Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more silicon-containing compounds.

Abstract: Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more atomic layer deposition (ALD) materials, one or more block copolymers, or one or more silicon-containing compounds.

Abstract: Apparatus and methods of performing nanoimprint lithography using an anti-slip landing ring are provided. In one embodiment, a process chamber for nanoimprint lithography is provided and includes a substrate support and a ring disposed on the substrate support. The ring has a top surface opposite the substrate support, and the top surface has a grid pattern. A bottom surface facing the substrate support has a different pattern compared to the grid pattern.

Abstract: Apparatus and methods of performing nanoimprint lithography using an anti-slip landing ring are provided. In one embodiment, a process chamber for nanoimprint lithography is provided and includes a substrate support and a ring disposed on the substrate support. The ring has a top surface opposite the substrate support, and the top surface has a grid pattern. A bottom surface facing the substrate support has a different pattern compared to the grid pattern.

Abstract: Embodiments described herein include a waveguide combiner having an edge coated with an optically absorbent composition and a method of coating the edge of the waveguide combiner with the optically absorbent composition. The optically absorbent composition includes one or more types of nanoparticles or microparticles, at least one of one or more dyes or one or more pigments, and a polymer matrix of one or more binders. The method includes producing an optically absorbent formulation. The optically absorbent formulation includes one or more types of particles, at least one of one or more dyes or one or more pigments, one or more binders, and one or more solvents. The optically absorbent formulation is applied on an edge of a waveguide combiner using an edge blackening tool. The formulation is cured with radiation to form the optically absorbent composition.

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more atomic layer deposition (ALD) materials, one or more block copolymers, or one or more silicon-containing compounds.

Abstract: Embodiments of the present disclosure generally relate to optically densified nanoimprint films and processes for making these optically densified nanoimprint films, as well as optical devices containing the optically densified nanoimprint films. In one or more embodiments, a method of forming a nanoimprint film includes positioning a substrate containing a porous nanoimprint film within a processing chamber, where the porous nanoimprint film contains nanoparticles and voids between the nanoparticles, and the porous nanoimprint film has a refractive index of less than 2. The method also includes depositing a metal oxide on the porous nanoimprint film and within at least a portion of the voids to produce an optically densified nanoimprint film during an atomic layer deposition (ALD) process.

Abstract: Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition contains one or more types of nanoparticles, one or more surface ligands, one or more solvents, one or more additives, and one or more acrylates.

Abstract: The present invention relates to methods of inducing an immune response to Staphylococcus comprising administering a composition comprising an SA2451-related polypeptide from Staphylococcus aureus as well as derivatives or fragments thereof. The present invention also encompasses methods of treating and/or reducing the likelihood of a Staphylococcus infection by administering a composition comprising an SA2451-related polypeptide or an antibody that specifically binds to an SA2451 polypeptide, derivative or fragments thereof. Compositions administered in the methods of the invention can include one or more additional antigens. Compositions used to practice the methods of the invention are also encompassed.

Abstract: The present invention relates to peptides of the enolase protein from Staphylococcus aureus as well as nucleic acid and nucleic acid sequence homologs encoding the peptides. The present invention also relates to a composition, particularly a S. aureus vaccine, comprising one or more of the enolase peptides described herein or a fragment, derivative or variant thereof capable of generating an immune response that induces a protective antibody response or opsonophagocytic activity of human neutrophils for S. aureus. The present invention also encompasses methods of treating and/or reducing the likelihood of a Staphylococcus infection by administering a composition of the invention.

Abstract: The present invention relates to methods of inducing an immune response to Staphylococcus comprising administering a composition comprising an SA2493-related polypeptide from Staphylococcus aureus as well as derivatives or fragments thereof. The present invention also encompasses methods of treating and/or reducing the likelihood of a Staphylococcus infection by administering a composition comprising an SA2493-related polypeptide or an antibody that specifically binds to an SA2493 polypeptide, derivative or fragments thereof. Compositions administered in the methods of the invention can include one or more additional antigens including, but not limited to, IsdB. Compositions used to practice the methods of the invention are also encompassed.

Abstract: The present invention relates to methods of inducing an immune response to Staphylococcus comprising administering a composition comprising an SA2493-related polypeptide from Staphylococcus aureus as well as derivatives or fragments there-of. The present invention also encompasses methods of treating and/or reducing the likelihood of a Staphylococcus infection by administering a composition comprising an SA2493-related polypeptide or an antibody that specifically binds to an SA2493 polypeptide, derivative or fragments thereof. Compositions administered in the methods of the invention can include one or more additional antigens including, but not limited to, IsdB. Compositions used to practice the methods of the invention are also encompassed.

Abstract: The present invention relates to methods of inducing an immune response to Staphylococcus comprising administering a composition comprising an SA2074-related polypeptide from Staphylococcus aureus as well as derivatives or fragments thereof. The present invention also encompasses methods of treating and/or reducing the likelihood of a Staphylococcus infection by administering a composition comprising an SA2074-related polypeptide or an antibody that specifically binds to an SA2074 polypeptide, derivative or fragments thereof. Compositions administered in the methods of the invention can include one or more additional antigens. Compositions used to practice the methods of the invention are also encompassed.

Abstract: The present invention relates to methods of inducing an immune response to Staphylococcus comprising administering a composition comprising an SA2451-related polypeptide from Staphylococcus aureus as well as derivatives or fragments thereof. The present invention also encompasses methods of treating and/or reducing the likelihood of a Staphylococcus infection by administering a composition comprising an SA2451-related polypeptide or an antibody that specifically binds to an SA2451 polypeptide, derivative or fragments thereof. Compositions administered in the methods of the invention can include one or more additional antigens. Compositions used to practice the methods of the invention are also encompassed.

Abstract: The present invention relates to peptides of the enolase protein from Staphylococcus aureus as well as nucleic acid and nucleic acid sequence homologues encoding the peptides. The present invention also relates to a composition, particularly a S. aureus vaccine, comprising one or more of the enolase peptides described herein or a fragment, derivative or variant thereof capable of generating an immune response that induces a protective antibody response or opsonophagocytic activity of human neutrophils for S. aureus. The present invention also encompasses methods of treating and/or reducing the likelihood of a Staphylococcus infection by administering a composition of the invention.