Patents by Inventor Amoud Willem Notenboom

Amoud Willem Notenboom has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask assembly and associated methods
    Patent number: 11086213
    Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
    Type: Grant
    Filed: February 24, 2020
    Date of Patent: August 10, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Derk Servatius Gertruda Brouns, Dennis De Graaf, Robertus Cornelis Martinus De Kruif, Paul Janssen, Matthias Kruizinga, Amoud Willem Notenboom, Daniel Andrew Smith, Beatrijs Louise Marie-Joseph Katrien Verbrugge, James Norman Wiley
  • MASK ASSEMBLY AND ASSOCIATED METHODS
    Publication number: 20200192217
    Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
    Type: Application
    Filed: February 24, 2020
    Publication date: June 18, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Derk Servatius Gertruda Brouns, Dennis De Graaf, Robertus Comelis Martinus De Kruif, Paul Janssen, Mathias Kruizinga, Amoud Willem Notenboom, Daniel Andrew Smith, Beatrijs Louise Marie-Josep Katrien Verbrugge, James Norman Wiley