Patents by Inventor Amy C. Sulivan

Amy C. Sulivan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Diffraction unlimited photolithography
    Patent number: 8697346
    Abstract: Methods, devices, systems, and materials are disclosed for diffraction unlimited photofabrication. A method is provided where a photoresponsive material is illuminated with a first optical pattern at a first wavelength of light. The first wavelength of light alters a solubility of the photoresponsive organic material. The photoresponsive material is also illuminated with a second optical pattern at a second wavelength of light. The second wavelength of light hinders the ability of the first wavelength of light to alter the solubility of the photoresponsive organic material where the second optical pattern overlaps the first optical pattern. The photoresponsive organic material is then developed.
    Type: Grant
    Filed: April 1, 2011
    Date of Patent: April 15, 2014
    Assignee: The Regents of the University of Colorado
    Inventors: Robert R. McLeod, Christopher N. Bowman, Timothy F. Scott, Amy C. Sulivan