Abstract: A high-frequency wave applicator for producing a plasma, including an inner conductor, and an outer conductor forming a coaxial structure, and a propagation medium of a high-frequency wave in a main propagation direction (x), including a passage dielectric of the wave having a sealing solid body disposed between the inner conductor and the outer conductor. Advantageously, the inner conductor has a first outer dimension d1 in a transverse direction (y), perpendicular to the main propagation direction (x), and the outer conductor has an inner dimension d2 in the transverse direction (y), such that 0.2<(d2?d1)/d2<0.55 allows improvement of the dissipation of the energy flows on the surface of the applicator.

Abstract: The invention concerns a device and a process, the device being a cleaning device utilizing a dry chemical means assisted by plasma from a reactor (10) containing an unwanted deposit on its walls and at least one other polarizable surface (12), characterized in that it comprises means (13, 14) for positively polarizing one or each of the polarizable surfaces relative to the reactor walls maintained at a reference potential.

Abstract: The disclosure includes a coaxial microwave applicator for plasma production, including a coaxial tube formed by a central core and an outer conductor separated from the central core by an annular space allowing propagation of microwaves. The applicator includes: a cylindrical permanent magnet disposed at the end of the central core; and at least one annular permanent magnet disposed at the end of the outer conductor, all of the magnets disposed at the end of the coaxial tube having the same direction of magnetization. The magnetization of the magnets forms a magnetic field suitable for generating, in a zone away from the end of the applicator, an electronic cyclotronic resonance coupling with the electric microwave field of the applicator. The external radius and the magnetization of the annular magnet are selected such that the magnetic field lines generated by the magnets pass through the coupling zone in a direction substantially parallel to the axis of the applicator.

Abstract: The disclosure includes a glow-discharge lamp including: an elongate casing transparent to illuminating radiation and containing a plasma gas; a device for applying an electric field for maintaining a plasma in the so-called positive column region of the casing, the device including two electrodes forming an anode and a cathode located in the casing at each end thereof; and a radio-frequency or microwave cathode plasma source arranged in the casing in relation to the cathode-forming electrode, such as to generate a high-frequency discharge located on the surface of the electrode in order to generate the plasma. The disclosure also includes a lighting method of such a glow-discharge lamp.

Abstract: The disclosure includes a coaxial microwave applicator for plasma production, including a coaxial tube formed by a central core and an outer conductor separated from the central core by an annular space allowing propagation of microwaves. The applicator includes: a cylindrical permanent magnet disposed at the end of the central core; and at least one annular permanent magnet disposed at the end of the outer conductor, all of the magnets disposed at the end of the coaxial tube having the same direction of magnetisation. The magnetisation of the magnets forms a magnetic field suitable for generating, in a zone away from the end of the applicator, an electronic cyclotronic resonance coupling with the electric microwave field of the applicator. The external radius and the magnetisation of the annular magnet are selected such that the magnetic field lines generated by the magnets pass through the coupling zone in a direction substantially parallel to the axis of the applicator.

Abstract: The disclosure includes a glow-discharge lamp including: an elongate casing transparent to illuminating radiation and containing a plasma gas; a device for applying an electric field for maintaining a plasma in the so-called positive column region of the casing, the device including two electrodes forming an anode and a cathode located in the casing at each end thereof; and a radio-frequency or microwave cathode plasma source arranged in the casing in relation to the cathode-forming electrode, such as to generate a high-frequency discharge located on the surface of the electrode in order to generate the plasma. The disclosure also includes a lighting method of such a glow-discharge lamp.

Abstract: The invention concerns a device and a process, the device being a cleaning device utilizing a dry chemical means assisted by plasma from a reactor (10) containing an unwanted deposit on its walls and at least one other polarizable surface (12), characterized in that it comprises means (13, 14) for positively polarizing one or each of the polarizable surfaces relative to the reactor walls maintained at a reference potential.

Abstract: The invention relates to a device for producing and/or confining a plasma, said device comprising a chamber in the space of which the plasma is produced and/or confined, said chamber including a wall defining a housing inside the chamber and encompassing said space, wherein said device is characterized in that it comprises at least one assembly for producing and/or confining plasma, each assembly being composed of magnets having only an axial magnetization direction and being recessed in the wall defining the housing, so that the magnetization direction of all the magnets defining each assembly is substantially perpendicular to the housing defined by the wall and so that the assembly is substantially symmetrical to the housing, wherein the magnetic field lines do not extend through the wall of the chamber. The invention also relates to a method for producing and/or confining a plasma.

Abstract: The invention concerns a device for producing and/or confining a plasma (10), comprising a recipient (13) within the volume of which the plasma is produced or confined, wherein said recipient comprises a wall (1) defining a lining (15) at the inside of the recipient and encompassing the volume, characterized in that it comprises at least one annular magnet (30), centered around a normal (14) with respect to the lining, having radial magnetization direction, such that the magnetization direction is significantly perpendicular to said normal to the lining. The invention also concerns a method for producing and/or confining a plasma.

Abstract: The invention relates to a device for producing and/or confining a plasma (10), said device comprising a chamber (13) in the space of which the plasma is produced and/or confined, said chamber (13) including a wall (1) defining a housing (15) inside the chamber (15) and encompassing said space, wherein said device is characterised in that it comprises at least one assembly (30) for producing and/or confining plasma, each assembly (30) being composed of magnets (3) having only an axial magnetisation direction and being recessed in the wall (1) defining the housing, so that the magnetisation direction of all the magnets (3) defining each assembly (30) is substantially perpendicular to the housing (15) defined by the wall (1) and so that the assembly (30) is substantially symmetrical to the housing, wherein the magnetic field lines (5) do not extend through the wall (1) of the chamber. The invention also relates to a method for producing and/or confining a plasma.

Abstract: The invention concerns a source supplying an adjustable energy electron beam, comprising a plasma chamber (P) consisting of an enclosure (1) having an inner surface of a first value (S1) and an extraction gate (2) having a surface of a second value (S2), the gate potential being different from that of the enclosure and adjustable. The invention is characterized in that the plasma is excited and confined in multipolar or multidipolar magnetic structures, the ratio of the second value (S2) over the first value (S1) being close to: D=1/? ?2?me/mi exp (?½), wherein: ? is the proportion of electrons of the plasma P, me the electron mass, and mi is the mass of positively charged ions.

Abstract: The invention concerns a device and a process, the device being a cleaning device utilizing a dry chemical means assisted by plasma from a reactor (10) containing an unwanted deposit on its walls and at least one other polarizable surface (12), characterized in that it comprises means (13, 14) for positively polarizing one or each of the polarizable surfaces relative to the reactor walls maintained at a reference potential.

Abstract: The invention concerns a device for producing and/or confining a plasma (10), comprising a recipient (13) within the volume of which the plasma is produced or confined, wherein said recipient comprises a wall (1) defining a lining (15) at the inside of the recipient and encompassing the volume, characterized in that it comprises at least one annular magnet (30), centered around a normal (14) with respect to the lining, having radial magnetization direction, such that the magnetization direction is significantly perpendicular to said normal to the lining. The invention also concerns a method for producing and/or confining a plasma.

Abstract: Method comprising a succession of image frames which each comprise a sustain phase of the display discharge regions which itself comprises the application of sustain voltage pulses VS between the electrodes of each pair crossing these regions, and, during each sustain pulse, the application of trigger voltage pulses VM to groups of discharge regions, which pulses are applied successively and not simultaneously to the various groups of discharge regions. Thanks to the application in stages of the trigger pulses during each sustain pulse, a reduction in the instantaneous current required to supply the display is obtained.

Abstract: The method comprises the following steps: preparing a sheet having thickness of 5 ?m to a few tens of micrometers, suitable for being etched by a lithographic operation; making a mask on a face of the sheet, the mask presenting etching selectivity S of at least 5; depositing a layer of photosensitive resin on the mask; making through holes in the layer of resin by photolithography; etching through the mask via the pores in the layer of resin; and anisotropically etching through the sheet from the pores in the mask in order to make pores in the sheet having an aspect ratio greater than 5. The invention is applicable to fabricating micron and sub-micron filters.

Abstract: The invention concerns a faceplate comprising, for each discharge zone, at least two electrode elements having an axis of symmetry Ox and which are adapted such that the surface potential V(x) measured at the dielectric layer surface covering said elements increases, away from the edge of the discharge elements, continuously or discontinuously, without decreasing portion, when a constant potential difference is applied between the two electrodes serving said discharge zone, thereby substantially enhancing the panel luminous efficacy.

Abstract: The invention relates to a device for the production of a plasma (16) within a housing comprising means for the generation of energy in the microwave spectrum, for the excitation of the plasma, said means comprise at least one basic plasma excitation device with a coaxial applicator (4) of microwave energy, one of the ends of which is connected to a production source (7) of microwave energy, the other end (8) of which is directed to the gas to be excited within the housing. The device is characterised in that each basic plasma excitation device is arranged in the wall (3) of the housing, each applicator (4) having a central core (5) which is essentially flush with the wall of the housing. The central core and the thickness of the wall (3) of the housing are separated by a space (6) coaxial to the central core, said space being totally filled, at least at the end of each applicator, by a dielectric material (14), such that said material is essentially flush with the level of the wall of the housing.

Abstract: The method of the invention generates an address signal for addressing columns or rows of a PDP. In the case of addressing a column, for example, the method comprises the following steps. For a phase T1, a DC voltage V1 is applied across the terminals of a solenoid L, so that the latter stores energy, and applies a voltage A across the terminals of a selected column. During a phase T2, some of the energy stored in the solenoid L is discharged into the column until the voltage across the terminals of the column becomes about zero. During a phase T3, an approximately zero voltage is maintained across the terminals of the column. According to one embodiment the selection of the column(s) during this phase is modifiable. During a phase T4, the solenoid L is charged with current stored in a capacitor until the voltage across the terminals of the column is zero.

Abstract: A device of a plasma (5) for confinement of a plasma within a housing (1), comprising creation means for creating a magnetic field, said means being a series of permanent magnets (3) for creation of a magnetic field presenting an alternating multi-polar magnetic structure to the plasma and the magnets (3) restrict the plasma to a large volume, the magnets begin distributed in a discontinuous around the volume end said magnets (3) arc discharge, a distance within the housing at a separation from the walls of the housing by means of support shafts (4). The changes above have been provided to improve the clarification of the claim language and claims have been amended to correct a typographical error. Since the changes are minor and are intended merely to improve the legibility of the claims, obtaining authorization from application was not viewed as necessary.

Abstract: A method for driving a plasma display having discharge regions each crossed by a pair of sustain electrodes (YS, YAS) and at least one trigger electrode (XA) is disclosed. The method includes a succession of image frames or subframes which each have a discharge region sustain phase including the application of voltage pulses VS between the electrodes of each pair of sustain electrodes serving these regions, and the application of a trigger pulse VM, of duration ?M less than 1 ?S, between the trigger electrode (XA) and one and/or the other of the electrodes of each pair serving these regions. The intensity and luminous efficiency of plasma displays can thus be significantly improved.