of chemical vapors to a downstream process. The bubbler system is equipped with a vaporizer unit connected to its gas outlet tube. This vaporizer unit slows the gas velocity to enhance settling of entrained droplets and contacts the exiting gas with a high thermal mass, heated surfaces to promote heat transfer and evaporation of the entrained droplets.Type: GrantFiled: November 27, 2002Date of Patent: April 5, 2005Assignee: Aviza Technology, Inc.Inventor: Amir Torkaman
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Publication number: 20030116019Abstract: A high flow rate bubbler system and method are provided for producing a stable, easily controllable source of chemical vapors to a downstream process. The bubbler system is equipped with a vaporizer unit connected to its gas outlet tube. This vaporizer unit slows the gas velocity to enhance settling of entrained droplets and contacts the exiting gas with a high thermal mass, heated surfaces to promote heat transfer and evaporation of the entrained droplets.Type: ApplicationFiled: November 27, 2002Publication date: June 26, 2003Inventor: Amir Torkaman