Patents by Inventor Amos Dor

Amos Dor has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7401066
    Abstract: One embodiment of the present invention is a process tool optimization system that includes: (a) a data mining engine that analyzes end-of-line yield data to identify one or more process tools associated with low yield; and (b) in response to output from the analysis, analyzes process tool data from the one or more process tools to identify one or more process tool parameters associated with the low yield.
    Type: Grant
    Filed: March 21, 2002
    Date of Patent: July 15, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Israel Beinglass, Amir Feili, Amos Dor
  • Patent number: 6885977
    Abstract: A method (400) for determining a response to a wafer manufacturing process problem includes the steps of generating a wafer map signature (406) containing defect attributes to be identified and retrieving (410) one or more wafer map signatures from a database. The wafer map signature to be identified is matched (414) with the one or more wafer map signatures from the database in order to help find a root cause of a defect in a wafer manufacturing process. This provides at least the advantage that a signature matching capability allows an Operator to more accurately identify a root manufacturing cause of a wafer defect. Furthermore, instant feedback to the wafer manufacturing process can be provided to facilitate rapid correction of manufacturing errors.
    Type: Grant
    Filed: December 20, 2002
    Date of Patent: April 26, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Yifah Gavra, Amos Dor
  • Publication number: 20040122859
    Abstract: A method (400) for determining a response to a wafer manufacturing process problem includes the steps of generating a wafer map signature (406) containing defect attributes to be identified and retrieving (410) one or more wafer map signatures from a database. The wafer map signature to be identified is matched (414) with the one or more wafer map signatures from the database in order to help find a root cause of a defect in a wafer manufacturing process.
    Type: Application
    Filed: December 20, 2002
    Publication date: June 24, 2004
    Applicant: Applie Materials, Inc.
    Inventors: Yifah Gavra, Amos Dor
  • Patent number: 6744266
    Abstract: A method and associated apparatus for creating a defect knowledge library containing case study information of wafer defects on semiconductor wafers. The method comprises creating a database entry that contains a case study of a specific defect including defect information that comprises one or more defect images and storing the database entry for subsequent access. The database entries are stored on a server and are accessible by a plurality of clients.
    Type: Grant
    Filed: July 13, 2001
    Date of Patent: June 1, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Amos Dor, Maya Radzinski
  • Patent number: 6714884
    Abstract: A method and apparatus for providing communication between a defect source identifier and a tool data collection and control system. The defect source identifier collects wafer data until a defect is identified. Upon identification of a defect, a request is sent to the tool data collection and control system to request data of the tool parameters at the time the defect occurred. The tool data collection and control system retrieves the tool parameters and communicates them to the defect source identifier through a network. The tool parameters are processed by the defect source identifier to extract certain wafer data. The selected wafer data is communicated to the tool data collection and control system and is used to execute a prediction model to predict failure possible of the tool elements.
    Type: Grant
    Filed: October 15, 2001
    Date of Patent: March 30, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Amos Dor, Maya Radzinski
  • Patent number: 6701259
    Abstract: A method and associated apparatus of analyzing defects on semiconductor wafers. The method includes identifying defects on the semiconductor wafer. Defect inspection information is created within a defect source identifier client. The defect inspection information containing information regarding the identified defects. The defect inspection information is transmitted through a network to a defect source identifier server. Defect source information is derived at the defect source identifier server in response to the defect inspection information. The defect source information is transmitted from the defect source identifier server to the defect source identifier client. The defect source information is utilized at the defect source identifier client. In one aspect, the utilizing the defect solution information involves displaying defect solutions to the defect at the defect source identifier client in response to the defect solution information.
    Type: Grant
    Filed: July 13, 2001
    Date of Patent: March 2, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Amos Dor, Maya Radzinski
  • Publication number: 20030182252
    Abstract: One embodiment of the present invention is a process tool optimization system that includes: (a) a data mining engine that analyzes end-of-line yield data to identify one or more process tools associated with low yield; and (b) in response to output from the analysis, analyzes process tool data from the one or more process tools to identify one or more process tool parameters associated with the low yield.
    Type: Application
    Filed: March 21, 2002
    Publication date: September 25, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Israel Beinglass, Amir Feili, Amos Dor
  • Publication number: 20030135295
    Abstract: A defect source identifier that provides information used to identify a source of a defect on a substrate, which defect source identifier includes a LotRoute database generation process and a LotRoute database access process, wherein the LotRoute database generation process includes a software application that runs on a server and that, in response to user input, defines a wafer route including wafer route information, and associates the wafer route with any one of a number of entities; and the LotRoute database process includes a software application that runs on the server and that, in response to input from the defect source identifier, retrieves the wafer route information using an identifier of one of the entities.
    Type: Application
    Filed: January 14, 2002
    Publication date: July 17, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Amos Dor, Yifah Gavra
  • Publication number: 20020161532
    Abstract: A method and associated apparatus of analyzing defects on semiconductor wafers. The method includes identifying defects on the semiconductor wafer. Defect inspection information is created within a defect source identifier client. The defect inspection information containing information regarding the identified defects. The defect inspection information is transmitted through a network to a defect source identifier server. Defect source information is derived at the defect source identifier server in response to the defect inspection information. The defect source information is transmitted from the defect source identifier server to the defect source identifier client. The defect source information is utilized at the defect source identifier client. In one aspect, the utilizing the defect solution information involves displaying defect solutions to the defect at the defect source identifier client in response to the defect solution information.
    Type: Application
    Filed: July 13, 2001
    Publication date: October 31, 2002
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Amos Dor, Maya Radzinski
  • Publication number: 20020072162
    Abstract: A method and associated apparatus for creating a defect knowledge library containing case study information of wafer defects on semiconductor wafers. The method comprises creating a database entry that contains a case study of a specific defect including defect information that comprises one or more defect images and storing the database entry for subsequent access. The database entries are stored on a server and are accessible by a plurality of clients.
    Type: Application
    Filed: July 13, 2001
    Publication date: June 13, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Amos Dor, Maya Radzinski
  • Publication number: 20020069024
    Abstract: A method and apparatus for providing communication between a defect source identifier and a tool data collection and control system. The defect source identifier collects wafer data until a defect is identified. Upon identification of a defect, a request is sent to the tool data collection and control system to request data of the tool parameters at the time the defect occurred. The tool data collection and control system retrieves the tool parameters and communicates them to the defect source identifier through a network. The tool parameters are processed by the defect source identifier to extract certain wafer data. The selected wafer data is communicated to the tool data collection and control system and is used to execute a prediction model to predict failure possible of the tool elements.
    Type: Application
    Filed: October 15, 2001
    Publication date: June 6, 2002
    Inventors: Amos Dor, Maya Radzinski
  • Publication number: 20020065900
    Abstract: A method and associated apparatus for communicating defect information between a defect source identifier server and client. The method comprises creating defect inspection information within a defect source identifier client, the defect inspection information containing information regarding identified defects on semiconductor wafers. In one aspect, an XML converter converts the defect inspection information into converted defect inspection information that is in a form defined by user defined tags. The converted defect inspection information is transmitted through a network to a defect source identifier server. Defect source information is derived at the defect source identifier server in response to the converted defect inspection information.
    Type: Application
    Filed: July 13, 2001
    Publication date: May 30, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Amos Dor, Maya Radzinski
  • Publication number: 20020046001
    Abstract: A method, computer readable medium and apparatus comprising a defect knowledge library (DKL), subscriber equipment and a communications network that connects the subscriber equipment t the DKL. The DKL contains a partitioned database of defect, defect source and defect mitigation information that is arranged by participating integrated circuit fabricator (referred to herein as a subscriber). The subscribers can identify the amount and type of information that they wish to share with other subscribers and whether their identity will be disclosed. The subscribers may share the data with specific “partners” or with other departments within their company, without sharing with other subscribers. The DKL system administrator charges a fee for the access rights. The more information that a subscriber shares with other subscribers, the lower the access fee. As such, subscribers are given financial incentive to share their information with other subscribers.
    Type: Application
    Filed: July 13, 2001
    Publication date: April 18, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Amos Dor, Maya Radzinski