Patents by Inventor Amotz Maimon

Amotz Maimon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6763130
    Abstract: A method and apparatus for inspecting a semiconductor wafer provides real-time information identifying tools visited by wafers under inspection and the process parameters used at those tools, and displays this information at the wafer inspection tool. Embodiments include inspecting a wafer using an inspection tool, such as a CCD imager, generating a list of the tools visited by the wafer from data retrieved from a conventional manufacturing execution system and displaying the list at the inspection tool, along with a defect map. The user may then request that a set of process parameters and tool parameters for any of the tools identified on the list be displayed at the inspection tool. Thus, at the time that defects are discovered, the user is automatically provided with a list of the tools visited by the wafer and has easy access to the process parameters used at each of those tools.
    Type: Grant
    Filed: July 21, 1999
    Date of Patent: July 13, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Sasson Somekh, Amotz Maimon
  • Patent number: 6408219
    Abstract: A yield enhancement system organizes defect classification and attribute information into a global classification scheme. The global classes are used to identify defect sources and to generate inspection and review plans. The system accumulates defect information in a database and continually refines the information to improve the accuracy of the classification assignments and the identification of the defect sources.
    Type: Grant
    Filed: May 11, 1998
    Date of Patent: June 18, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Patrick H Lamey, Jr., Amotz Maimon, Gad Yaron
  • Publication number: 20010051836
    Abstract: A yield enhancement system organizes defect classification and attribute information into a global classification scheme. The global classes are used to identify defect sources and to generate inspection and review plans. The system accumulates defect information in a database and continually refines the information to improve the accuracy of the classification assignments and the identification of the defect sources.
    Type: Application
    Filed: May 11, 1998
    Publication date: December 13, 2001
    Inventors: PATRICK H. LAMEY, AMOTZ MAIMON, GAD YARON
  • Patent number: 6199157
    Abstract: A system, method and medium for configuring an item such as a machine having multiple optional components is provided. This is accomplished using “options,” which correspond to the optional components of the machine, and are selected by a user according to those optional components that the user desires to have as part of the machine. Each option is envisioned to be created to contain the necessary properties (such as attributes and constraints) to appropriately configure the corresponding optional component within the machine. Embodiments of the present invention envision that the options can be arranged in a hierarchical option tree to help allow a user to better visualize the structure of the machine in making decisions concerning configuration.
    Type: Grant
    Filed: March 30, 1998
    Date of Patent: March 6, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Dan Bar Dov, Oded Ben-Haim, Roy Lauer, Amotz Maimon, Michael Palatnik