Patents by Inventor Amy Wang

Amy Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12456244
    Abstract: Embodiments described herein relate to the autonomous animation of Gestures by the automatic application of animations to Input Text—or the automatic application of animation Mark-up wherein the Mark-up triggers nonverbal communication expressions or Gestures. In order for an Embodied Agent's movements to come across as natural and human-like as possible, a Text-To-Gesture Algorithm (TTG Algorithm) analyses Input Text of a Communicative Utterance before it is uttered by a Embodied Agent, and marks it up with appropriate and meaningful Gestures given the meaning, context, and emotional content of Input Text and the gesturing style or personality of the Embodied Agent.
    Type: Grant
    Filed: May 18, 2023
    Date of Patent: October 28, 2025
    Inventors: Jo Hutton, Mark Sagar, Amy Wang, Hannah Clark-Younger, Kirstin Marcon, Paige Skinner, Shane Blakett, Teah Rota, Tim Szu-Hsien Wu, Utkarsh Saxena, Xueyuan Zhang, Hazel Watson-Smith, Travers Biddle, Emma Perry
  • Patent number: 11833255
    Abstract: Provided is a nanoparticle comprising a pH-responsive polymer, a pH-insensitive polymer and a payload molecule. The nanoparticle can act as a system for delivery of the payload that releases the payload in a pH sensitive manner.
    Type: Grant
    Filed: October 7, 2016
    Date of Patent: December 5, 2023
    Assignees: The Brigham and Women's Hospital, Inc., Massachusetts Institute Of Technology
    Inventors: Sunandini Chopra, Rohit Karnik, Amy Wang, Omid C. Farokhzad, Xue-Qing Zhang
  • Publication number: 20230377238
    Abstract: Embodiments described herein relate to the autonomous animation of Gestures by the automatic application of animations to Input Text—or the automatic application of animation Mark-up wherein the Mark-up triggers nonverbal communication expressions or Gestures. In order for an Embodied Agent's movements to come across as natural and human-like as possible, a Text-To-Gesture Algorithm (TTG Algorithm) analyses Input Text of a Communicative Utterance before it is uttered by a Embodied Agent, and marks it up with appropriate and meaningful Gestures given the meaning, context, and emotional content of Input Text and the gesturing style or personality of the Embodied Agent.
    Type: Application
    Filed: May 18, 2023
    Publication date: November 23, 2023
    Inventors: Jo Hutton, Mark Sagar, Amy Wang, Hannah Clark-Younger, Kirstin Marcon, Paige Skinner, Shane Blakett, Teah Rota, Tim Szu-Hsien Wu, Utkarsh Saxena, Xueyuan Zhang, Hazel Watson-Smith, Travers Biddle, Emma Perry
  • Publication number: 20180318230
    Abstract: Provided is a nanoparticle comprising a pH-responsive polymer, a pH-insensitive polymer and a payload molecule. The nanoparticle can act as a system for delivery of the payload that releases the payload in a pH sensitive manner.
    Type: Application
    Filed: October 7, 2016
    Publication date: November 8, 2018
    Inventors: Sunandini Chopra, Rohit Karnik, Amy Wang, Omid C. Farokhzad, Xue-Qing Zhang
  • Patent number: 9226699
    Abstract: A body fluid sampling device includes a housing, a penetrating member positioned in the housing and a test strip. A compliant front end is coupled to the housing. The compliant front-end includes a rigid member with an interior aperture to receive the body fluid from a wound site.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: January 5, 2016
    Assignee: Sanofi-Aventis Deutschland Gmbh
    Inventors: Dominique Freeman, Ajay Deshmukh, Jason Hegener, Thomas Shoup, Brent Eaton, Joshua Molho, Amy Wang, Jeffrey Perry
  • Patent number: 8433434
    Abstract: Embodiments of the present invention relate to a method for a near non-adaptive virtual metrology for wafer processing control. In accordance with an embodiment of the present invention, a method for processing control comprises diagnosing a chamber of a processing tool that processes a wafer to identify a key chamber parameter, and controlling the chamber based on the key chamber parameter if the key chamber parameter can be controlled, or compensating a prediction model by changing to a secondary prediction model if the key chamber parameter cannot be sufficiently controlled.
    Type: Grant
    Filed: April 23, 2010
    Date of Patent: April 30, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Amy Wang, Chen-Hua Yu, Jean Wang, Henry Lo, Francis Ko, Chih-Wei Lai, Kewei Zuo
  • Patent number: 8429542
    Abstract: A method is disclosed for rendering messages in an email application on a client computer. A plurality of email messages is received from a server computer, including a first email message, a second email message and a third email message. The first email message is rendered on the client computer with a first conversation icon that identifies the first email message as being part of an email conversation thread. When the first conversation icon is selected on the first email message, a view is rendered showing one or more email messages in the conversation thread. When the second email message is selected, the second email message is rendered on the client computer with a second conversation icon. When the second conversation icon is selected on the second email message, the view showing the one or more email messages in the conversation thread is rendered.
    Type: Grant
    Filed: November 23, 2010
    Date of Patent: April 23, 2013
    Assignee: Microsoft Corporation
    Inventors: Ryan Panchadsaram, Karan Misra, Amy Wang, Hui Nee Chin, Todd Barthelme
  • Publication number: 20120131474
    Abstract: A method is disclosed for rendering messages in an email application on a client computer. A plurality of email messages is received from a server computer, including a first email message, a second email message and a third email message. The first email message is rendered on the client computer with a first conversation icon that identifies the first email message as being part of an email conversation thread. When the first conversation icon is selected on the first email message, a view is rendered showing one or more email messages in the conversation thread. When the second email message is selected, the second email message is rendered on the client computer with a second conversation icon. When the second conversation icon is selected on the second email message, the view showing the one or more email messages in the conversation thread is rendered.
    Type: Application
    Filed: November 23, 2010
    Publication date: May 24, 2012
    Applicant: MICROSOFT CORPORATION
    Inventors: Ryan Panchadsaram, Karan Misra, Amy Wang, Hui Nee Chin, Todd Barthelme
  • Patent number: 8145337
    Abstract: A method to enable wafer result prediction from a batch processing tool, includes collecting manufacturing data from a batch of wafers processed in batch in the batch processing tool, to form a batch processing result; defining a degree of freedom of the batch processing result based on the manufacturing data; and performing an optimal curve fitting by trial and error for an optimal function model of the batch processing result based on the batch processing result.
    Type: Grant
    Filed: November 16, 2007
    Date of Patent: March 27, 2012
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Hsien Lin, Amy Wang, Francis Ko, Jean Wang
  • Publication number: 20110077478
    Abstract: A body fluid sampling device includes a housing, a penetrating member positioned in the housing and a test strip. A compliant front end is coupled to the housing. The compliant front-end includes a rigid member with an interior aperture to receive the body fluid from a wound site.
    Type: Application
    Filed: November 9, 2010
    Publication date: March 31, 2011
    Inventors: Dominique Freeman, Ajay Deshmukh, Jason Hegener, Thomas Shoup, Brent Eaton, Joshua Molho, Amy Wang, Jeffrey Perry
  • Publication number: 20110009998
    Abstract: Embodiments of the present invention relate to a method for a near non-adaptive virtual metrology for wafer processing control. In accordance with an embodiment of the present invention, a method for processing control comprises diagnosing a chamber of a processing tool that processes a wafer to identify a key chamber parameter, and controlling the chamber based on the key chamber parameter if the key chamber parameter can be controlled, or compensating a prediction model by changing to a secondary prediction model if the key chamber parameter cannot be sufficiently controlled.
    Type: Application
    Filed: April 23, 2010
    Publication date: January 13, 2011
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Amy Wang, Chen-Hua Yu, Jean Wang, Henry Lo, Francis Ko, Chih-Wei Lai, Kewei Zuo
  • Patent number: 7851234
    Abstract: A method is disclosed for controlling the sheet resistance of copper trenches formed on semiconductor wafers. The method includes forming a plurality of copper-filled trenches on a wafer, measuring the sheet resistance of each of the plurality of copper-filled trenches, and comparing the measured sheet resistance values to a predetermined sheet resistance value. Photolithography steps performed on subsequent wafers are adjusted according to a difference between the measured sheet resistance values and the predetermined value. In one embodiment, this adjustment takes the form of adjusting a photolithographic extension exposure energy to thereby adjust the cross-section of the resulting trenches.
    Type: Grant
    Filed: November 29, 2007
    Date of Patent: December 14, 2010
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Francis Ko, Jean Wang, Henry Lo, Chi-Chun Hsieh, Amy Wang
  • Patent number: 7767471
    Abstract: A method for improving within-wafer uniformity is provided. The method includes forming an electrical component by a first process step and a second process step, wherein the electrical component has a target electrical parameter. The method includes providing a first plurality of production tools for performing the first process step; providing a second plurality of production tools for performing the second process step; providing a wafer; performing the first process step on the wafer using one of the first plurality of production tools; and selecting a first route including a first production tool from the second plurality of production tools. A within-wafer uniformity of the target electrical parameter on the wafer manufactured by the first route is greater than a second route including a second production tool in the second plurality of production tools.
    Type: Grant
    Filed: July 30, 2007
    Date of Patent: August 3, 2010
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jean Wang, Francis Ko, Henry Lo, Chi-Chun Hsieh, Amy Wang, Chih-Wei Lai, Chun-Hsien Lin
  • Publication number: 20090142860
    Abstract: A method is disclosed for controlling the sheet resistance of copper trenches formed on semiconductor wafers. The method includes forming a plurality of copper-filled trenches on a wafer, measuring the sheet resistance of each of the plurality of copper-filled trenches, and comparing the measured sheet resistance values to a predetermined sheet resistance value. Photolithography steps performed on subsequent wafers are adjusted according to a difference between the measured sheet resistance values and the predetermined value. In one embodiment, this adjustment takes the form of adjusting a photolithographic extension exposure energy to thereby adjust the cross-section of the resulting trenches.
    Type: Application
    Filed: November 29, 2007
    Publication date: June 4, 2009
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Francis Ko, Jean Wang, Henry Lo, Chi-Chun Hsieh, Amy Wang
  • Publication number: 20090035883
    Abstract: A method for improving within-wafer uniformity is provided. The method includes forming an electrical component by a first process step and a second process step, wherein the electrical component has a target electrical parameter. The method includes providing a first plurality of production tools for performing the first process step; providing a second plurality of production tools for performing the second process step; providing a wafer; performing the first process step on the wafer using one of the first plurality of production tools; and selecting a first route including a first production tool from the second plurality of production tools. A within-wafer uniformity of the target electrical parameter on the wafer manufactured by the first route is greater than a second route including a second production tool in the second plurality of production tools.
    Type: Application
    Filed: July 30, 2007
    Publication date: February 5, 2009
    Inventors: Jean Wang, Francis Ko, Henry Lo, Chi-Chun Hsieh, Amy Wang, Chih-Wei Lai, Chun-Hsien Lin
  • Publication number: 20080275676
    Abstract: A method to enable wafer result prediction from a batch processing tool, includes collecting manufacturing data from a batch of wafers processed in batch in the batch processing tool, to form a batch processing result; defining a degree of freedom of the batch processing result based on the manufacturing data; and performing an optimal curve fitting by trial and error for an optimal function model of the batch processing result based on the batch processing result.
    Type: Application
    Filed: November 16, 2007
    Publication date: November 6, 2008
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chun-Hsien Lin, Amy Wang, Francis Ko, Jean Wang
  • Publication number: 20070169058
    Abstract: A method and system for generating efficient versioned codes for single instruction multiple data units whose memory systems have alignment constraints. The system creates multiple versions of codes based on relative alignments of the data streams involved in the computation. The system also analyzes characteristics of relative alignments (e.g. compile-time or runtime) to determine whether code versioning is beneficial based on a cost model.
    Type: Application
    Filed: January 17, 2006
    Publication date: July 19, 2007
    Inventors: Alexandre Eichenberger, Amy Wang, Peng Wu, Peng Zhao
  • Publication number: 20040167820
    Abstract: The two part payment terminal system improves communication between a server and one or more customers. The system includes a mobile terminal that can be hand-held and employed by a server for taking orders, such as in a restaurant. The system can also include a plurality of mobile companion devices that can be employed by customers for payment of the ordered items. Customers and/or servers can also utilize the mobile terminal and/or companion devices to provide the customer with menu items, available discounts, nutritional information, etc.
    Type: Application
    Filed: February 26, 2003
    Publication date: August 26, 2004
    Inventors: Diana Melick, Gerard J. Tarrant, Thomas K. Roslak, Bruce A. Willins, Richard M. Vollkommer, Amy Wang