Abstract: The present disclosure provides an apparatus for a lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane, a pellicle frame including a material selected from the group consisting of boron nitride (BN), boron carbide (BC), and a combination thereof, a mask, a first adhesive layer that secures the pellicle membrane to the pellicle frame, and a second adhesive layer that secures the pellicle frame to the mask.

Abstract: The present disclosure provides an apparatus for a lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane, a pellicle frame including a material selected from the group consisting of boron nitride (BN), boron carbide (BC), and a combination thereof, a mask, a first adhesive layer that secures the pellicle membrane to the pellicle frame, and a second adhesive layer that secures the pellicle frame to the mask.

Abstract: The present disclosure provides an apparatus for a semiconductor lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane, a porous pellicle frame, a mask with a patterned surface, a first thermal conductive adhesive layer that secures the pellicle membrane to the porous pellicle frame, and a second thermal conductive adhesive layer that secures the porous pellicle frame to the mask.

Abstract: A volatile material dispensing system (100) includes a base (104) and a refill (102) attached to the base (104). The refill (102) includes a substrate (108) having a volatile material thereon. The dispensing system (100) further includes a cover (106). In an inactive state, the refill (102) is compressed within the cover (106) and the cover (106) is attached to the base (104) and in an active state, the cover (106) is removed from the base and the refill (102) automatically expands such that the volatile material is released from the substrate (108) and into the ambient environment.

Abstract: The present disclosure provides an apparatus for a semiconductor lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane, a porous pellicle frame, a mask with a patterned surface, a first thermal conductive adhesive layer that secures the pellicle membrane to the porous pellicle frame, and a second thermal conductive adhesive layer that secures the porous pellicle frame to the mask.

Abstract: The present disclosure provides an apparatus for a semiconductor lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane with a thermal conductive surface; a porous pellicle frame; and a thermal conductive adhesive layer that secures the pellicle membrane to the porous pellicle frame. The porous pellicle frame includes a plurality of pore channels continuously extending from an exterior surface of the porous pellicle frame to an interior surface of the porous pellicle frame.

Abstract: The present disclosure provides an apparatus for a semiconductor lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane with a thermal conductive surface; a porous pellicle frame; and a thermal conductive adhesive layer that secures the pellicle membrane to the porous pellicle frame. The porous pellicle frame includes a plurality of pore channels continuously extending from an exterior surface of the porous pellicle frame to an interior surface of the porous pellicle frame.

Abstract: The present disclosure provides an apparatus for a semiconductor lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane with a thermal conductive surface; a porous pellicle frame; and a thermal conductive adhesive layer that secures the pellicle membrane to the porous pellicle frame. The porous pellicle frame includes a plurality of pore channels continuously extending from an exterior surface of the porous pellicle frame to an interior surface of the porous pellicle frame.

Abstract: The present disclosure provides an apparatus for a semiconductor lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane with a thermal conductive surface; a porous pellicle frame; and a thermal conductive adhesive layer that secures the pellicle membrane to the porous pellicle frame. The porous pellicle frame includes a plurality of pore channels continuously extending from an exterior surface of the porous pellicle frame to an interior surface of the porous pellicle frame.

Abstract: A dispensing device for release of an air treatment material includes a semi-permeable substrate having a mesh size between about 15 strands per cm to about 79 strands per cm and a support component for supporting the semi-permeable substrate. The dispensing device releases the air treatment material at a rate of at least about 0.05 mg/hr at about 25° C.

Abstract: A volatile material dispensing system (100) includes a base (104) and a refill (102) attached to the base (104). The refill (102) includes a substrate (108) having a volatile material thereon. The dispensing system (100) further includes a cover (106). In an inactive state, the refill (102) is compressed within the cover (106) and the cover (106) is attached to the base (104) and in an active state, the cover (106) is removed from the base and the refill (102) automatically expands such that the volatile material is released from the substrate (108) and into the ambient environment.

Abstract: A dispensing device for release of an air treatment material includes a semi-permeable substrate having a mesh size between about 15 strands per cm to about 79 strands per cm and a support component for supporting the semi-permeable substrate. The dispensing device releases the air treatment material at a rate of at least about 0.05 mg/hr at about 25° C.

Abstract: A twist car includes a body having a hole defined therethrough. A revolving axle is rotatably mounted to a front portion of the body by extending a first end through the hole in the body. A steering wheel is mounted to the first end of the revolving axle and located over the body of the car. A front wheels set includes a balance block, two small wheels and two rolling members that is fixed to a first end of the revolving axle and located underside of the body of the twist car. Two rear wheels are defined underside of the rear portion of the body of the twist car.