Patents by Inventor Amy M. Tseng

Amy M. Tseng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9677998
    Abstract: A method of detecting and measuring the presence of ammonium fluoride in a buffered oxide etchant (“BOE”) composition is provided.
    Type: Grant
    Filed: December 18, 2014
    Date of Patent: June 13, 2017
    Assignee: ECOLAB USA INC.
    Inventors: Amy M. Tseng, Brian V. Jenkins, Robert M. Mack
  • Publication number: 20160178507
    Abstract: The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.
    Type: Application
    Filed: December 18, 2014
    Publication date: June 23, 2016
    Applicant: ECOLAB USA INC.
    Inventors: Amy M. Tseng, Brian V. Jenkins, Robert M. Mack
  • Patent number: 8945939
    Abstract: The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.
    Type: Grant
    Filed: November 18, 2013
    Date of Patent: February 3, 2015
    Assignee: Ecolab USA Inc.
    Inventors: Amy M. Tseng, Brian V. Jenkins, Robert Mack
  • Patent number: 8932874
    Abstract: The invention is directed towards methods and compositions for identifying the amount of ammonium acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of ammonium acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of ammonium acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the ammonium acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.
    Type: Grant
    Filed: July 2, 2014
    Date of Patent: January 13, 2015
    Assignee: Nalco Company
    Inventors: Amy M. Tseng, Brian V. Jenkins, Robert M. Mack
  • Publication number: 20140315320
    Abstract: The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.
    Type: Application
    Filed: July 2, 2014
    Publication date: October 23, 2014
    Applicant: NALCO COMPANY
    Inventors: Amy M. Tseng, Brian V. Jenkins, Robert M. Mack
  • Patent number: 8753896
    Abstract: A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the fluorescence or electromagnetic emission of a sample collected from a microelectronic process.
    Type: Grant
    Filed: April 5, 2007
    Date of Patent: June 17, 2014
    Assignee: Nalco Company
    Inventors: Brian V. Jenkins, John E. Hoots, Amy M. Tseng
  • Publication number: 20140073060
    Abstract: The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.
    Type: Application
    Filed: November 18, 2013
    Publication date: March 13, 2014
    Applicant: Nalco Company
    Inventors: Amy M. Tseng, Brian V. Jenkins, Robert Mack
  • Publication number: 20130183773
    Abstract: The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.
    Type: Application
    Filed: December 31, 2012
    Publication date: July 18, 2013
    Inventors: Amy M. Tseng, Brian V. Jenkins, Robert Mack
  • Patent number: 8372651
    Abstract: A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the absorbance of a sample collected from a microelectronic process.
    Type: Grant
    Filed: April 5, 2007
    Date of Patent: February 12, 2013
    Assignee: Nalco Company
    Inventors: Amy M. Tseng, John E. Hoots, Brian V. Jenkins
  • Publication number: 20080245134
    Abstract: A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the absorbance of a sample collected from a microelectronic process.
    Type: Application
    Filed: April 5, 2007
    Publication date: October 9, 2008
    Inventors: Amy M. Tseng, John E. Hoots, Brian V. Jenkins
  • Publication number: 20080248577
    Abstract: A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the fluorescence or electromagnetic emission of a sample collected from a microelectronic process.
    Type: Application
    Filed: April 5, 2007
    Publication date: October 9, 2008
    Inventors: Brian V. Jenkins, John E. Hoots, Amy M. Tseng
  • Patent number: 6077461
    Abstract: Luminol derived monomers, and luminol derived water-treatment polymers formed from the luminol derived monomers, as well as methods for monitoring of the chemiluminescence of such water-treatment polymers are disclosed. The novel chemiluminescent polymers require only a very low level of incorporation of the chemiluminescent moiety, and are useful for monitoring, even in systems containing impurities which either quench fluorescence or fluoresce themselves.
    Type: Grant
    Filed: September 30, 1998
    Date of Patent: June 20, 2000
    Assignee: Nalco Chemical Company
    Inventors: Patrick G. Murray, Amy M. Tseng, Don Sproul
  • Patent number: 5476594
    Abstract: The invention comprises a process for removing true and apparent color from pulp and paper waste waters. It comprises treating these waste waters with a vinylamine polymer including from about 1 to about 100 mole percent vinylamine and from about 1 to about 99 mole percent of at least one monomer selected from the group consisting of amidine vinylformamide, vinyl alcohol, vinyl acetate, vinyl pyrrolidinone and the esters, amides, nitriles and salts of acrylic acid and methacrylic acid.
    Type: Grant
    Filed: May 9, 1994
    Date of Patent: December 19, 1995
    Assignee: Nalco Chemical Company
    Inventors: John H. Collins, Dodd Fong, Anthony G. Sommese, Amy M. Tseng
  • Patent number: 5435921
    Abstract: The invention comprises a process for removing true and apparent color from pulp and paper waste waters. It comprises treating these waste waters with a coagulant and vinylamine polymer. The coagulant is selected from the group consisting of epichlorohydrin-dimethylamine, guanidine-formaldehyde condensation polymers, cyanoguanidine-formaldehyde condensation polymers, urea-formaldehyde condensation polymers, polyethyleneimines, polydiallyldimethylammonium chloride, copolymers of polydiallyldimethylammonium chloride and acrylamide, and ethylenedichloride-ammonia. The vinylamine polymer includes from about 1 to about 100 mole percent vinylamine and from about 1 to about 99 mole percent of at least one monomer selected from the group consisting of amidine vinylformamide, vinyl alcohol, vinyl acetate, vinyl pyrrolidinone and the esters, amides, nitriles and salts of acrylic acid and methacrylic acid.
    Type: Grant
    Filed: May 9, 1994
    Date of Patent: July 25, 1995
    Assignee: Nalco Chemical Company
    Inventors: John H. Collins, Dodd W. Fong, Anthony G. Sommese, Amy M. Tseng
  • Patent number: 5326479
    Abstract: A process for removing color from a pulp and paper wastewater which comprises the following steps: (a) treating the wastewater with a reducing agent which is capable of inactivating color producing functional groups of the wastewater; and (b) treating the wastewater subsequent to step (a) with a polymer which is capable of removing color from the wastewater.
    Type: Grant
    Filed: September 1, 1993
    Date of Patent: July 5, 1994
    Assignee: Nalco Chemical Company
    Inventors: Jawed M. Sarkar, Amy M. Tseng, John H. Collins