Abstract: An evaluation aid serves as a phantom (imitation lesion) when a digital X-ray image is taken, and evaluation is then carried out through the digital X-ray image. The evaluation aid can simplify evaluating image qualities of a digital X-ray image for X-ray absorption parts having different X-ray absorption ratios all at once. The evaluation aid contains a substrate (plate-like body) including a plurality of regions having different X-ray absorption ratios for taking a digital X-ray image to carry out evaluation. Step members are provided on the plate-like body so as to correspond to the plurality of regions, respectively, where each step member includes a plurality of subregions having different X-ray absorption ratios. Preferably the thicknesses and/or constituent materials of the plurality of regions of the substrate are different from each other in order to have different X-ray absorption ratios in these regions.

Abstract: The purpose of the present invention is to provide a shot processing device and a projector such that the projection amount of a projection material can be minimized.

Abstract: A silicon nitride substrate including a phase encompassed of silicon nitride particles, and intergranular phase formed from a sintering aid, wherein a separation layer is formed on the surface of a molded body including silicon nitride powder, sintering aid powder, and organic binder, by using a boron nitride paste containing boron nitride powder, organic binder, and organic solvent; the separation layer and molded body are heated; the organic binder is removed from the separation layer and molded body; subsequently molded bodies stacked with a separation layer therebetween, are sintered. Boron nitride paste contains 0.01 to 0.50% by oxygen mass and 0.001 to 0.5% by carbon mass, and c/a is within range of 0.02 to 10.00, where c is oxygen content in the powder of the boron nitride paste, and a carbon content in the degreased separation layer, which includes 0.2 to 3.5 mg/cm2 of hexagonal boron nitride powder.

Abstract: Provided are a semiconductor device manufacturing method and a substrate processing apparatus that are capable of increasing a work function of a film to be formed, in comparison with a related art. The method comprises: (a) supplying a metal-containing gas simultaneously with one selected from the group consisting of an oxygen-containing gas, a halogen-containing gas and combinations thereof into a processing chamber accommodating the substrate; and (b) supplying a nitrogen-containing gas with one of the oxygen-containing gas, the halogen-containing gas and the combinations thereof into the processing chamber.

Abstract: A piezoelectric vibrating piece includes a vibrating piece body and at least a pair of excitation electrodes. The vibrating piece body includes a vibrator. The pair of excitation electrodes are formed on respective front surface and back surface of the vibrator. The vibrating piece body is a twice rotated quartz-crystal vibrating piece cut out parallel to an X?-Z? surface. The X?-Z? surface is rotated around a Z-axis of a crystallographic axis of a crystal and further rotated around an X?-axis. The pair of excitation electrodes are collocated in a Z??-axis direction determined by an X??-axis. The X??-axis is defined by counterclockwise rotation from a +X?-axis direction around a Y?-axis by 260° to 300°. The pair of excitation electrodes are disposed inclined with respect to the Y?-axis direction.

Abstract: To provide a surface property inspection apparatus, surface property inspection system, and surface property inspection method capable of inspecting the surface processing state of processed material subjected to surface processing such as shot-peening, heat treatment, or nitriding with high accuracy and low vulnerability to temperature changes in the inspection environment. Surface property inspection apparatus is furnished with a AC power supply, a AC bridge circuit, and an evaluation device; AC bridge circuit comprises variable resistor with which distribution ratio ? is variable, reference detector, and inspection detector. Inspection detector is furnished with a coil wound so as to oppose the surface property inspection region of object under inspection M, and by supplying AC power from AC power supply to coil, an eddy current is excited in object under inspection M.

Abstract: Progressive addition lens includes a near portion having a power for viewing a near field, a distance portion having a power for viewing a distance field further than the near field, and an intermediate portion connecting the distance portion and the near portion. The progressive addition lens includes an aspherical object-side surface and an aspherical eyeball-side surface and is formed in rotational symmetry with respect to a center of design of the progressive addition lens. The object-side surface includes a first stable region formed in rotational symmetry with respect to the center of design and including the center of design, and an aspherical region arranged outside of the first stable region to contact the first stable region and formed in rotational symmetry with respect to the center of design. A Peak to Valley value of a mean surface refractive power in the first stable region is 0.12 D or less.

Abstract: The present invention provides a surface property inspection method and apparatus for inspecting the surface properties of a test object subjected to two stages of shot peening. The present invention is an apparatus 1 includes an AC power supply, an AC bridge circuit, and an evaluation apparatus. The AC bridge circuit is constituted by a variable resistor, a reference detector and inspection detector. The inspection detector includes a coil wound so as to oppose the surface property inspection area of the test object M; an eddy current is excited in the test object M by supplying AC power to the coil. A pass/fail judgment of the first shot peening can be made by inspecting the surface properties of a test object subjected to a second shot peening only after the second shot peening is completed.

Abstract: A progressive addition lens includes a portion having a power for viewing a near field, a portion having a power for viewing a distance field further than the near field, and an portion connecting the distance portion and the near portion. The progressive addition lens includes an aspherical object-side surface and an aspherical eyeball-side surface and is formed in rotational symmetry with respect to a center of design of the progressive addition lens. The object-side surface includes a first stable region formed in rotational symmetry with respect to the center of design and including the center of design, and an aspherical region arranged outside of the first stable region to contact the first stable region and formed in rotational symmetry with respect to the center of design. A PV value (Peak to Valley) of a mean surface refractive power in the first stable region is 0.12 D or less.

Abstract: A semiconductor light emitting device includes first and second light emitting bodies, a first electrode, a second electrode and a first interconnection. The first and second light emitting bodies are disposed on a conductive substrate, and each includes first and second semiconductor layers and a light emitting layer therebetween. The first electrode is provided between the first light emitting body and the conductive substrate, and electrically connected to a first semiconductor layer and the conductive substrate. The second electrode is provided between the second light emitting body and the conductive substrate, and electrically connected to a first semiconductor layer. The first interconnection electrically connects the second semiconductor layer of the first light emitting body and the second electrode. The first interconnection includes a first portion extending over the first and second light emitting bodies and a second portion extending into the second light emitting body.

Abstract: An evaluation aid is used as a phantom (imitation lesion) when a digital X-ray dynamic image thereof is taken and evaluated for image qualities for X-ray absorption parts having different X-ray absorption ratios. The evaluation aid contains a fixed plate (plate-like body) including a plurality of regions having different X-ray absorption ratios; a rotating disk (movable body) having a plurality of wires (wire rods), the rotating disk capable of rotating (moving) with respect to the fixed plate so that the plurality of wires traverse X-ray with which the fixed plate is irradiated; and a driving motor (driving portion) which rotates (moves) the rotating disk with respect to the fixed plate. It is preferred that thicknesses and/or constituent materials of the plurality of regions of the fixed plate are different from each other, so that these regions have die different X-ray absorption ratios.

Abstract: An optical lens including, an object-side surface including an atoric surface element and an eyeball-side surface including an element that cancels a surface power shift produced by the atoric surface element, wherein the atoric surface element causes horizontal surface power at a fitting point to be greater than vertical surface power at the fitting point and causes a difference between the horizontal surface power and the vertical surface power to decrease along a horizontal reference line passing through the fitting point in a direction from the fitting point toward a periphery of the optical lens or causes a sign of the difference between the horizontal surface power and the vertical surface power to change along the horizontal reference line.

Abstract: The present invention is provided to improve quality or manufacturing throughput of a semiconductor device. A method includes supplying a source gas to a substrate in a process chamber; exhausting an inside of the process chamber; supplying a reaction gas to the substrate; and exhausting the inside of the process chamber, wherein the source gas and/or the reaction gas is supplied in temporally separated pulses in the supply of the source gas and/or in the supply of the reaction gas. Then, the source gas and/or the reaction gas is supplied in temporally separated pulses to form a film during a gas supply time determined by a concentration distribution of by-products formed on a surface of the substrate.

Abstract: An evaluation aid is used as a phantom (imitation lesion) when a digital X-ray dynamic image thereof is taken and evaluated for image qualities for X-ray absorption parts having different X-ray absorption ratios. The evaluation aid contains a fixed plate (plate-like body) including a plurality of regions having different X-ray absorption ratios; a rotating disk (movable body) having a plurality of wires (wire rods), the rotating disk capable of rotating (moving) with respect to the fixed plate so that the plurality of wires traverse X-ray with which the fixed plate is irradiated; and a driving motor (driving portion) which rotates (moves) the rotating disk with respect to the fixed plate. It is preferred that thicknesses and/or constituent materials of the plurality of regions of the fixed plate are different from each other, so that these regions have the different X-ray absorption ratios.

Abstract: The purpose of the present invention is to provide a drum-type shot peening device capable of shortening processing time. This shot peening device comprises: a bottomed, cylindrical drum having one end thereof open; and a projector provided on the open side of the drum and which projects projection material on to a workpiece inserted inside the drum.

Abstract: To improve quality or manufacturing throughput of a semiconductor device, a method includes supplying a source gas to a substrate in a process chamber; exhausting an inside of the process chamber; supplying a reaction gas to the substrate; and exhausting the inside of the process chamber, wherein the source gas and/or the reaction gas is supplied in temporally separated pulses in the supply of the source gas and/or in the supply of the reaction gas. Then, the source gas and/or the reaction gas is supplied in temporally separated pulses to form a film during a gas supply time determined by a concentration distribution of by-products formed on a surface of the substrate.

Abstract: To provide a surface property inspection device and method capable of inspecting the surface treatment state of treated material subjected to surface treatments. A surface property inspection device 1 includes an AC power supply 10, an AC bridge circuit 20, and an evaluation apparatus 30, and the AC bridge circuit 20 is formed by a variable resistor 21 with a distribution ratio of ?, a reference detector 22, and an inspection detector 23. The inspection detector 23 includes a coil 23b wound so as to oppose the surface property inspection area of the test object M; an eddy current is excited in the test object M by supplying AC power to the coil 23b. A reference test object S with the same structure as the test object M is placed in the reference detector 22 to cancel inspection environment effects.

Abstract: In the present invention, provided are an ink-jet image forming method employing actinic energy radiation curable ink-jet ink exhibiting no offset resistance during storage by superposing printed portions after printing in addition to excellent properties of printing durability, gloss evenness of coated paper and paper-feeding suitability, and an ink-jet ink set thereof. It is a feature that the ink-jet image forming method possessing the steps of providing colorless ink on a substrate, followed by heating the colorless ink provided on the substrate, and subsequently exposing the colorless ink provided on the substrate, to actinic energy radiation, wherein the colorless ink contains no colorant but an actinic energy radiation curable composition and a gelling agent with which a thermoreversible gel is formed.

Abstract: The purpose of the present invention is to provide a shot peening apparatus for which size increase is limited by projecting a shot material evenly on a workpiece using a single projector. The present invention provides a shot peening apparatus equipped with a workpiece-conveying mechanism for conveying a workpiece and a projector for projecting a shot material at the workpiece. The workpiece-conveying mechanism is equipped with: a pair of rollers, which extend in the workpiece conveyance direction, on which the workpieces are loaded, and which are rotated centered on the longitudinal axis line; an endless chain; and conveyance members for pressing and conveying workpieces in the conveyance direction.

Abstract: There are provided a method of manufacturing a semiconductor device, a substrate processing apparatus, and a semiconductor device. The method allows rapid formation of a conductive film, which has a low concentration of impurities permeated from a source owing to its dense structure, and a low resistivity. The method is performed by simultaneously supplying two or more kinds of sources into a processing chamber to form a film on a substrate placed in the processing chamber. The method comprises: performing a first source supply process by supplying at least one kind of source into the processing chamber at a first supply flow rate; and performing a second source supply process by supplying the at least one kind of source into the processing chamber at a second supply flow rate different from the first supply flow rate.