Patents by Inventor An-Lun Lee

An-Lun Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240188226
    Abstract: A manufacturing method of an electronic device including the following steps is provided. First, a first conductive layer is formed on a substrate. Next, a first insulating layer and a second conductive layer are formed on the first conductive layer. The first insulating layer is disposed between the second conductive layer and the first conductive layer, and the first insulating layer has a via exposing a part of the first conductive layer. An aspect ratio of the via of the first insulating layer is greater than 1, and at least part of a sidewall of the first insulating layer is covered by the second conductive layer.
    Type: Application
    Filed: November 6, 2023
    Publication date: June 6, 2024
    Applicant: Innolux Corporation
    Inventors: Wei-Lun Shieh, Ying-Jen Chen, Hang-Lang Lee
  • Publication number: 20240186202
    Abstract: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
    Type: Application
    Filed: January 17, 2024
    Publication date: June 6, 2024
    Inventors: Rahul JAIN, Kyu Oh LEE, Siddharth K. ALUR, Wei-Lun K. JEN, Vipul V. MEHTA, Ashish DHALL, Sri Chaitra J. CHAVALI, Rahul N. MANEPALLI, Amruthavalli P. ALUR, Sai VADLAMANI
  • Publication number: 20240186180
    Abstract: An integrated circuit (IC) structure includes a gate structure, a source epitaxial structure, a drain epitaxial structure, a front-side interconnection structure, a backside dielectric layer, and a backside via. The source epitaxial structure and the drain epitaxial structure are respectively on opposite sides of the gate structure. The front-side interconnection structure is on a front-side of the source epitaxial structure and a front-side of the drain epitaxial structure. The backside dielectric layer is on a backside of the source epitaxial structure and a backside of the drain epitaxial structure and has an air gap therein. The backside via extends through the backside dielectric layer to a first one of the source epitaxial structure and the drain epitaxial structure.
    Type: Application
    Filed: February 12, 2024
    Publication date: June 6, 2024
    Inventors: Che-Lun Chang, Wei-Yang Lee, Chia-Pin Lin, Yuan-Ching Peng
  • Patent number: 11997372
    Abstract: An optical component driving mechanism is provided. The optical component driving mechanism includes a first movable portion, a fixed portion, and a first driving assembly. The fixed portion includes a first opening. The first movable portion is movable relative to the fixed portion. The first driving assembly is configured to drive the first movable portion to move relative to the fixed portion.
    Type: Grant
    Filed: May 3, 2022
    Date of Patent: May 28, 2024
    Assignee: TDK TAIWAN CORP.
    Inventors: Chao-Hsi Wang, Yueh-Lin Lee, Ko-Lun Chao, Chao-Chang Hu
  • Publication number: 20240160898
    Abstract: The present invention relates to a method of using field-programmable gate array (FPGA) for artificial intelligence (AI) inference software stack acceleration which combines the advantages of flexibility from the AI inference software stack and the programmable hardware acceleration capability of the FPGA, wherein said method comprises the steps of performing quantization on neural network (NN) model, performing layer-by-layer profiling of said NN model using AI inference software stack, identifying compute-intensive layer type of said NN model and implementing acceleration using layer accelerator on said compute-intensive layer type.
    Type: Application
    Filed: December 6, 2022
    Publication date: May 16, 2024
    Inventors: Yee Hui LEE, Ching Lun YAN
  • Patent number: 11982944
    Abstract: A method of lithography process is provided. The method includes forming a conductive layer over a reticle. The method includes applying ionized particles to the reticle by a discharging device. The method includes forming a photoresist layer over a semiconductor substrate. The method includes securing the semiconductor substrate by a wafer electrostatic-clamp. The method also includes patterning the photoresist layer by emitting radiation from a radiation source via the reticle.
    Type: Grant
    Filed: May 31, 2023
    Date of Patent: May 14, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hsiao-Lun Chang, Chueh-Chi Kuo, Tsung-Yen Lee, Tzung-Chi Fu, Li-Jui Chen, Po-Chung Cheng, Che-Chang Hsu
  • Publication number: 20240129766
    Abstract: A throttle control method for a mobile device include collecting input data, generating a first set of user experience indices according to the input data, and checking whether a user experience index of the first set of user experience indices satisfies a UEI threshold. The input data includes common information data, current configuration data and a plurality of throttle control parameters. Each user experience index of the first set of user experience indices is corresponding to at least one of throttle control parameter of the plurality of throttle control parameters.
    Type: Application
    Filed: April 10, 2023
    Publication date: April 18, 2024
    Applicant: MediaTek Singapore Pte. Ltd.
    Inventors: Hung-Yueh Chen, Byeng Hyun Kim, JUNG SHUP SHIN, Shih-Hsin Chen, Chih-Chieh Lai, Chung-Pi Lee, JUNGWOO LEE, Yu-Lun Chang
  • Publication number: 20240127429
    Abstract: A meniscus tear assisted determination system includes an image capturing device and a processor. The image capturing device is for capturing a target protocol of a subject, and the target protocol includes a plurality of target knee joint image sequences. The processor is signally connected to the image capturing device and includes a data preprocessing module and a meniscus tear assisted determination program. The data preprocessing module is for grouping the plurality of target knee joint image sequences and extracting a plurality of target coronal plane image sequences and a plurality of target sagittal plane image sequences. The meniscus tear assisted determination program includes a meniscus location detector and a meniscus tear predictor.
    Type: Application
    Filed: February 23, 2023
    Publication date: April 18, 2024
    Applicant: China Medical University
    Inventors: Kuang-Sheng Lee, Kai-Cheng Hsu, Ya-Lun Wu, Ching-Ting Lin
  • Publication number: 20240120288
    Abstract: An electronic device and a method for manufacturing the same are provided. The electronic device includes a substrate, an encapsulant and an electronic component. The encapsulant is disposed over the substrate, and has a first top surface, a second top surface and a first lateral surface extending between the first top surface and the second top surface. A roughness of the first lateral surface is less than or equal to a roughness of the second top surface. The electronic component is disposed over the second top surface of the encapsulant and electrically connected to the substrate.
    Type: Application
    Filed: October 7, 2022
    Publication date: April 11, 2024
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Chih-Hsin LAI, Chih-Cheng LEE, Shao-Lun YANG, Wei-Chih CHO
  • Publication number: 20240113423
    Abstract: A RF signal beam transmission enhancement board comprising: a substrate having at least one substrate surface; at least one elemental-featuring layer disposed on the substrate surface and including a plurality of elemental-featuring elements; and at least one index-matching layer arranged to cover the elemental-featuring elements and the substrate surface. The plurality of elemental-featuring elements has a pattern arrangement with a pattern resolution Rp given by Rp = ? N , where ? is a wavelength of a signal beam to be transmitted and N is an integer ranging from 1 to 10 such that the index-matching layer can work with the elemental-featuring elements to form an elemental-surface for minimizing reflection of a signal beam to be transmitted through the signal beam transmission enhancement board.
    Type: Application
    Filed: January 21, 2022
    Publication date: April 4, 2024
    Inventors: Wing Hong CHOI, Bin ZHANG, Siu Lun LEE
  • Publication number: 20240113203
    Abstract: A method includes providing a fin extending from a substrate, the fin including a plurality of semiconductor channel layers, and where a gate is disposed over the fin. A first spacer layer is deposited over the gate and over the fin in a source/drain region. The first spacer layer has a first etch rate. A second spacer layer is deposited over the first spacer layer. The second spacer layer has a second etch rate less than the first etch rate. The plurality of semiconductor channel layers are removed from the source/drain region to form a trench having a funnel shape. After forming the trench, inner spacers are formed along a sidewall surface of the trench. In various embodiments, lateral sidewall surfaces of each semiconductor channel layer of the plurality of semiconductor channel layers is substantially free of an inner spacer material.
    Type: Application
    Filed: January 25, 2023
    Publication date: April 4, 2024
    Inventors: Che-Lun CHANG, Wei-Yang LEE, Chia-Pin LIN
  • Publication number: 20240113214
    Abstract: Semiconductor structures and methods for manufacturing the same are provided. The semiconductor structure includes a first channel member suspended over a substrate and a second channel member suspended over the first channel member and spaced apart from the first channel member along a first direction. The semiconductor structure also includes a gate structure wrapping around the first channel member and the second channel member and a dielectric structure encircled by the first channel member, the second channel member, the gate structure, and the source/drain structure. In addition, the dielectric structure includes a porous material or an air gap. The semiconductor structure also includes a first epitaxial layer attached to the first channel member, and the first epitaxial layer has a first extending portion protruding from a bottom surface of the first channel member along the first direction and extending into the dielectric structure.
    Type: Application
    Filed: March 3, 2023
    Publication date: April 4, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Che-Lun Chang, Kuan-Ting Pan, Wei-Yang Lee
  • Patent number: 11944412
    Abstract: A blood pressure detection device manufactured by a semiconductor process includes a substrate, a microelectromechanical element, a gas-pressure-sensing element, a driving-chip element, an encapsulation layer and a valve layer. The substrate includes inlet apertures. The microelectromechanical element and the gas-pressure-sensing element are stacked and integrally formed on the substrate. The encapsulation layer is encapsulated and positioned on the substrate. A flowing-channel space is formed above the microelectromechanical element and the gas-pressure-sensing element. The encapsulation layer includes an outlet aperture in communication with an airbag. The driving-chip element controls the microelectromechanical element, the gas-pressure-sensing element and valve units to transport gas.
    Type: Grant
    Filed: June 2, 2021
    Date of Patent: April 2, 2024
    Assignee: MICROJET TECHNOLOGY CO., LTD.
    Inventors: Hao-Jan Mou, Ying-Lun Chang, Ching-Sung Lin, Chi-Feng Huang, Yung-Lung Han, Chang-Yen Tsai, Wei-Ming Lee, Chun-Yi Kuo, Tsung-I Lin
  • Publication number: 20240105806
    Abstract: Semiconductor structures and methods of forming the same are provided. In an embodiment, an exemplary semiconductor structure includes a vertical stack of channel members disposed over a substrate, a gate structure wrapping around each channel member of the vertical stack of channel members, a source/drain feature coupled to the vertical stack of channel members and adjacent the gate structure; and a dielectric feature disposed between the source/drain feature and the substrate, in a cross-sectional view, the dielectric feature includes a V-shape sidewall surface.
    Type: Application
    Filed: March 9, 2023
    Publication date: March 28, 2024
    Inventors: Che-Lun Chang, Kuan-Ting Pan, Wei-Yang Lee
  • Publication number: 20240106757
    Abstract: A method of wireless signal transmission management includes transmitting a plurality of data packets to tethering equipment from user equipment to tethering equipment, determining a size of each of the plurality of data packets by the tethering equipment, designating data packets of the plurality of data packets having a specific range of sizes as control signal packets by the tethering equipment, and prioritizing in transmitting the control signal packets to a cellular network by the tethering equipment.
    Type: Application
    Filed: September 21, 2023
    Publication date: March 28, 2024
    Applicant: MEDIATEK INC.
    Inventors: Ching-Hao Lee, Yi-Lun Chen, Ho-Wen Pu, Yu-Yu Hung, Jun-Yi Li, Ting-Sheng Lo
  • Patent number: 11935805
    Abstract: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
    Type: Grant
    Filed: April 12, 2023
    Date of Patent: March 19, 2024
    Assignee: Intel Corporation
    Inventors: Rahul Jain, Kyu Oh Lee, Siddharth K. Alur, Wei-Lun K. Jen, Vipul V. Mehta, Ashish Dhall, Sri Chaitra J. Chavali, Rahul N. Manepalli, Amruthavalli P. Alur, Sai Vadlamani
  • Patent number: 11935781
    Abstract: An integrated circuit (IC) structure includes a gate structure, a source epitaxial structure, a drain epitaxial structure, a front-side interconnection structure, a backside dielectric layer, and a backside via. The source epitaxial structure and the drain epitaxial structure are respectively on opposite sides of the gate structure. The front-side interconnection structure is on a front-side of the source epitaxial structure and a front-side of the drain epitaxial structure. The backside dielectric layer is on a backside of the source epitaxial structure and a backside of the drain epitaxial structure and has an air gap therein. The backside via extends through the backside dielectric layer to a first one of the source epitaxial structure and the drain epitaxial structure.
    Type: Grant
    Filed: July 28, 2022
    Date of Patent: March 19, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Che-Lun Chang, Wei-Yang Lee, Chia-Pin Lin, Yuan-Ching Peng
  • Patent number: 11916110
    Abstract: Embodiments of the present disclosure provide a method for forming semiconductor device structures. The method includes forming a fin structure having a stack of semiconductor layers comprising first semiconductor layers and second semiconductor layers alternatingly arranged, forming a sacrificial gate structure over a portion of the fin structure, removing the first and second semiconductor layers in a source/drain region of the fin structure that is not covered by the sacrificial gate structure, forming an epitaxial source/drain feature in the source/drain region, removing portions of the sacrificial gate structure to expose the first and second semiconductor layers, removing portions of the second semiconductor layers so that at least one second semiconductor layer has a width less than a width of each of the first semiconductor layers, forming a conformal gate dielectric layer on exposed first and second semiconductor layers, and forming a gate electrode layer on the conformal gate dielectric layer.
    Type: Grant
    Filed: July 4, 2022
    Date of Patent: February 27, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chih-Ching Wang, Wei-Yang Lee, Ming-Chang Wen, Jo-Tzu Hung, Wen-Hsing Hsieh, Kuan-Lun Cheng
  • Publication number: 20240062945
    Abstract: A wireless transmission module for transmitting energy or signals includes a coil assembly and an induction substrate. The coil assembly has a winding axis, and the induction substrate corresponds to the coil assembly. The induction substrate has a first surface facing the coil assembly.
    Type: Application
    Filed: February 7, 2023
    Publication date: February 22, 2024
    Inventors: Kuang-Lun LEE, Feng-Lung CHIEN, Mao-Chun CHEN, Chien-Hung LIN, Chia Ho CHANG, Wen-Pin CHANG
  • Publication number: 20240038440
    Abstract: A coil module is provided, including a second coil mechanism. The second coil mechanism includes a third coil assembly and a second base corresponding to the third coil assembly. The second base has a positioning assembly corresponding to a first coil mechanism.
    Type: Application
    Filed: October 5, 2023
    Publication date: February 1, 2024
    Inventors: Feng-Lung CHIEN, Tsang-Feng WU, Yuan HAN, Tzu-Chieh KAO, Chien-Hung LIN, Kuang-Lun LEE, Hsiang-Hui HSU, Shu-Yi TSUI, Kuo-Jui LEE, Kun-Ying LEE, Mao-Chun CHEN, Tai-Hsien YU, Wei-Yu CHEN, Yi-Ju LI, Kuei-Yuan CHANG, Wei-Chun LI, Ni-Ni LAI, Sheng-Hao LUO, Heng-Sheng PENG, Yueh-Hui KUAN, Hsiu-Chen LIN, Yan-Bing ZHOU, Chris T. Burket