Abstract: Metrology targets, production processes and optical systems are provided, which enable metrology of device-like targets. Supplementary structure(s) may be introduced in the target to interact optically with the bottom layer and/or with the top layer of the target and target cells configurations enable deriving measurements of device-characteristic features. For example, supplementary structure(s) may be designed to yield Moiré patterns with one or both layers, and metrology parameters may be derived from these patterns. Device production processes were adapted to enable production of corresponding targets, which may be measured by standard or by provided modified optical systems, configured to enable phase measurements of the Moiré patterns.

Abstract: A tunable filter may include an input focusing optic, an output focusing optic, a linearly-varying filter located at a back focal plane of the input focusing optic and a front focal plane of the output focusing optic, an input angular scanning component located at a front focal plane of the input focusing optic configured to receive an input beam, and an output angular scanning component located at a back focal plane of the output focusing optic. The input focusing optic may receive the input beam from the input angular scanning component and direct the input beam to the linearly-varying filter, where a position of the input beam on the linearly-varying filter is selectable based on an angle of the input angular scanning component. The output focusing optic may receive a filtered beam from the linearly-varying filter and direct the filtered beam to the output angular scanning component.

Abstract: Metrology targets, production processes and optical systems are provided, which enable metrology of device-like targets. Supplementary structure(s) may be introduced in the target to interact optically with the bottom layer and/or with the top layer of the target and target cells configurations enable deriving measurements of device-characteristic features. For example, supplementary structure(s) may be designed to yield Moiré patterns with one or both layers, and metrology parameters may be derived from these patterns. Device production processes were adapted to enable production of corresponding targets, which may be measured by standard or by provided modified optical systems, configured to enable phase measurements of the Moiré patterns.

Abstract: A tunable filter may include an input focusing optic, an output focusing optic, a linearly-varying filter located at a back focal plane of the input focusing optic and a front focal plane of the output focusing optic, an input angular scanning component located at a front focal plane of the input focusing optic configured to receive an input beam, and an output angular scanning component located at a back focal plane of the output focusing optic. The input focusing optic may receive the input beam from the input angular scanning component and direct the input beam to the linearly-varying filter, where a position of the input beam on the linearly-varying filter is selectable based on an angle of the input angular scanning component. The output focusing optic may receive a filtered beam from the linearly-varying filter and direct the filtered beam to the output angular scanning component.

Abstract: An overlay metrology system includes one or more processors coupled to an illumination source to direct illumination to a sample and a detector to capture diffracted orders of radiation from the sample. The system may generate overlay sensitivity calibration parameters based on differential measurements of a calibration target including two overlay target cells on the sample, where first-layer target elements and second-layer target elements of the overlay target cells are distributed with a common pitch along a measurement direction and are misregistered with a selected offset value in opposite directions. The system may further determine overlay measurements based on differential measurements of additional overlay target cells with two wavelengths, where first-layer target elements and second-layer target elements of the additional overlay target cells are distributed with the common pitch and are formed to overlap symmetrically.

Abstract: Metrology targets, production processes and optical systems are provided, which enable metrology of device-like targets. Supplementary structure(s) may be introduced in the target to interact optically with the bottom layer and/or with the top layer of the target and target cells configurations enable deriving measurements of device-characteristic features. For example, supplementary structure(s) may be designed to yield Moiré patterns with one or both layers, and metrology parameters may be derived from these patterns. Device production processes were adapted to enable production of corresponding targets, which may be measured by standard or by provided modified optical systems, configured to enable phase measurements of the Moiré patterns.

Abstract: Metrology methods and targets are provided, that expand metrological procedures beyond current technologies into multi-layered targets, quasi-periodic targets and device-like targets, without having to introduce offsets along the critical direction of the device design. Several models are disclosed for deriving metrology data such as overlays from multi-layered target and corresponding configurations of targets are provided to enable such measurements. Quasi-periodic targets which are based on device patterns are shown to improve the similarity between target and device designs, and the filling of the surroundings of targets and target elements with patterns which are based on device patterns improve process compatibility. Offsets are introduced only in non-critical direction and/or sensitivity is calibrated to enable, together with the solutions for multi-layer measurements and quasi-periodic target measurements, direct device optical metrology measurements.

Abstract: Metrology targets, production processes and optical systems are provided, which enable metrology of device-like targets. Supplementary structure(s) may be introduced in the target to interact optically with the bottom layer and/or with the top layer of the target and target cells configurations enable deriving measurements of device-characteristic features. For example, supplementary structure(s) may be designed to yield Moiré patterns with one or both layers, and metrology parameters may be derived from these patterns. Device production processes were adapted to enable production of corresponding targets, which may be measured by standard or by provided modified optical systems, configured to enable phase measurements of the Moiré patterns.

Abstract: Metrology methods and targets are provided, for estimating inter-cell process variation by deriving, from overlay measurements of at least three target cells having different designed misalignments, a dependency of a measured inaccuracy on the designed misalignments (each designed misalignment is between at least two overlapping periodic structures in the respective target cell). Inaccuracies which are related to the designed misalignments are reduced, process variation sources are detected and targets and measurement algorithms are optimized according to the derived dependency.

Abstract: An overlay metrology system includes one or more processors coupled to an illumination source to direct illumination to a sample and a detector to capture diffracted orders of radiation from the sample. The system may generate overlay sensitivity calibration parameters based on differential measurements of a calibration target including two overlay target cells on the sample, where first-layer target elements and second-layer target elements of the overlay target cells are distributed with a common pitch along a measurement direction and are misregistered with a selected offset value in opposite directions. The system may further determine overlay measurements based on differential measurements of additional overlay target cells with two wavelengths, where first-layer target elements and second-layer target elements of the additional overlay target cells are distributed with the common pitch and are formed to overlap symmetrically.

Abstract: Metrology targets, production processes and optical systems are provided, which enable metrology of device-like targets. Supplementary structure(s) may be introduced in the target to interact optically with the bottom layer and/or with the top layer of the target and target cells configurations enable deriving measurements of device-characteristic features. For example, supplementary structure(s) may be designed to yield Moiré patterns with one or both layers, and metrology parameters may be derived from these patterns. Device production processes were adapted to enable production of corresponding targets, which may be measured by standard or by provided modified optical systems, configured to enable phase measurements of the Moiré patterns.

Abstract: Metrology methods and targets are provided, that expand metrological procedures beyond current technologies into multi-layered targets, quasi-periodic targets and device-like targets, without having to introduce offsets along the critical direction of the device design. Several models are disclosed for deriving metrology data such as overlays from multi-layered target and corresponding configurations of targets are provided to enable such measurements. Quasi-periodic targets which are based on device patterns are shown to improve the similarity between target and device designs, and the filling of the surroundings of targets and target elements with patterns which are based on device patterns improve process compatibility. Offsets are introduced only in non-critical direction and/or sensitivity is calibrated to enable, together with the solutions for multi-layer measurements and quasi-periodic target measurements, direct device optical metrology measurements.

Abstract: Metrology methods and targets are provided, for estimating inter-cell process variation by deriving, from overlay measurements of at least three target cells having different designed misalignments, a dependency of a measured inaccuracy on the designed misalignments (each designed misalignment is between at least two overlapping periodic structures in the respective target cell). Inaccuracies which are related to the designed misalignments are reduced, process variation sources are detected and targets and measurement algorithms are optimized according to the derived dependency.

Abstract: Methods, systems, and computer-readable media for facilitating personalization of web content is provided, while protecting the privacy of the user data utilized to personalize the user's experience. A privacy vault may collect user data including user activity data, demographic data, and user interests submitted by a user. In one embodiment, the privacy vault operates on a user client device. The privacy vault sends the user data to a community vault that collects user data from multiple users. The community vault generates segment rules that whether a user belongs to a user segment, which expresses a user's interest. The segment rules are then communicated back to the privacy vault, which assigns one or more user segments to the user based on the user data available to the privacy vault and the segment rules. The privacy vault may communicate user segments to one or more content providers that supply personalized content that is selected based on the user segments provided.

Abstract: A method for scanning content, including identifying tokens within an incoming byte stream, the tokens being lexical constructs for a specific language, identifying patterns of tokens, generating a parse tree from the identified patterns of tokens, and identifying the presence of potential exploits within the parse tree, wherein said identifying tokens, identifying patterns of tokens, and identifying the presence of potential exploits are based upon a set of rules for the specific language. A system and a computer readable storage medium are also described and claimed.

Abstract: A security system for scanning content within a computer, including a network interface, housed within a computer, for receiving content from the Internet on its destination to an Internet application running on the computer, a database of rules corresponding to computer exploits, stored within the computer, a rule-based content scanner that communicates with said database of rules, for scanning content to recognize the presence of potential exploits therewithin, a network traffic probe, operatively coupled to the network interface and to the rule-based content scanner, for selectively diverting content from its intended destination to the rule-based content scanner, and a rule update manager that communicates with said database of rules, for updating said database of rules periodically to incorporate new rules that are made available. A method and a computer readable storage medium are also described and claimed.

Abstract: Methods, systems, and computer-readable media for facilitating personalization of web content is provided, while protecting the privacy of the user data utilized to personalize the user's experience. A privacy vault may collect user data including user activity data, demographic data, and user interests submitted by a user. In one embodiment, the privacy vault operates on a user client device. The privacy vault sends the user data to a community vault that collects user data from multiple users. The community vault generates segment rules that whether a user belongs to a user segment, which expresses a user's interest. The segment rules are then communicated back to the privacy vault, which assigns one or more user segments to the user based on the user data available to the privacy vault and the segment rules. The privacy vault may communicate user segments to one or more content providers that supply personalized content that is selected based on the user segments provided.

Abstract: A system and apparatus for content delivery to storage. Delivery may be performed according to content types, which may be, for example, content object identifier, a flow of content objects, and store channel levels. Delivery may be performed according to a virtual network defined over a physical network infrastructure and further using peer-to-peer, multicast and/or unicast protocols.

Abstract: A security system for scanning content within a computer, including a network interface, housed within a computer, for receiving content from the Internet on its destination to an Internet application running on the computer, a database of rules corresponding to computer exploits, stored within the computer, a rule-based content scanner that communicates with said database of rules, for scanning content to recognize the presence of potential exploits therewithin, a network traffic probe, operatively coupled to the network interface and to the rule-based content scanner, for selectively diverting content from its intended destination to the rule-based content scanner, and a rule update manager that communicates with said database of rules, for updating said database of rules periodically to incorporate new rules that are made available. A method and a computer readable storage medium are also described and claimed.

Abstract: A method for scanning content, including identifying tokens within an incoming byte stream, the tokens being lexical constructs for a specific language, identifying patterns of tokens, generating a parse tree from the identified patterns of tokens, and identifying the presence of potential exploits within the parse tree, wherein said identifying tokens, identifying patterns of tokens, and identifying the presence of potential exploits are based upon a set of rules for the specific language. A system and a computer readable storage medium are also described and claimed.