Patents by Inventor An CHAI

An CHAI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240417359
    Abstract: There is provided a compound of formula (I) which is a homoallylic ether of a phenolic fragrant compound HX and which is able to release said phenolic fragrant compound HX and optionally a further fragrant.
    Type: Application
    Filed: October 20, 2022
    Publication date: December 19, 2024
    Inventors: Nicolas COCITO ARMANlNO, An CHAI, Felix FLACHSMANN, Marc LINIGER, Lijun ZHOU
  • Publication number: 20240132487
    Abstract: Disclosed are TRPM8 modulators as defined by formula (I) for achieving a cooling effect on skin and mucousa.
    Type: Application
    Filed: October 15, 2020
    Publication date: April 25, 2024
    Inventors: Nicolas COCITO ARMANINO, Agnes BOMBRUN, An CHAI, Julie CHARPENTIER, Chun CHEN, Roger EMTER, Marion MATHYS, Andreas NATSCH, Chao WANG, Lijun ZHOU
  • Patent number: 11020333
    Abstract: The present invention refers to indanone derivatives of formula (I) wherein R1 is selected from hydrogen, methyl and ethyl; R2 is selected from hydrogen, methyl and ethyl, and R is selected from hydrogen and methyl; or R2 and R3 form together with the carbon atoms to which they are attached C3-C5 cycloalkyl; and R4 is selected from C2-C5 alkyl, C2-C5 alkenyl, C1-C4 alkoxy, C3-C5 cycloalkyl, and C3-C6 cycloalkenyl. The invention further refers to perfume compositions and fragrance applications comprising them.
    Type: Grant
    Filed: August 14, 2017
    Date of Patent: June 1, 2021
    Assignee: GIVAUDAN S.A.
    Inventors: Yue Zou, An Chai, Jie Liu, Lijun Zhou
  • Publication number: 20200330346
    Abstract: The present invention refers to indanone derivatives of formula (I) wherein R1 is selected from hydrogen, methyl and ethyl; R2 is selected from hydrogen, methyl and ethyl, and R3 is selected from hydrogen and methyl; or R2 and R3 form together with the carbon atoms to which they are attached C3-C5 cycloalkyl; and R4 is selected from C2-C5 alkyl, C2-C5 alkenyl, C1-C4 alkoxy, C3-C5 cycloalkyl, and C3-C6 cycloalkenyl. The invention further refers to perfume compositions and fragrance applications comprising them.
    Type: Application
    Filed: August 14, 2017
    Publication date: October 22, 2020
    Inventors: YUE ZOU, An CHAI, jIE LIU, Lijun ZHOU