Patents by Inventor An Wu

An Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11526053
    Abstract: The present disclosure provides an optical assembly, a liquid crystal display device, and an electronic equipment. The optical assembly includes: a linear polarizer, a half-wave plate, and a quarter-wave plate stacked in sequence. An absorption axis of the linear polarizer is substantially perpendicular to a first direction, and the first direction is parallel to a surface of the linear polarizer; an angle between an in-plane slow axis of the half-wave plate and the first direction is in a range of 100° to 110°; an angle between an in-plane slow axis of the quarter-wave plate and the first direction is in a range of 160° to 170°.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: December 13, 2022
    Assignees: BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
    Inventors: Xuan Zhong, Hongliang Yuan, Jian Wang, Qi Zheng, Wei Zhao, Xiaojuan Wu, Zhangxiang Cheng, Jiaxing Wang
  • Patent number: 11526395
    Abstract: A read operation to retrieve data stored at a memory device is performed. Whether the data retrieved from the memory device includes an error that is not correctable is determined. Responsive to determining that the data retrieved from the memory device comprises the error that is not correctable, a buffer in a data path along which a write operation was performed to write the data at the memory device is searched for the data.
    Type: Grant
    Filed: November 20, 2020
    Date of Patent: December 13, 2022
    Assignee: MICRON TECHNOLOGY, INC.
    Inventors: Wei Wang, Jiangli Zhu, Ying Yu Tai, Ning Chen, Zhengang Chen, Cheng Yuan Wu
  • Patent number: 11525936
    Abstract: Reducing casing wave effects on sonic logging data by positioning two or more receivers in a borehole in a subsurface formation; receiving, at two or more receivers in a borehole in a subsurface formation, a first signal associated with a first acoustic signal originating from a first transmitter position; receiving, at the two or more receivers, a second signal associated with a second acoustic signal originating from a second transmitter position; creating a dataset based on the first signal and the second signal; identifying casing wave signals in the dataset based at least in part on the second signal; calculating inverse-phase casing wave signals based at least in part on the casing wave signals and the second signal; and reducing effects of the casing wave signals on the dataset using the inverse-phase casing wave signals.
    Type: Grant
    Filed: June 18, 2020
    Date of Patent: December 13, 2022
    Assignee: Halliburton Energy Services, Inc.
    Inventors: Ruijia Wang, Yao Ge, Xiang Wu, Jing Jin
  • Patent number: 11527214
    Abstract: An image processing method, an image processing circuit and a display apparatus are provided. The image processing method includes: converting an RGB gray-scale value of each pixel in a current image frame into an RGB luminance value; converting the RGB luminance value into a first RGBW luminance value; determining a luminance level of the current image frame according to the first RGBW luminance value corresponding to each pixel; determining a luminance gain value of the current image frame according to the luminance level of the current image frame; calculating a second RGBW luminance value according to the luminance gain value and the first RGBW luminance value; and converting the second RGBW luminance value into an RGBW gray-scale value.
    Type: Grant
    Filed: January 20, 2021
    Date of Patent: December 13, 2022
    Assignees: HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD., BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
    Inventors: Song Meng, Zhongyuan Wu
  • Patent number: 11527357
    Abstract: Disclosed is an assembly including a busbar that includes: a first layer that defines: first layer top and bottom surfaces; first layer first and second ends; and a first layer center region between the first layer first and second ends; and the first layer forms first layer perforations of different sizes about the first layer center region so perforations closer to the first layer first end are smaller than perforations spaced apart therefrom; a second layer that is disposed against and electrically isolated from the first layer bottom surface, wherein the second layer defines connector orifices having a same size as each other that are aligned with the first layer perforations; and a first capacitor supported against and electrically connected to the first layer top surface, wherein the first capacitor includes busbar connectors that respectively extend through the first layer perforations to electrically connect with the connector orifices.
    Type: Grant
    Filed: April 6, 2021
    Date of Patent: December 13, 2022
    Assignee: HAMILTON SUNDSTRAND CORPORATION
    Inventors: Hailing Wu, Aritra Sur, Xin Wu
  • Patent number: 11527294
    Abstract: A system includes a memory device including a plurality of groups of memory cells and a processing device that is operatively coupled to the memory device. The processing device is to receive a request to determine a reliability of the plurality of groups of memory cells. The processing device is further to perform, in response to receipt of the request, a scan operation on a sample portion of the plurality of groups of memory cells to determine a reliability of the sample portion that is representative of the reliability of the plurality of groups of memory cells.
    Type: Grant
    Filed: August 25, 2020
    Date of Patent: December 13, 2022
    Assignee: Micron Technology, Inc.
    Inventors: Vamsi Pavan Rayaprolu, Karl D. Schuh, Jeffrey S. McNeil, Jr., Kishore K. Muchherla, Ashutosh Malshe, Jiangang Wu
  • Patent number: 11525496
    Abstract: A roller chain includes a plurality of inner and outer link units and a plurality of sealing rings. Each inner link unit includes two inner chain plates and two bushings. Each outer link unit interconnects an adjacent pair of the inner link units, and includes two outer chain plates and two connecting rods. Each of the outer chain plates has two inner surrounding surface portions each partially defining a retaining space. Each of the sealing rings is disposed in a respective one of the retaining spaces in the outer chain plates.
    Type: Grant
    Filed: June 30, 2020
    Date of Patent: December 13, 2022
    Assignee: A MAN POWER TRANSMISSION CO., LTD.
    Inventor: Hou-Te Wu
  • Patent number: 11524459
    Abstract: A spacecraft includes an additive manufacturing (A/M) subsystem and one or both of a thermal control arrangement and a contamination control arrangement. The A/M subsystem includes an A/M tool, feedstock and a workpiece and is configured to additively manufacture the workpiece using material from the feedstock. The thermal control arrangement is operable, in an on-orbit space environment characterized by near vacuum pressure and near zero-g force, to maintain temperature of at least one of the A/M tool, the feedstock, and the workpiece within respective specified ranges. The contamination control arrangement is operable, in the on-orbit space environment, to control outgassing of volatile organic compounds (VOCs).
    Type: Grant
    Filed: April 19, 2021
    Date of Patent: December 13, 2022
    Assignee: Space Systems/Loral, LLC
    Inventors: John Scott Higham, Gordon Wu, Daniel Andrew Fluitt, Elijah Zebadiah Gurnee, Jude Zils
  • Patent number: 11527622
    Abstract: A method includes providing a structure having a substrate and a channel layer over the substrate; forming a high-k gate dielectric layer over the channel layer; forming a work function metal layer over the high-k gate dielectric layer; forming a silicide layer over the work function metal layer; annealing the structure such that a first portion of the work function metal layer that interfaces with the high-k gate dielectric layer is doped with silicon elements from the silicide layer; removing the silicide layer; and forming a bulk metal layer over the work function metal layer.
    Type: Grant
    Filed: January 8, 2021
    Date of Patent: December 13, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yen-Tien Tung, Szu-Wei Huang, Zhi-Ren Xiao, Yin-Chuan Chuang, Yung-Chien Huang, Kuan-Ting Liu, Tzer-Min Shen, Chung-Wei Wu, Zhiqiang Wu
  • Patent number: 11527543
    Abstract: The present disclosure describes a patterning process for a strap region in a memory cell for the removal of material between polysilicon lines. The patterning process includes depositing a first hard mask layer in a divot formed on a top portion of a polysilicon layer interposed between a first polysilicon gate structure and a second polysilicon gate; depositing a second hard mask layer on the first hard mask layer. The patterning process also includes performing a first etch to remove the second hard mask layer and a portion of the second hard mask layer from the divot, performing a second etch to remove the second hard mask layer from the divot; and performing a third etch to remove the polysilicon layer not covered by the first and second hard mask layers to form a separation between the first polysilicon gate structure and the second polysilicon structure.
    Type: Grant
    Filed: June 30, 2020
    Date of Patent: December 13, 2022
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yen-Jou Wu, Chih-Ming Lee, Keng-Ying Liao, Ping-Pang Hsieh, Su-Yu Yeh, Hsin-Hui Lin, Yu-Liang Wang
  • Patent number: 11527838
    Abstract: The present invention discloses a new dual polarized array waveguide antenna configured above a signal processing substrate and sequentially including an antenna array substrate, a coupling substrate and a waveguide body. The antenna array substrate includes a plurality of patches, each of which having a first coupling portion and a second coupling portion coupled to the signal processing substrate. The top surface of the coupling substrate includes a plurality of coupling pads corresponding to the patches, and each coupling pad is configured above an intersection area of the first coupling portion and the second coupling portion. The waveguide body includes a plurality of waveguide channels passing through the waveguide body and corresponding to the coupling pads. Each waveguide channel has a first ridge pair and a second ridge pair projecting from wall surfaces.
    Type: Grant
    Filed: December 31, 2020
    Date of Patent: December 13, 2022
    Inventors: Ting-Rui Zhang, Yu-Cheng Chen, Li-Ching Lin, Sheng-Feng Yeh, You-Hua Wu, Tung-Yi Wu
  • Patent number: 11527752
    Abstract: This application provides a positive active material and a preparation method thereof, an electrochemical battery, a battery module, a battery pack, and an apparatus. The positive active material includes an inner core and a coating layer, where the coating layer coats a surface of the inner core. The inner core is selected from a ternary material with a molecular formula of Li1+a[NixCoyMnzMbM?c]O2?dYd, where distribution of each of the doping elements M, M?, and Y in the inner core meets the following condition: there is a reduced mass concentration gradient from an outer side of the inner core to a center of the inner core. The positive active material herein features high gram capacity, high structural stability, and high thermal stability, so that the electrochemical battery has excellent cycle performance and storage performance and high initial discharge gram capacity.
    Type: Grant
    Filed: December 22, 2020
    Date of Patent: December 13, 2022
    Assignee: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
    Inventors: Qi Wu, Jinhua He, Changyin Ji
  • Patent number: 11526081
    Abstract: An electron beam lithography system and an electron beam lithography process are disclosed herein for improving throughput. An exemplary method for increasing throughput achieved by an electron beam lithography system includes receiving an integrated circuit (IC) design layout that includes a target pattern, wherein the electron beam lithography system implements a first exposure dose to form the target pattern on a workpiece based on the IC design layout. The method further includes inserting a dummy pattern into the IC design layout to increase a pattern density of the IC design layout to greater than or equal to a threshold pattern density, thereby generating a modified IC design layout. The electron beam lithography system implements a second exposure dose that is less than the first exposure dose to form the target pattern on the workpiece based on the modified IC design layout.
    Type: Grant
    Filed: July 2, 2021
    Date of Patent: December 13, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shih-Ming Chang, Wen Lo, Chun-Hung Liu, Chia-Hua Chang, Hsin-Wei Wu, Ta-Wei Ou, Chien-Chih Chen, Chien-Cheng Chen
  • Publication number: 20220392166
    Abstract: Techniques performed by a data processing system for reconstructing a three-dimensional (3D) model of the face of a human subject herein include obtaining source data comprising a two-dimensional (2D) image, three-dimensional (3D) image, or depth information representing a face of a human subject. Reconstructing the 3D model of the face also includes generating a 3D model of the face of the human subject based on the source data by analyzing the source data to produce a coarse 3D model of the face of the human subject, and refining the coarse 3D model through free form deformation to produce a fitted 3D model. The coarse 3D model may be a 3D Morphable Model (3DMM), and the coarse 3D model may be refined through free-form deformation in which the deformation of the mesh is limited by applying an as-rigid-as-possible (ARAP) deformation constraint.
    Type: Application
    Filed: August 12, 2022
    Publication date: December 8, 2022
    Applicant: Microsoft Technology Licensing, LLC
    Inventors: Noranart VESDAPUNT, Wenbin ZHU, Hsiang-Tao WU, Zeyu CHEN, Baoyuan WANG
  • Publication number: 20220392128
    Abstract: Provided are a beauty processing method and apparatus. The method includes: obtaining an original face image, and extracting original parameter information corresponding to a site feature of a to-be-beautified site; determining, based on the original parameter information, a site beauty parameter corresponding to the to-be-beautified site; and processing the to-be-beautified site based on the site beauty parameter to generate a target face image. Thus, the personalized beauty parameters can be generated to meet the user's personalized beauty needs, improving the accuracy of the beauty parameter and enhancing the beauty effect.
    Type: Application
    Filed: August 11, 2022
    Publication date: December 8, 2022
    Inventors: Xinghua ZHANG, Xuezhi WANG, Kai CHEN, Fengyi SHANG, Fan WU, Honghao MA, Liuxi TAO
  • Publication number: 20220390820
    Abstract: A light source module including first and second light sources, first and second wavelength conversion units, and first and second light splitting units is provided. The first light source emits a first light having a first wavelength. The first wavelength conversion unit converts at least one portion of the first light into a first converted light having a second wavelength. The second light splitting unit allows the lights having the second and third wavelengths to travel through and reflects the light having the first wavelength. The second light source emits a second light having the first wavelength. The second wavelength conversion unit converts at least one portion of the second light into a second converted light having the third wavelength. The first light splitting unit is disposed between the first and second wavelength conversion units and reflects the first wavelength and allows the second wavelength to travel through.
    Type: Application
    Filed: April 27, 2022
    Publication date: December 8, 2022
    Applicant: Qisda Corporation
    Inventors: Chih-Shiung CHIEN, Ming-Kuen LIN, Tsung-Hsun WU, Yi-Ling LO
  • Publication number: 20220389023
    Abstract: Disclosed herein are compounds that target SMARCA2 and SMARCA4, causing their degradation. Also disclosed herein are compositions and methods of use in treating associated disorders and diseases.
    Type: Application
    Filed: June 25, 2020
    Publication date: December 8, 2022
    Applicant: DANA-FARBER CANCER INSTITUTE, INC.
    Inventors: Jun Qi, Scott Armstrong, Lei Wu
  • Patent number: D972416
    Type: Grant
    Filed: February 14, 2022
    Date of Patent: December 13, 2022
    Assignee: Yiwu Baosuo Network Technology Co., Ltd.
    Inventor: Anmin Wu
  • Patent number: D972679
    Type: Grant
    Filed: November 12, 2018
    Date of Patent: December 13, 2022
    Assignee: Haws Corporation
    Inventors: Lance Hussey, Zeke Johnson, Shushuo Wu, Ben LaBelle, Joshua Linn, Dean Porter
  • Patent number: D972765
    Type: Grant
    Filed: April 12, 2022
    Date of Patent: December 13, 2022
    Inventor: Hanxiang Wu